IP Library Granted Patent US 8,004,098
Granted Patent B2
US 8,004,098 · App. 12/898,492 · Granted Aug 23, 2011

Alignment key, method for fabricating the alignment key, and method for fabricating thin film transistor substrate using the alignment key

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Quick Facts
Patent No.
US 8,004,098
App. No.
12/898,492
Granted
Aug 23, 2011
Kind
B2
Abstract

An alignment key, a method for fabricating the alignment key, and a method for fabricating a thin film transistor substrate using the alignment key are provided. The alignment key includes a base substrate, a first alignment key and a first mark portion of a second alignment key, which are formed on the base substrate using a printing roll, a dielectric that is formed on the base substrate to cover the first alignment key, and a second mark portion of the second alignment key, which is formed on the dielectric and at least partly overlaps the first mark portion of the second alignment key.

Claims (6)

1. An alignment key comprising:

a base substrate;

a first alignment key and a first mark portion of a second alignment key, which are formed on the base substrate using a printing roll;

a dielectric that is formed on the base substrate to cover the first alignment key; and

a second mark portion of the second alignment key, which is formed on the dielectric and at least partly overlaps the first mark portion of the second alignment key.

2. The alignment key according to claim 1 , wherein the first and second mark portions interest each other at a right angle.

Assignments (2)
RELEASE OF SECURITY INTEREST Recorded Mar 29, 2017
From: PAR INVESTMENT PARTNERS, L.P.
To: LUMEXIS CORPORATION
Reel/Frame 041789/0015 →
SECURITY INTEREST Recorded Oct 5, 2015
From: LUMEXIS CORPORATION
To: PAR INVESTMENT PARTNERS, L.P.
Reel/Frame 036729/0778 →