Semiconductor device and method for manufacturing the same
A semiconductor device which eliminates the need for high fillability through a simple process and a method for manufacturing the same. A high breakdown voltage lateral MOS transistor including a source region and a drain region is completed on a surface of a semiconductor substrate. A trench which surrounds the transistor when seen in a plan view is made in the surface of the semiconductor substrate. An insulating film is formed over the transistor and in the trench so as to cover the transistor and form an air-gap space in the trench. Contact holes which reach the source region and drain region of the transistor respectively are made in an interlayer insulating film.
1. A method for manufacturing a semiconductor device comprising the steps of:
completing a device with a conductive portion over a main surface of a semiconductor substrate;
making a first trench surrounding the device when seen in a plan view, in the main surface of the semiconductor substrate;
making a second trench in the first trench;
forming an insulating film over the device and in the second trench so as to cover the device and make an air-gap space in the second trench; and
making, in the insulating film, a hole which reaches the conductive portion of the device.
2. The method for manufacturing a semiconductor device according to claim 1 , wherein the step of making the second trench comprises the steps of:
forming a mask film over the main surface of the semiconductor substrate;
patterning the mask film; and
making the second trench in the main surface of the semiconductor substrate using the patterned mask film as a mask.
3. The method for manufacturing a semiconductor device according to claim 2 , wherein the mask film is formed over the main surface of the semiconductor surface so as to contact the main surface directly.
4. The method for manufacturing a semiconductor device according to claim 2 , wherein the step of making the second trench further comprises a step of forming a silicon nitride film between the main surface of the semiconductor substrate and the mask film.
5. The method for manufacturing a semiconductor device according to claim 4 , wherein the step of making the second trench further comprises a step of forming a silicon oxide film between the main surface of the semiconductor substrate and the silicon nitride film.
6. The method for manufacturing a semiconductor device according to claim 2 , wherein the insulating film is formed over the mask film.
7. The method for manufacturing a semiconductor device according to claim 2 , further comprising a step of removing the mask film after formation of the second trench, wherein the insulating film is formed after removal of the mask film.
8. The method for manufacturing a semiconductor device according to claim 1 , further comprising a step of making a third trench in the main surface of the semiconductor substrate,
wherein the second trench is deeper in a region in which the third trench is formed, than the third trench.
9. A semiconductor device comprising:
a semiconductor substrate having a trench in a main surface thereof;
a device being formed over the main surface of the semiconductor substrate and having a conductive portion, the trench being formed so as to surround the device when seen in a plan view; and
an insulating film being formed over the device and in the trench so as to cover the device and form an air-gap space in the trench, the insulating film having a hole which reaches the conductive portion,
wherein a side surface of the trench on a same level of a bottom of the air-gap space directly contacts the semiconductor substrate.