Textured rear electrode structure for use in photovoltaic device such as CIGS/CIS solar cell

1. A photovoltaic device comprising:

a front substrate;

a front substantially transparent conductive electrode;

an active semiconductor film;

a conductive and reflective rear electrode;

a rear glass substrate that supports at least the rear electrode; and

wherein the rear electrode comprises a layer comprising Mo that is oxidation graded, continuously or discontinuously, so as to be more metallic at a location therein closer to the semiconductor film than at a location therein closer to the rear glass substrate.

2. The photovoltaic device of claim 1 , wherein the rear electrode further comprises a layer comprising Ti and/or Cr located between at least the rear glass substrate and the layer comprising Mo.

3. The photovoltaic device of claim 1 , wherein a surface of the rear electrode closest to the semiconductor film is textured so as to increase reflective scattering by the rear electrode.

4. A photovoltaic device comprising:

a front substrate;

a front substantially transparent conductive electrode;

an active semiconductor film;

a semiconductive and reflective rear electrode;

a rear glass substrate that supports at least the rear electrode; and

wherein the rear electrode comprises a first layer comprising Ti and/or Cr and a second conductive layer comprising Mo provided on the rear glass substrate over at least the first layer, so that the first layer comprising Ti and/or Cr is located between the rear glass substrate and the second layer comprising Mo.

5. The photovoltaic device of claim 4 , wherein the semiconductor film comprises CIS and/or CIGS.

6. The photovoltaic device of claim 4 , wherein a surface of the rear electrode closest to the semiconductor film is textured so as to increase reflective scattering by the rear electrode.

7. The photovoltaic device of claim 4 , wherein the rear electrode further comprises a layer comprising an oxide of Mo located between the first layer and the second layer.

8. A photovoltaic device comprising:

a front substantially transparent conductive electrode;

a semiconductor film;

a conductive and reflective rear electrode comprising Mo;

a rear glass substrate that supports at least the rear electrode comprising Mo; and

wherein a surface of the rear glass substrate closest to the semiconductor film is textured so as to have peaks and valleys defined therein, and the rear electrode comprising Mo is provided on the rear glass substrate over the peaks and valleys defined in the rear glass substrate so that the rear electrode comprising Mo also has peaks and valleys defined in a surface thereof closest to the semiconductor film.

9. A photovoltaic device comprising:

a front substrate;

a front substantially transparent conductive electrode;

an absorber semiconductor film;

a conductive and reflective rear electrode;

a rear glass substrate that supports at least the rear electrode; and

wherein the rear electrode comprises a first layer comprising an oxide of Mo and a second conductive layer comprising substantially metallic Mo provided on the rear glass substrate over at least the first layer, so that the first layer comprising the oxide of Mo is located between the rear glass substrate and the second layer comprising substantially metallic Mo.

10. The photovoltaic device of claim 9 , wherein the semiconductor film comprises CIS and/or CIGS.

11. The photovoltaic device of claim 9 , wherein a surface of the rear electrode closest to the semiconductor film is textured so as to increase reflective scattering by the rear electrode.

12. A method of making a photovoltaic device, the method comprising:

providing a glass substrate;

depositing a conductive electrode comprising Mo on the glass substrate, and then texturing a major surface of the electrode comprising Mo thereby providing a textured electrode comprising Mo having a textured reflective surface; and

using the textured electrode comprising Mo, supported by at least the glass substrate, as a rear electrode in a photovoltaic device.

13. The method of claim 12 , wherein said texturing is performed using one or more of ion beam treatment, wet etching, and/or plasma exposure.

14. The method of claim 12 , further comprising texturing a surface of the glass substrate, and then depositing the conductive electrode on the textured surface of the glass substrate.

15. The method of claim 12 , further comprising providing a front glass substrate, an electrically conductive and substantially transparent front electrode; and an active semiconductor film located so that the front electrode is provided between at least the semiconductor film and the front glass substrate in the photovoltaic device.

16. The method of claim 12 , wherein viewed cross sectionally the textured reflective surface of the electrode comprises peaks, valleys and inclined portions connecting the peaks and valleys, and wherein major surfaces of at least some of the inclined portions form an angle α of from about 25-35 degrees with the plane and/or a surface of the glass substrate.

17. The method of claim 12 , wherein the electrode comprises a first layer comprising an oxide of Mo and a second layer comprising Mo provided on the substrate over at least the first layer.

18. The method of claim 12 , wherein the electrode comprises a layer comprising Mo that is oxidation graded, continuously or discontinuously, so as to be more metallic at a location therein closer to a semiconductor film of the device than at a location therein closer to the glass substrate.