Method of manufacturing graphene, graphene manufactured by the method, conductive film comprising the graphene, transparent electrode comprising the graphene, and radiating or heating device comprising the graphene
View Patent ↗Provided are a method of manufacturing graphene, graphene manufactured by the method, a conductive thin film including the graphene, a transparent electrode comprising the graphene, and a radiating or heating device comprising the graphene. The method includes: preparing a graphene member including a base member, a hydrophilic oxide layer formed on the base member, a hydrophobic metal catalyst layer formed on the oxide layer, and graphene grown on the metal catalyst layer; applying water to the graphene member; separating the metal catalyst layer from the oxide layer; and removing the metal catalyst layer using an etching process.
1. A method of manufacturing graphene, the method comprising:
preparing a graphene member comprising a base member, a hydrophilic oxide layer formed on the base member, a hydrophobic metal catalyst layer formed on the oxide layer, and graphene grown on the metal catalyst layer;
applying water to the graphene member;
separating the metal catalyst layer from the oxide layer; and
removing the metal catalyst layer using an etching process,
wherein the applying water to the graphene member comprises generating a gap in between the oxide layer and the metal catalyst layer via the penetration of water between the oxide layer and the metal catalyst layer.
2. The method of claim 1 , wherein the base member comprises silicon (Si).
3. The method of claim 1 , wherein the oxide layer comprises silicon dioxide (SiO 2 ).
4. The method of claim 1 , wherein the metal catalyst layer comprises at least a metal selected from the group consisting of Ni, Cu, Al, Fe, Co, and W.
5. The method of claim 1 , wherein the preparing the graphene member further comprises disposing a transfer member onto the graphene.
6. The method of claim 5 , wherein the transfer member comprises a material selected from the group consisting of polydimethylsiloxane (PDMS), polyethylene terephthalate (PET), polyimide, glass, synthesized rubber, and natural rubber.
7. The method of claim 1 , wherein the applying water to the graphene member comprises ultrasonic wave processing on the graphene member by applying ultrasonic waves.
8. The method of claim 1 , wherein the applying water to the graphene member comprises soaking the graphene member in water in a water bath.
9. The method of claim 8 , wherein the separating the metal catalyst layer from the oxide layer is performed while the graphene member is soaked in water in the water bath.
10. The method of claim 1 , wherein the separating the metal catalyst layer from the oxide layer comprises applying a predetermined force to the graphene member.
11. The method of claim 1 , wherein the etching process is performed using at least one solution selected from the group consisting of an acid, a hydrogen fluoride solution, a buffered oxide etch (BOE) solution, a FeCl 3 solution, and a Fe(No 3 ) 3 solution.
12. The method of claim 1 further comprising, after the removing the metal catalyst layer using the etching process, transferring the graphene onto a substrate or a device.