IP Library Granted Patent US 8,247,815
Granted Patent B2
US 8,247,815 · App. 12/900,634 · Granted Aug 21, 2012

Thin film transistor, and display apparatus having the same

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Quick Facts
Patent No.
US 8,247,815
App. No.
12/900,634
Granted
Aug 21, 2012
Kind
B2
Abstract

A method of fabricating a thin film transistor includes forming a gate electrode on a substrate, forming a semiconductor layer on the gate electrode, forming a source electrode on the semiconductor layer, forming a drain electrode on the semiconductor layer spaced apart from the source electrode, forming a copper layer pattern on the source electrode and the drain electrode, exposing the copper layer pattern on the source electrode and the drain electrode to a fluorine-containing process gas to form a copper fluoride layer pattern thereon, and patterning the semiconductor layer.

Claims (18)

1. A display apparatus comprising:

a first substrate comprising a pixel area;

a gate line formed on the first substrate;

a data line formed on the first substrate, the data line being insulated from and intersecting the gate line;

a gate electrode which extends from the gate line;

a semiconductor layer formed on the gate electrode;

a source electrode formed on the semiconductor layer and which extends from the data line;

a drain electrode formed on the semiconductor layer and spaced apart from the source electrode;

a pixel electrode formed in the pixel area and electrically connected to the drain electrode;

a second substrate; and

a common electrode formed on the second substrate substantially facing the pixel electrode, and

wherein the data line, the source electrode and the drain electrode each comprise a copper layer pattern and a copper fluoride layer pattern formed on a surface of the copper layer pattern.

2. The display apparatus of claim 1 , wherein the semiconductor layer comprises:

a first semiconductor layer pattern formed on the gate electrode and comprising an intrinsic semiconductor; and

a second semiconductor layer pattern comprising an impurity semiconductor, formed on the first semiconductor layer pattern and comprising:

a first portion disposed substantially on the source electrode; and

a second portion disposed substantially on the drain electrode.

3. The display apparatus of claim 2 , wherein at least a portion of the second semiconductor layer pattern overlaps at least a portion of the data line, at least a portion of the source electrode and at least a portion of the drain electrode.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 21, 2022
From: SAMSUNG DISPLAY CO., LTD.
To: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
Reel/Frame 060778/0487 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 11, 2012
From: SAMSUNG ELECTRONICS CO., LTD.
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 029151/0055 →