IP Library Granted Patent US 8,524,048
Granted Patent B2
US 8,524,048 · App. 12/898,494 · Granted Sep 3, 2013

Processes for recovering silane from heavy-ends separation operations

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Quick Facts
Patent No.
US 8,524,048
App. No.
12/898,494
Granted
Sep 3, 2013
Kind
B2
Abstract

Processes and systems for purifying silane-containing streams are disclosed with relatively less silane being lost in impurity streams by use of distillation and/or condensation operations.

Claims (25)

1. A process for purifying a silane-containing stream, the stream comprising silane and one or more compounds having a boiling point greater than silane and being substantially free of trichlorosilane, tetrachlorosilane and tetraflourosilane, the process comprising:

introducing the silane-containing stream to a heavy-ends distillation column to produce a silane-enriched overhead fraction and a silane-depleted bottoms fraction relative to the silane-containing stream, the silane-depleted bottoms fraction comprising silane and being enriched in one or more compounds having a boiling point greater than silane relative to the silane-containing stream; and

introducing the silane-depleted bottoms fraction to a silane-recovery separation unit to produce a silane-enriched fraction and a silane-depleted fraction relative to the silane-depleted bottoms fraction produced from the heavy-ends distillation column.

2. The process as set forth in claim 1 wherein the silane-recovery separation unit is a distillation column which produces a silane-recovery separation unit silane-enriched overhead fraction and a silane-recovery separation unit silane-depleted bottoms fraction relative to the silane-depleted bottoms fraction produced from the heavy-ends distillation column.

3. The process as set forth in claim 1 comprising introducing a feed stream to a light-ends distillation column to produce an overhead fraction and a bottoms fraction, the feed stream comprising silane, one or more compounds having a boiling point greater than silane and one or compounds having a boiling point less than silane, the overhead fraction being depleted in silane and enriched in compounds having a boiling point less than silane, the bottoms fraction being enriched in silane and depleted in compounds having a boiling point less than silane, wherein a portion of the bottoms fraction forms the silane-containing stream that is fed to the heavy-ends distillation column.

4. The process as set forth in claim 1 wherein the silane-enriched overhead fraction produced from the heavy-ends distillation column comprises compounds having a boiling point less than silane and wherein the silane-enriched overhead fraction is introduced into a light-ends distillation column to form a silane-depleted overhead fraction comprising compounds having a boiling point less than silane and a silane-enriched bottoms fraction relative to the silane-enriched overhead fraction produced from the heavy-ends distillation column.

5. The process as set forth in claim 3 wherein the silane-enriched fraction produced from the silane-recovery separation unit is recycled by introducing it into the light-ends distillation column.

6. The process as set forth in claim 3 wherein the amount of silane in the silane-depleted fraction produced from the silane-recovery separation unit is less than about 10 wt % of the silane in the silane-depleted bottoms fraction produced from the heavy-ends distillation column.

7. The process as set forth in claim 3 wherein the sum of the amount of silane in the overhead fraction produced from the light-ends distillation column and the silane-depleted fraction produced from the silane-recovery separation unit is less than about 15 wt % of the silane in the silane-containing stream.

8. The process as set forth in claim 3 wherein the feed stream and the silane-enriched overhead fraction produced from the heavy-ends distillation column comprise ethylene and wherein the silane-enriched overhead fraction produced from the heavy-ends distillation column is introduced into an adsorber to remove a portion of the ethylene and form an ethylene-depleted effluent stream.

9. The process as set forth in claim 8 wherein the adsorber comprises a molecular sieve which causes a portion of the ethylene to react with silane and form ethylsilane, the process further comprising introducing the ethylene-depleted effluent stream which comprises ethylsilane to a ethylsilane distillation column to produce an ethylsilane-depleted overhead fraction comprising purified silane product and an ethylsilane-enriched bottoms fraction relative to the ethylene-depleted effluent stream produced from the adsorber.

10. The process as set forth in claim 9 wherein the ethylsilane-enriched bottoms fraction is recycled by introducing the ethylsilane-enriched bottoms fraction into the light-ends distillation column.

11. The process as set forth in claim 2 wherein the temperature of the silane-depleted bottoms fraction produced from the silane-recovery distillation column is from about 70° C. to about 130° C. upon discharge from the silane-recovery distillation column.

12. The process as set forth in claim 2 wherein the silane-recovery distillation column operates at an overhead pressure of from about 1500 kPa to about 2600 kPa (about 220 psia to about 380 psia).

13. The process as set forth in claim 3 wherein the components of the feed stream do not substantially undergo any reaction until being discharged as the overhead fraction produced from the light-ends distillation column, as the silane-enriched overhead fraction produced from the heavy-ends distillation column, the silane-enriched overhead fraction produced from the silane-recovery separation unit and the silane-depleted bottoms fraction produced from the silane-recovery separation unit.

