Granted Patent B2

US 8,603,253 · App. 12/879,895 · Granted Dec 10, 2013

Abstract

Claims (22)

1. A method of cleaning a cadmium telluride surface, comprising removing at least a portion of a carbon-containing material layer from the cadmium telluride surface by contacting a cleaning agent with the cadmium telluride surface; and, forming a back contact layer over the cleaned cadmium telluride surface.

2. The method of claim 1 , wherein the cleaning agent comprises an acidic solution.

3. The method of claim 2 , wherein the acidic solution has a pH value in the range of about 3 to about 5.

4. The method of claim 2 , wherein the acidic solution comprises an organic acid.

5. The method of claim 2 , wherein the acidic solution comprises an acid selected from the group consisting of aspartic acid, citric acid, gluconic acid, glutamic acid, maleic acid, oxalic acid, propionic acid, salicylic acid, and tartaric acid.

6. The method of claim 1 , wherein the cleaning agent comprises an alkaline solution.

7. The method of claim 6 , wherein the alkaline solution has a pH value higher than about 9.

8. The method of claim 6 , wherein the pH value of the alkaline solution is adjusted by an amine compound.

9. The method of claim 8 , wherein the amine compound is selected from the group consisting of ethylene diamine, tetra-alkyl ammonium salt, isopropanolamine, and isopropylhydroxylamine.

10. The method of claim 1 , wherein the cleaning agent comprises a surfactant.

11. The method of claim 10 , wherein the surfactant comprises a cationic surfactant.

12. The method of claim 10 , wherein the surfactant comprises an anionic surfactant.

13. The method of claim 10 , wherein the surfactant comprises a nonionic surfactant.

14. The method of claim 1 , wherein the cleaning agent comprises a chelating agent.

15. The method of claim 14 , wherein the chelating agent is selected from the group consisting of ethylene diamine, gluconic acid, isopropanolamine, isopropylhydroxylamine, dicarboxymethylglutamic acid, ethylenediamine-N,N′-disuccinic acid, and ethylenediaminetetraacetic acid.

16. The method of claim 1 , wherein the cleaning agent comprises ferric ammonium citrate, ferric chloride, ferric nitrate, ammonium cerium nitrate, N-bromosuccinamide, copper chlorate, pyridinium tribromide, or trifluoro-peracetic acid.

17. The method of claim 1 , wherein the step of removing a portion of the carbon-containing material layer alters the thickness of the carbon-containing material layer.

18. The method of claim 1 , further comprising adjusting the thickness of a semiconductor absorber layer which comprises the cadmium telluride surface, wherein adjusting the thickness of a semiconductor absorber layer comprises the step of contacting the cleaning agent with the cadmium telluride surface such as to alter the thickness of the carbon-containing material layer.

19. The method of claim 1 , wherein the step of contacting a cleaning agent with the cadmium telluride surface further comprises removing the carbon-containing material layer, and the method further comprises adjusting the cadmium/telluride ratio on the cadmium telluride surface after the step of removing the carbon-containing material layer.

20. The method of claim 1 , wherein the back contact layer comprises a metal and a metal oxide.

21. The method of claim 20 , further comprising adjusting the metal to metal oxide ratio in the back contact layer.

22. The method of claim 1 , wherein the step of contacting a cleaning agent with the cadmium telluride surface comprises an etch process.

Assignments (7)