IP Library Granted Patent US 8,237,225
Granted Patent B2
US 8,237,225 · App. 12/882,874 · Granted Aug 7, 2012

Semiconductor device for electrostatic discharge protection

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Quick Facts
Patent No.
US 8,237,225
App. No.
12/882,874
Granted
Aug 7, 2012
Kind
B2
Abstract

Provided is a semiconductor device for electrostatic discharge protection capable of protecting an inner circuit from both noises of an overcurrent noise of an ESD and an overcurrent noise of a latch-up test while achieving size reduction, by sharing a guard ring formed in a periphery of an ESD protection element with a cathode of a latch-up protection diode for protecting the inner circuit from the overcurrent noise of the latch-up test.

Claims (37)

1. A semiconductor device for electrostatic discharge protection, comprising:

a semiconductor substrate;

an electrostatic discharge (ESD) protection element disposed in a surface of the semiconductor substrate and connected between an input/output terminal and a ground terminal;

a first well region having the same conductivity type as the semiconductor substrate, and surrounding the ESD protection element;

a first high concentration substrate region having the same conductivity type as the semiconductor substrate, and surrounding the ESD protection element in the first well region;

a second well region having an opposite conductivity type to the conductivity type of the semiconductor substrate, and surrounding an outer side of the first well region;

a high concentration anode region having the same conductivity type as the semiconductor substrate, disposed in the second well region separately from the first well region; and

a second high concentration diffusion region having the opposite conductivity type to the conductivity type of the semiconductor substrate and disposed in the second well region, the second high concentration diffusion region surrounding the high concentration anode region disposed in the second well region and the first well region as a guard ring of the ESD protection element, the guard ring of the ESD protection element corresponding to a cathode of a latch-up protection diode, wherein:

the high concentration anode region is connected to the input/output terminal;

the first high concentration substrate region is connected to the ground terminal; and

the second high concentration diffusion region is connected to a power supply terminal.

2. A semiconductor device for electrostatic discharge protection according to claim 1 , wherein the ESD protection element comprises a protection diode which has an anode connected to the input/output terminal and a cathode connected to the ground terminal.

3. A semiconductor device for electrostatic discharge protection according to claim 1 , wherein the ESD protection element comprises a metal oxide semiconductor (MOS) transistor which has a drain connected to the input/output terminal and a source, a gate, and a backgate connected to the ground terminal.

4. A semiconductor device for electrostatic discharge protection, comprising:

a semiconductor substrate;

an electrostatic discharge (ESD) protection element disposed in a surface of the semiconductor substrate and connected between an input/output terminal and a ground terminal;

a first well region having the same conductivity type as the semiconductor substrate, and surrounding the ESD protection element;

a first high concentration substrate region having the same conductivity type as the semiconductor substrate, and surrounding the ESD protection element in the first well region;

a second well region having an opposite conductivity type to the conductivity type of the semiconductor substrate, and surrounding an outer side of the first well region;

a high concentration anode region having the same conductivity type as the semiconductor substrate, disposed in the second well region; and

a second high concentration diffusion region having the opposite conductivity type to the conductivity type of the semiconductor substrate, disposed in the second well region to surround each of the high concentration anode region and the first well region and to share a part thereof, wherein:

the high concentration anode region is connected to the input/output terminal;

the first high concentration substrate region is connected to the ground terminal; and

the second high concentration diffusion region is connected to a power supply terminal;

wherein the ESD protection element comprises a thyristor which has an anode connected to the input/output terminal and a cathode connected to the ground terminal.

5. A semiconductor device for electrostatic discharge protection, comprising:

a semiconductor substrate;

an electrostatic discharge (ESD) protection element disposed in a surface of the semiconductor substrate and connected between an input/output terminal and a ground terminal;

a first well region having the same conductivity type as the semiconductor substrate, and surrounding the ESD protection element;

a first high concentration substrate region having the same conductivity type as the semiconductor substrate, and surrounding the ESD protection element in the first well region;

a second well region having an opposite conductivity type to the conductivity type of the semiconductor substrate, and surrounding an outer side of the first well region;

a high concentration anode region having the same conductivity type as the semiconductor substrate, disposed in the second well region; and

a second high concentration diffusion region having the opposite conductivity type to the conductivity type of the semiconductor substrate, disposed in the second well region to surround each of the high concentration anode region and the first well region and to share a part thereof, wherein:

the high concentration anode region is connected to the input/output terminal;

the first high concentration substrate region is connected to the ground terminal;

the second high concentration diffusion region is connected to a power supply terminal; and

an embedded layer having the same conductivity type as the second well region, formed under the second well region so as to increase carrier recombination.

Assignments (5)
CHANGE OF ADDRESS Recorded Jun 8, 2023
From: ABLIC INC.
To: ABLIC INC.
Reel/Frame 064021/0575 →
CHANGE OF NAME Recorded Mar 12, 2018
From: SII SEMICONDUCTOR CORPORATION
To: ABLIC INC.
Reel/Frame 045567/0927 →
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 037783 FRAME: 0166. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Feb 23, 2016
From: SEIKO INSTRUMENTS INC
To: SII SEMICONDUCTOR CORPORATION
Reel/Frame 037903/0928 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 11, 2016
From: SEIKO INSTRUMENTS INC
To: SII SEMICONDUCTOR CORPORATION .
Reel/Frame 037783/0166 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2010
From: KATO, SHINJIRO
To: SEIKO INSTRUMENTS INC.
Reel/Frame 024995/0244 →