Static eliminator, and microphone electretizing method and apparatus using static eliminator
View Patent ↗The static eliminator includes an ionizer including a power source and an electrode which applies ions to an electretized dielectric film to eliminate electric charges formed on the electretized dielectric film. The electrified substance is in an electrically non-grounded state when the electric charges on the electretized dielectric film are eliminated.
1. A static eliminator comprising:
an ionizer comprising a power source and an electrode which applies ions to an electretized dielectric film to eliminate electric charges formed on the electretized dielectric film,
wherein the electretized dielectric film is in an electrically non-grounded state when the electric charges on the electretized dielectric film are eliminated.
2. The static eliminator according to claim 1 , comprising:
a conductive substance,
wherein the conductive substance induces an electric field on the dielectric film and is in an electrically non-grounded state when the electric charges on the electretized dielectric film are eliminated.
3. The static eliminator according to claim 2 ,
wherein the conductive substance is connected to the dielectric film.
4. The static eliminator according to claim 1 ,
wherein the electrode is a needle electrode.
5. The static eliminator according to claim 1 ,
wherein the dielectric film is formed on a second film,
wherein the second film is formed on a substrate, and
wherein a third film is formed opposed to the second film.
6. The static eliminator according to claim 5 ,
wherein the second film is a vibrating film, and
wherein the third film is a fixed film.
7. The static eliminator according to claim 5 ,
wherein the substrate is in an electrically non-grounded state when the electric charges on the electretized dielectric film are eliminated.
8. A microphone electretizing apparatus for electretizing a dielectric film provided in a microphone, the apparatus comprising:
an ionizer which electretizes the dielectric film and eliminates electric charges on the electretized dielectric film,
wherein, the electretized dielectric film, and a support for supporting the dielectric film or a vicinity thereof are in an electrically non-grounded state when the electric charges on the electretized dielectric film are eliminated.
9. The microphone electretizing apparatus according to claim 8 ,
wherein the dielectric film is formed on a second film,
the second film is formed on a substrate,
a third film is formed opposed to the second film.
10. The microphone electretizing apparatus according to claim 9 ,
wherein the second film is a vibrating film, and
wherein the third film is a fixed film.
11. The microphone electretizing apparatus according to claim 9 ,
wherein the substrate is in an electrically non-grounded state when the electric charges on the electretized dielectric film are eliminated.
12. A static eliminating method comprising:
eliminating electric charges on an electretized dielectric film by applying ions to the electretized dielectric film using the ionizer while the dielectric film is in an electrically non-grounded state.
13. A microphone electretizing method comprising:
electretizing a dielectric film by applying ions to the dielectric film using an ionizer; and
eliminating electric charges on the electretized dielectric film by applying ions to the electretized dielectric film using the ionizer while the dielectric film is in an electrically non-grounded state.
14. The microphone electretizing method according to claim 13 ,
wherein the dielectric film is formed above a wafer, and
wherein said electretizing is performed on the wafer.