Method of manufacturing thermal assisted magnetic write head
View Patent ↗A method of manufacturing a thermally-assisted magnetic write head is provided. The method includes steps of: forming a laminate structure including the waveguide; the plasmon generator, and the magnetic pole in order; performing a first polishing process to planarize an end surface of the laminate structure; performing a first etching process to remove impurity attached on the end surface of the laminate structure, and to allow the plasmon generator to be recessed from the waveguide and the magnetic pole, thereby forming a recessed region on the end surface of the laminate structure; forming a protection layer on the end surface of the laminate structure such that at least the recessed region is filled; and performing a second polishing process on the end surface of the laminate structure formed with the protection layer until the plasmon generator is exposed, thereby completing the air bearing surface.
1. A method of manufacturing a thermally-assisted magnetic write head which has a magnetic pole including an end surface exposed from an air bearing surface, a waveguide extending toward the air bearing surface for transmission of a light, and a plasmon generator provided between the magnetic pole and the waveguide for generating a near-field light from the air bearing surface based on the light transmitted over the waveguide, the method comprises steps of:
forming a laminate structure including the waveguide, the plasmon generator, and the magnetic pole;
performing a first polishing process to planarize an end surface of the laminate structure;
performing a first etching process to remove impurities attached on the end surface of the laminate structure, and to allow the plasmon generator to be recessed from the waveguide and the magnetic pole, thereby forming a recessed region from the end surface of the laminate structure;
forming a protection layer on the end surface of the laminate structure such that at least the recessed region is filled; and
starting a second polishing process on the end surface of the laminate structure formed with the protection layer, and stopping the second polishing process before the plasmon generator is exposed, thereby completing the air bearing surface.
2. The method of manufacturing thermally-assisted magnetic write head according to claim 1 , wherein
the second polishing process is followed by a second etching process performed on the air bearing surface.
3. The method of manufacturing thermally-assisted magnetic write head according to claim 1 , wherein
the laminate structure is formed through disposing, on a base, the waveguide, the plasmon generator, and the magnetic pole in this order.
4. The method of manufacturing thermally-assisted magnetic write head according to claim 3 , wherein
the protection layer is made of a magnetic material whose saturation flux density is equal to or higher than that of a material configuring the magnetic pole.
5. The method of manufacturing thermally-assisted magnetic write head according to claim 4 , wherein
the protection layer is made of a soft magnetic material including one or more selected from a group configured of Ni (nickel), Fe (iron), and Co (cobalt).
6. The method of manufacturing thermally-assisted magnetic write head according to claim 3 , wherein
the protection layer is made of a material including one or more selected from a group configured of Ni (nickel), Fe (iron), Co (cobalt), Cr (chromium), Ta (tantalum), Ti (titanium), Ru (ruthenium), W (tungsten), and Mo (molybdenum), or a material including one or more selected from a group configured of Al 2 O 3 (aluminum oxide), AlN (aluminum nitride), BN (boron nitride), SiO 2 (silicon dioxide), SiC (silicon dioxide), DLC (diamond-like carbon), AgNi, AgPd, AuNi, AuCu, and AlNi.
7. The method of manufacturing thermally-assisted magnetic write head according to claim 1 , wherein
an end surface, recessed from the waveguide and the magnetic pole, of the plasmon generator is formed to tilt against the air bearing surface.