Light source with light scattering features, device including light source with light scattering features, and/or methods of making the same
View Patent ↗Certain example embodiments of this invention relate to techniques for improving the performance of Lambertian and non-Lambertian light sources. In certain example embodiments, this is accomplished by (1) providing an organic-inorganic hybrid material on LEDs (which in certain example embodiments may be a high index of refraction material), (2) enhancing the light scattering ability of the LEDs (e.g., by fractal embossing, patterning, or the like, and/or by providing randomly dispersed elements thereon), and/or (3) improving performance through advanced cooling techniques. In certain example instances, performance enhancements may include, for example, better color production (e.g., in terms of a high CRI), better light production (e.g., in terms of lumens and non-Lambertian lighting), higher internal and/or external efficiency, etc.
1. A method of making an LED device, the method comprising:
providing a substrate;
forming a plurality of LEDs on the substrate; and
creating a random pattern on the LEDs and/or in one or more layers of the LEDs, the random pattern having a light scattering effect on light produced by the LEDs, wherein the random pattern is a random fractal pattern or a fractal pattern having randomness introduced thereto.
2. The method of claim 1 , wherein the creating of the random pattern comprises:
generating the fractal pattern; and
transferring the generated fractal pattern onto one or more layers of the LEDs.
3. The method of claim 2 , wherein said transferring comprises embossing.
4. The method of claim 2 , wherein the fractal pattern is generated in a template, the template being transferred onto one or more layers of the LEDs during the transferring.
5. The method of claim 4 , further comprising etching the fractal pattern in one or more layers of the LEDs once the template is transferred thereto.
6. The method of claim 5 , wherein the template is removed following the etching.
7. The method of claim 2 , further comprising:
generating a fractal pattern, the fractal pattern being a random fractal pattern or having randomness introduced thereto; and
photolithographically patterning one or more layers of the LEDs using the generated fractal pattern.
8. The method of claim 1 ,
wherein the fractal pattern is formed in an n-layer of one or more of the LEDs.
9. The method of claim 1 , wherein the creating of the random pattern comprises:
providing an aqueous solution of nano- or micron-scale elements; and
disposing the solution to an area, directly or indirectly, on the LEDs to randomly disperse the elements on the LEDs.
10. The method of claim 9 , further comprising drying the solution.
11. The method of claim 9 , further comprising etching or patterning the LED using the dispersed elements as a mask.
12. The method of claim 9 , wherein the elements are polystyrene spheres.
13. The method of claim 12 , further comprising etching the LED using the dispersed polystyrene spheres as an etch mask for a Cl-assisted Xe+ ion beam etching.
14. The method of claim 9 , wherein the size and amount of elements in the aqueous solution is selected so as to result in 10-30% porosity once disposed over the LEDs.
15. The method of claim 1 , wherein the creating of the random pattern on the LEDs involves etching away 10-300 nm of an outermost surface.
16. The method of claim 1 , wherein the creating of the random pattern on the LEDs involves etching away 10-300 nm of a semiconductor layer thereof.