Secondary reflector panel (SRP) with heat-treatable coating for concentrated solar power applications, and/or methods of making the same
View Patent ↗Certain example embodiments relate to an improved secondary reflector panel with a heat-treatable coating. Certain example embodiments related to method of making a secondary reflector panel where a reflective coating is disposed onto a glass substrate. A portion of the reflective coating is removed and a frit material is disposed over the reflective coating. An elevated temperature is applied to the glass substrate, the coating, and the frit material where the frit is cured and the glass substrate is formed as desired.
1. A method of making a secondary reflector panel, the method comprising:
disposing a reflective multi-layer coating on a major surface of a glass substrate;
removing a portion of the reflective multi-layer coating proximate to edges of the glass substrate;
disposing a frit material over the glass substrate including both the edges thereof and over the reflective multi-layer coating disposed on the glass substrate;
heating the glass substrate, as well as the reflective multi-layer and the frit material disposed on the glass substrate, to an elevated temperature so as to cure the frit material; and
bending the glass substrate with the reflective multi-layer and the frit material disposed thereon during said heating.
2. The method of claim 1 , further comprising drying the frit material after disposing the frit material over the reflective multi-layer coating and prior to said heating.
3. The method of claim 1 , further comprising applying a mask to the glass substrate before disposing the reflective multi-layer coating.
4. The method of claim 3 , wherein
removing the portion of the reflective multi-layer coating further comprises removing the mask from the glass substrate.
5. The method of claim 1 , wherein
removing the portion further comprising applying an abrasion process to remove the portion from the glass substrate.
6. The method of claim 1 , wherein
the frit material is about 20-50 microns thick.
7. The method of claim 1 , wherein
curing the frit material forms a hermetic or near-hermetic seal over the reflective multi-layer coating.
8. The method of claim 1 , wherein
curing the frit material further fuses the frit material to at least a top layer of the reflective multi-layer coating.
9. The method of claim 1 , wherein
the reflective multi-layer coating further comprises, in order moving away from the substrate, a first layer including Ni or Cr, a second layer including Ag, a third layer including Ni or Cr, and a fourth layer including Si.
10. The method of claim 9 , wherein
the reflective multi-layer coating further comprises a fifth layer provided between the first layer and the glass substrate, the fifth layer including an oxide, nitride, or oxynitride of Si or Al.
11. The method of claim 10 , wherein
the reflective multi-layer coating further comprises a sixth layer provided between the first layer and fifth layer, the sixth layer including ZnO.
12. The method of claim 1 wherein
the reflective multi-layer coating further comprises in order moving away from the substrate: a first layer including ZnO, a second layer including Ag, a third layer including Ni or Cr, and a fourth layer including Si.
13. The method of claim 1 , wherein
disposing the frit over the reflective multi-layer coating further comprises covering substantially all of the reflective multi-layer coating and a portion of the glass from which the portion of the reflective multi-layer coating is removed.
14. The method of claim 1 , wherein
the glass substrate is a low iron glass substrate and has a thickness of about 1.6-3.0 mm.
15. The method of claim 1 , wherein
the frit material includes a non-water based carrier system.
16. The method of claim 15 , wherein
the non-water based carrier system includes palm oil.
17. The method of claim 1 , wherein
the refractive multi-layer coating consists of a first layer including Ni and/or Cr, a second layer including Ag, a third layer including Ni or Cr, and a fourth layer including a nitride of Si.