Apparatus and method for aligning mask
An apparatus and method for aligning a mask that includes disposing and firstly aligning a mask over a first substrate, with a space interposed therebetween, bringing the mask into contact with the first substrate and then measuring the alignment state of the mask with respect to the first substrate to detect an alignment error, secondly aligning the mask with respect to the first substrate based on the alignment error, transferring the first substrate to the next process, disposing and thirdly aligning the mask over a second substrate with the space interposed therebetween, and bringing the mask into contact with the second substrate.
1. A method for aligning a mask, comprising:
disposing and firstly aligning a mask over a first substrate, with a space interposed between the mask and the first substrate to create a first alignment state;
bringing the mask into contact with the first substrate and then measuring the first alignment state of the mask with respect to the first substrate to detect an alignment error;
aligning the mask with respect to the first substrate to create a second alignment state based on the alignment error;
transferring the first substrate to a next process;
disposing and aligning the mask over a second substrate with a space interposed between the mask and the second substrate creating a third alignment state; and
bringing the mask into contact with the second substrate,
wherein the creation of the third alignment state involves aligning the mask in the second alignment state with respect to the second substrate.
2. The method of claim 1 , wherein the first alignment state involves initially aligning the mask with respect to the first substrate based on a first alignment value that is set and stored.
3. The method of claim 2 , wherein the value of the detected alignment error is stored.
4. The method of claim 3 , wherein the second alignment state involves realigning the mask contacting the first substrate with respect to the first substrate so as to be spaced apart by a predetermined gap from the first substrate.
5. The method of claim 4 , wherein the predetermined gap refers to a gap with a width in one direction that is smaller than the space.
6. The method of claim 5 , wherein the second alignment state is performed a plurality of times.
7. The method of claim 6 , wherein the third alignment state involves initially aligning the mask with respect to the second substrate based on a third alignment value obtained by comparing the first alignment state and the second alignment state.
8. The method of claim 7 , wherein the third alignment value is obtained by subtracting the value of the alignment error from the first alignment value.
9. The method of claim 1 , wherein the third alignment state involves sequentially performing the first and second alignments in the first and second alignment states of the mask on the second substrate.
10. The method of claim 1 , further comprising:
transferring the second substrate to a next process;
disposing and aligning the mask over a third substrate in a fourth alignment state, with a space interposed between the mask and the third substrate; and
bringing the mask into contact with the third substrate,
wherein the fourth alignment state involves aligning the mask in the third alignment state with respect to the third substrate.
11. The method of claim 1 , further comprising:
measuring the alignment state of the mask with respect to the second substrate.
12. An apparatus for aligning a mask, comprising:
a substrate support to support a substrate;
a mask support to support a mask;
a driver for driving the mask support;
a measuring unit that measures an alignment state of the mask with respect to the substrate; and
a controller that determines a compensated alignment value according to the alignment state measured by the measuring unit and controlling the driver by the compensated alignment value to control the alignment of the mask with respect to the substrate,
wherein the compensated alignment value is obtained based on an alignment error detected by measuring the alignment state of the mask with respect to the substrate, which is measured in a previous process among a plurality of repeated processes.
13. The apparatus of claim 12 , wherein the controller transmits a driving signal based on the set alignment value to the driver to control the mask supported by the mask support to be initially aligned with respect to the substrate.
14. The apparatus of claim 13 , wherein the controller transmits a new driving signal to the driver according to the alignment state of the mask measured by the measuring unit to control the mask supported by the mask support to be realigned with respect to the substrate.
15. A method for aligning a mask, comprising:
disposing and aligning a mask over a first substrate, with a space interposed between the mask and the first substrate to create a first alignment state;
bringing the mask into contact with the first substrate and then measuring the first alignment state of the mask with respect to the first substrate to detect an alignment error;
aligning the mask with respect to the first substrate to create a second alignment state based on the alignment error;
transferring the first substrate to a next process;
disposing and aligning the mask over a second substrate with a space interposed between the mask and the second substrate creating a third alignment state;
bringing the mask into contact with the second substrate, transferring the second substrate to a next process;
disposing and aligning the mask over a third substrate in a fourth alignment state, with a space interposed between the mask and the third substrate; and
bringing the mask into contact with the third substrate,
wherein the creation of the third alignment state involves aligning the mask in the second alignment state with respect to the second substrate,
wherein the fourth alignment state involves aligning the mask in the third alignment state with respect to the third substrate,
wherein the mask is a same mask or a different mask.
16. The method of claim 15 , wherein the second alignment state involves realigning the mask contacting the first substrate with respect to the first substrate so as to be spaced apart by a predetermined gap from the first substrate.
17. The method of claim 16 , wherein the predetermined gap refers to a gap with a width in one direction that is smaller than the space.
18. The method of claim 17 , wherein the second alignment state is performed a plurality of times.
19. The method of claim 18 , wherein the third alignment state involves initially aligning the mask with respect to the second substrate based on a third alignment value obtained by comparing the first alignment state and the second alignment state.
20. The method of claim 19 , wherein the third alignment value is obtained by subtracting the value of the alignment error from the first alignment value.