Glass substrate for information recording medium and magnetic disk
View Patent ↗To provide a process to improve acid resistance of a glass substrate for an information recording medium. A process for producing the glass substrate for an information recording medium, includes processing a glass formed into a plate by a float process, a down-draw method or a press method, wherein, in cooling the glass at the last step the glass has a temperature of at least its strain point, the time during which the glass temperature is at least its strain point and at most a temperature where the glass viscosity is 10 10 dPa·s is at least 13 minutes.
1. A glass substrate, comprising:
an alkali aluminosilicate glass,
wherein a difference T f -T g obtained by subtracting a glass transition temperature T g of the alkali aluminosilicate glass from a fictive temperature T f , of the alkali aluminosilicate glass is from −32 to +5° C., and
the alkali aluminosilicate glass has an alkali metal oxide content of from 15 to 26 mol%.
2. A glass substrate, comprising:
an alkali aluminosilicate glass,
wherein a difference T f -T g obtained by subtracting a glass transition temperature T g of the alkali aluminosilicate glass from a fictive temperature T f , of the alkali aluminosilicate glass is from −32 to +5° C., and
the alkali aluminosilicate glass has an alkali metal oxide content of from 15 to 26 mol%, comprising, by mol% based on the following oxides:
from 64 to 67% of SiO 2 ,
from 8 to 10% of Al 2 O 3 ,
from 10 to 13% of Li 2 O,
from 9 to 12% of Na 2 O,
from 0 to 2% of K 2 O, and
from 2 to 4% of ZrO 2 ,
wherein a total content of Li 2 O, Na 2 O, and K 2 O, (Li 2 O+Na 2 O+K 2 O), is from 21 to 25%.
3. A magnetic disk, comprising:
the substrate of claim 1 , and
a magnetic recording layer on the substrate.
4. The substrate of claim 1 ,
wherein a sum
C Li +C Na +C K
is at most 7 nmol/cm 2 , and
C Li , C Na , and C K are respectively amounts of Li, Na, and K that are precipitated on a glass surface of the substrate after exposure to a water-vapor atmosphere at 120° C. at 0.2 MPa for 20 hours.
5. The substrate of claim 1 , wherein a density of the substrate is at most 2.60 g/cm 3 .
6. The substrate of claim 1 , wherein a Young's modulus of the substrate is at least 76 GPa.
7. The substrate of claim 1 , wherein a specific modulus of the substrate is at least 28 MNm/kg.
8. The substrate of claim 1 , wherein an average linear expansion coefficient of the substrate is at least 56·10 −7 /° C. from −50 to 70° C.
9. The substrate of claim 1 ,
wherein a content of SiO 2 is from 61 to 71%, and
a content of Al 2 O 3 is from 7 to 17%.
10. The substrate of claim 1 ,
wherein a content of Li 2 O is from 6 to 16%,
a content of Na 2 O is from 2 to 13%, and
a content of K 2 O is from 0 to 8%.