Intra-laminate disk layer for thin film photovoltaic devices and their methods of manufacture
View Patent ↗Photovoltaic devices including an insulating layer and an intra-laminate disk layer on a plurality of thin film layers are provided. A first conductive strip, defining a first lead, is positioned on the insulating layer and connected to a first bus bar. A second conductive strip is positioned on the insulating layer and connected to a second bus bar. An adhesive layer is over the device and defines an adhesive gap through which the first lead and the second lead extend. An encapsulating substrate is on the adhesive layer, and defines a connection aperture through which the first lead and the second lead extend. The intra-laminate disk layer is positioned under the adhesive gap defined by the adhesive layer and the connection aperture defined by the encapsulating substrate. Methods of manufacturing photovoltaic devices are also provided.
1. A photovoltaic device, comprising:
a glass substrate;
a plurality of thin film layers on the glass substrate, wherein the plurality of thin film layers define a plurality of photovoltaic cells connected in series to each other;
an insulating layer positioned on and directly contacting the plurality of thin film layers;
an intra-laminate disk layer positioned on and directly contacting the insulating layer;
a first conductive strip positioned on and directly contacting the insulating layer and the intra-laminate disk layer, the first conductive strip defining a first lead, wherein the first conductive strip is electrically isolated from the plurality of thin film layers via the insulating layer and connected to a first bus bar;
a second conductive strip positioned on and directly contacting the insulating layer and the intra-laminate disk layer, the second conductive strip defining a second lead, wherein the second conductive strip is electrically isolated from the thin film layers via the insulating layer and connected to a second bus bar;
an adhesive layer over the first conductive strip, the second conductive strip, the intra-laminate disk layer, the insulated layer, and any remaining exposed areas of the plurality of thin films, wherein the adhesive layer defines an adhesive gap through which the first lead and the second lead extend; and,
an encapsulating substrate on the adhesive layer, wherein the encapsulating substrate defines a connection aperture through which the first lead and the second lead extend,
wherein the intra-laminate disk layer is positioned under the adhesive gap defined by the adhesive layer and the connection aperture defined by the encapsulating substrate.
2. The device of claim 1 , wherein the intra-laminate disk layer is positioned on the insulating layer such that the intra-laminate disk layer is between the insulating layer and the first conductive strip and the second conductive strip.
3. The device of claim 1 , wherein the intra-laminate disk layer extends over a protected area that is larger than the connection aperture defined by the encapsulating substrate.
4. The device of claim 1 , wherein the intra-laminate disk layer extends over a protected area that is larger than the adhesive gap defined by the adhesive layer.
5. The device of claim 1 , wherein the intra-laminate disk layer comprises a polymeric coating on a film.
6. The device of claim 5 , wherein the polymeric coating defines both surfaces of the film.
7. The device of claim 5 , wherein the polymeric coating comprises an ethylene-vinyl acetate copolymer.
8. The device of claim 5 , wherein the film comprises a polymeric film.
9. The device of claim 1 , wherein the intra-laminate disk layer defines a substantially circular disk.
10. The device of claim 9 , wherein the intra-laminate disk layer is substantially centered with respect to the adhesive gap defined by the adhesive layer and the connection aperture defined by the encapsulating substrate.
11. The device of claim 10 , wherein the disk has a disk diameter and the connection aperture defines an aperture diameter, and wherein the disk diameter is about 5% larger to about 200% larger than the aperture diameter.
12. The device of claim 1 , wherein the intra-laminate disk layer defines a thickness of about 50 μm to about 400 μm.
13. The device of claim 1 , further comprising:
a junction box positioned on the encapsulating substrate and over the connection aperture, wherein the first lead and the second lead are connected to the junction box.
14. The device of claim 1 , wherein the plurality of thin film layers comprises:
a transparent conductive oxide layer on the glass substrate;
a resistive transparent buffer layer on the transparent conductive oxide layer;
an n-type layer on the resistive transparent buffer layer, wherein the n-type layer comprises cadmium sulfide;
a p-type layer on the n-type layer, wherein the p-type layer comprises cadmium telluride;
and,
a back contact on the p-type layer.