Method of doping organic semiconductors
View Patent ↗A method includes the steps of forming a contiguous semiconducting region and heating the region. The semiconducting region includes polyaromatic molecules. The heating raises the semiconducting region to a temperature above room temperature. The heating is performed in the presence of a dopant gas and the absence of light to form a doped organic semiconducting region.
1. A method, comprising:
forming a contiguous semiconducting region that includes polyaromatic molecules; and
heating said region to a temperature above room temperature in the presence of a dopant gas in an absence of light having visible and shorter wavelengths to form a doped organic semiconducting region.
2. The method of claim 1 , further comprising forming a barrier to said dopant gas over said semiconducting region.
3. The method of claim 1 , wherein said dopant gas includes oxygen.
4. The method of claim 1 , further comprising forming a barrier that substantially prevents exposure of said semiconducting region to said dopant gas after said heating.
5. The method of claim 4 , wherein said barrier blocks light from illuminating said region.
6. The method of claim 4 , wherein said barrier includes a dielectric layer substantially impermeable to said dopant gas.
7. The method of claim 1 , further comprising forming a source and drain electrode on a surface of said organic semiconducting region and a gate electrode on a surface of said dielectric layer, thereby forming a FET transistor.
8. The method of claim 7 , further comprising setting a threshold voltage of said FET transistor to a predetermined level after forming said electrodes.
9. The method of claim 8 , wherein said threshold voltage is set by heating said polyaromatic molecules with a source of spatially confined energy.
10. The method of claim 8 , wherein said threshold voltage is set while operating said FET transistor.
11. The method of claim 1 , wherein a mobility of majority charge carriers in said semiconducting region changes by about 10% or less after doping said semiconducting region.
12. The method of claim 1 , wherein molecules of said region are selected from the group consisting of acenes and thiophenes.
13. The method of claim 12 , wherein said polyaromatic molecules comprises rubrene.
14. A method, comprising:
forming an organic semiconducting region that includes a crystalline region of polyaromatic molecules;
forming a dielectric layer over said organic semiconducting region;
forming an opening in said dielectric layer to expose said organic semiconducting region;and
then heating said crystalline region to a temperature above room temperature in the absence of light having visible and shorter wavelengths.
15. The method of claim 14 , wherein said heating includes exposing said crystalline region to a dopant gas comprising oxygen during said heating.
16. The method of claim 14 , wherein said heating includes exposing said crystalline region to an ambient with an oxygen partial pressure of about 10 Pa or less during said heating.
17. The method of claim 14 , wherein said heating includes heating said crystalline region to a temperature ranging from about 90° C. to about 150° C.