Gas stream purification apparatus and method
View Patent ↗An apparatus and method for removing contaminants from a gas stream is provided which includes (a) introducing the gas stream into a reaction chamber of a scrubber; (b) oxidizing first contaminants in a liquid phase with a reactive species in a sump of the scrubber for providing an oxidizing solution; (c) oxidizing second contaminants in a gas phase of the gas stream above the sump with excess reactive species disengaging from the oxidizing solution in the sump; (d) oxidizing and scrubbing third contaminants in a gas-liquid contact assembly disposed above the gas stream.
1. A method for removing contaminants from a gas stream, comprising;
(a) introducing the gas stream into a reaction chamber of a scrubber;
(b) introducing reactive species in a liquid phase into a sump of the scrubber and oxidizing first contaminants in said liquid phase;
(c) providing an oxidizing solution from said oxidizing in (b);
(d) oxidizing second contaminants in a gas phase of the gas stream above the sump with excess reactive species disengaging from the oxidizing solution in the sump;
(e) oxidizing and scrubbing third contaminants in a gas-liquid contact assembly disposed above the gas stream;
wherein (b)-(e) occur simultaneously.
2. The method of claim 1 , wherein the reactive species is selected from ozone and plasma.
3. The method of claim 1 , wherein the gas stream comprises a gas selected from the group consisting of carbon dioxide, nitrogen, chemical processing gas, and pollutant waste gas.
4. The method of claim 1 , wherein the gas stream introduced into the reaction chamber is at a temperature of from 4° C. to 60° C.
5. The method of claim 1 , wherein the gas stream introduced into the reaction chamber is at a pressure of from 1 Bar to 2 Bar absolute.
6. The method of claim 1 , wherein the oxidizing solution as a pH of from 2 to 11.
7. The method of claim 1 , further comprising removing the oxidizing solution from the sump and dispensing the oxidizing solution into the reaction chamber above the gas-liquid contact assembly.
8. The method of claim 7 , further comprising directing a flow of the oxidizing solution in the sump and increasing residence time of the oxidizing solution in the sump.