14. The process as set forth in claim 1 wherein the silane-containing stream is substantially free of alkali or alkaline earth-metal silanes.

15. A process for purifying a silane-containing stream, the stream comprising silane and one or more compounds having a boiling point greater than silane, the process comprising:

introducing the silane-containing stream to a heavy-ends distillation column to produce a silane-enriched overhead fraction and a silane-depleted bottoms fraction relative to the silane-containing stream, the silane-depleted bottoms fraction comprising silane and being enriched in one or more compounds having a boiling point greater than silane relative to the silane-containing stream; and

introducing the silane-depleted bottoms fraction to a silane-recovery separation unit to produce a silane-enriched fraction and a silane-depleted fraction relative to the silane-depleted bottoms fraction produced from the heavy-ends distillation column;

wherein the one or more compounds having a boiling point greater than silane are selected from the group consisting of ethane, ethylene, ethyl-silane, diethyl silane, toluene, dimethoxyethane and mixtures thereof.

16. A process for purifying a silane-containing stream, the stream comprising silane and one or more compounds having a boiling point greater than silane, the process comprising:

introducing a feed stream to a light-ends distillation column to produce an overhead fraction and a bottoms fraction, the feed stream comprising silane, one or more compounds having a boiling point greater than silane and one or compounds having a boiling point less than silane, the overhead fraction being depleted in silane and enriched in compounds having a boiling point less than silane, the bottoms fraction being enriched in silane and depleted in compounds having a boiling point less than silane, wherein a portion of the bottoms fraction forms the silane-containing stream that is fed to the heavy-ends distillation column;

introducing the silane-containing stream to a heavy-ends distillation column to produce a silane-enriched overhead fraction and a silane-depleted bottoms fraction relative to the silane-containing stream, the silane-depleted bottoms fraction comprising silane and being enriched in one or more compounds having a boiling point greater than silane relative to the silane-containing stream; and

introducing the silane-depleted bottoms fraction to a silane-recovery separation unit to produce a silane-enriched fraction and a silane-depleted fraction relative to the silane-depleted bottoms fraction produced from the heavy-ends distillation column;

wherein the one or more compounds having a boiling point less than silane are selected from the group consisting of hydrogen, nitrogen and methane.

Assignments (11)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2017
From: SUNEDISON, INC.; SUNEDISON PRODUCTS SINGAPORE PTE. LTD.; MEMC PASADENA, INC.; SOLAICX
To: CORNER STAR LIMITED
Reel/Frame 042351/0659 →
PATENT SECURITY AGREEMENT Recorded Apr 28, 2016
From: SUNEDISON, INC.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS ADMINISTRATIVE AGENT
Reel/Frame 038557/0472 →
SECURITY INTEREST Recorded Jan 13, 2016
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
To: WILMINGTON TRUST, NATIONAL ASSOCIATION, SOLELY IN ITS CAPACITY AS COLLATERAL TRUSTEE
Reel/Frame 037508/0606 →
RELEASE OF SECURITY INTEREST Recorded Jan 13, 2016
From: GOLDMAN SACHS BANK USA, AS ADMINISTRATIVE AGENT
To: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
Reel/Frame 037508/0884 →
SECURITY INTEREST Recorded Aug 11, 2015
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
To: GOLDMAN SACHS BANK USA, AS ADMINISTRATIVE AGENT
Reel/Frame 036329/0470 →
CHANGE OF NAME Recorded Jul 27, 2015
From: MEMC ELECTRONIC MATERIALS, INC.
To: SUNEDISON, INC.
Reel/Frame 036190/0526 →
RELEASE OF SECURITY INTEREST Recorded Mar 3, 2014
From: DEUTSCHE BANK AG NEW YORK BRANCH
To: NVT, LLC; SUN EDISON LLC; SOLAICX; SUNEDISON, INC.
Reel/Frame 032382/0724 →
SECURITY AGREEMENT Recorded Feb 28, 2014
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC; ENFLEX CORPORATION
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
Reel/Frame 032372/0610 →
SECURITY AGREEMENT Recorded Jan 30, 2014
From: SUNEDISON, INC.; SOLAICX; SUN EDISON, LLC; NVT, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 032177/0359 →
RELEASE OF SECURITY INTEREST Recorded Dec 26, 2013
From: GOLDMAN SACHS BANK USA
To: NVT, LLC; SUN EDISON LLC; SOLAICX; SUNEDISON, INC. (F/K/A MEMC ELECTRONIC MATERIALS, INC.)
Reel/Frame 031870/0092 →
SECURITY AGREEMENT Recorded Oct 1, 2012
From: NVT, LLC; SUN EDISON LLC; SOLAICX, INC.; MEMC ELECTRONIC MATERIALS, INC.
To: GOLDMAN SACHS BANK USA
Reel/Frame 029057/0810 →