IP Library Granted Patent US 8,449,848
Granted Patent B2
US 8,449,848 · App. 12/910,553 · Granted May 28, 2013

Production of polycrystalline silicon in substantially closed-loop systems

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Quick Facts
Patent No.
US 8,449,848
App. No.
12/910,553
Granted
May 28, 2013
Kind
B2
Abstract

Production of polycrystalline silicon in a substantially closed-loop process is disclosed. The processes generally include decomposition of trichlorosilane produced from metallurgical grade silicon.

Claims (19)

1. A system for producing polycrystalline silicon by decomposition of trichlorosilane, the system being substantially closed-loop with respect to trichlorosilane, the system comprising:

a chlorination reactor in which hydrogen chloride is contacted with silicon to produce trichlorosilane and silicon tetrachloride;

a fluidized bed reactor in which trichlorosilane is decomposed to produce polycrystalline silicon;

a hydrogenation reactor in which silicon tetrachloride and hydrogen are introduced to produce trichlorosilane;

a hydrogenated gas separator to which hydrogenated gas from the hydrogenation reactor is directly introduced, the hydrogenated gas comprising trichlorosilane, hydrogen chloride, unreacted hydrogen and unreacted silicon tetrachloride, wherein the hydrogenated gas separator separates trichlorosilane and unreacted silicon tetrachloride from hydrogen and unreacted hydrogen chloride; and

a purification system to which trichlorosilane and silicon tetrachloride are directly introduced from the chlorination reactor to separate trichlorosilane and silicon tetrachloride.

2. The system as set forth in claim 1 comprising:

a conveying apparatus selected from the group consisting of a recirculation fan and a blower for conveying trichlorosilane from the hydrogenation reactor to the fluidized bed reactor; and

a conveying apparatus selected from the group consisting of a recirculation fan and a blower for conveying trichlorosilane from the chlorination reactor to the fluidized bed reactor.

3. The system as set forth in claim 1 comprising:

a conveying apparatus selected from the group consisting of a recirculation fan and a blower for conveying trichlorosilane from the purification system to the fluidized bed reactor; and

a conveying apparatus selected from the group consisting of a recirculation fan and a blower for conveying silicon tetrachloride from the purification system to the hydrogenation reactor.

4. The system as set forth in claim 1 comprising an effluent gas separator to which effluent gas from the fluidized bed reactor is introduced, the effluent gas comprising silicon tetrachloride, hydrogen and unreacted trichlorosilane, wherein the effluent gas separator separates hydrogen from trichlorosilane and silicon tetrachloride.

5. The system as set forth in claim 4 comprising a conveying apparatus selected from the group consisting of a recirculation fan and a blower for conveying trichlorosilane and silicon tetrachloride from the effluent gas separator to the purification system.

6. The system as set forth in claim 1 comprising a conveying apparatus selected from the group consisting of a recirculation fan and a blower for conveying trichlorosilane and unreacted silicon tetrachloride from the hydrogenated gas separator to the purification system.

7. The system as set forth in claim 1 comprising a separation system to which hydrogen and hydrogen chloride from the hydrogenated gas separator are introduced to separate hydrogen and hydrogen chloride.

8. The system as set forth in claim 7 comprising:

a conveying apparatus selected from the group consisting of a recirculation fan and a blower for conveying hydrogen chloride from the separation system to the chlorination reactor; and

a conveying apparatus selected from the group consisting of a recirculation fan and a blower for conveying hydrogen from the separation system to at least one of the fluidized bed reactor and the hydrogenation reactor.

Assignments (12)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2017
From: SUNEDISON, INC.; SUNEDISON PRODUCTS SINGAPORE PTE. LTD.; MEMC PASADENA, INC.; SOLAICX
To: CORNER STAR LIMITED
Reel/Frame 042351/0659 →
PATENT SECURITY AGREEMENT Recorded Apr 28, 2016
From: SUNEDISON, INC.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS ADMINISTRATIVE AGENT
Reel/Frame 038557/0472 →
SECURITY INTEREST Recorded Jan 13, 2016
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
To: WILMINGTON TRUST, NATIONAL ASSOCIATION, SOLELY IN ITS CAPACITY AS COLLATERAL TRUSTEE
Reel/Frame 037508/0606 →
RELEASE OF SECURITY INTEREST Recorded Jan 13, 2016
From: GOLDMAN SACHS BANK USA, AS ADMINISTRATIVE AGENT
To: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
Reel/Frame 037508/0884 →
SECURITY INTEREST Recorded Aug 11, 2015
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
To: GOLDMAN SACHS BANK USA, AS ADMINISTRATIVE AGENT
Reel/Frame 036329/0470 →
CHANGE OF NAME Recorded Jul 27, 2015
From: MEMC ELECTRONIC MATERIALS, INC.
To: SUNEDISON, INC.
Reel/Frame 036189/0440 →
RELEASE OF SECURITY INTEREST Recorded Mar 3, 2014
From: DEUTSCHE BANK AG NEW YORK BRANCH
To: NVT, LLC; SUN EDISON LLC; SOLAICX; SUNEDISON, INC.
Reel/Frame 032382/0724 →
SECURITY AGREEMENT Recorded Feb 28, 2014
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC; ENFLEX CORPORATION
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
Reel/Frame 032372/0610 →
SECURITY AGREEMENT Recorded Jan 30, 2014
From: SUNEDISON, INC.; SOLAICX; SUN EDISON, LLC; NVT, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 032177/0359 →
RELEASE OF SECURITY INTEREST Recorded Dec 26, 2013
From: GOLDMAN SACHS BANK USA
To: NVT, LLC; SUN EDISON LLC; SOLAICX; SUNEDISON, INC. (F/K/A MEMC ELECTRONIC MATERIALS, INC.)
Reel/Frame 031870/0092 →
SECURITY AGREEMENT Recorded Oct 1, 2012
From: NVT, LLC; SUN EDISON LLC; SOLAICX, INC.; MEMC ELECTRONIC MATERIALS, INC.
To: GOLDMAN SACHS BANK USA
Reel/Frame 029057/0810 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 4, 2011
From: BHUSARAPU, SATISH; HUANG, YUE; GUPTA, PUNEET
To: MEMC ELECTRONIC MATERIALS, INC.
Reel/Frame 025580/0491 →