Semiconductor device having dual work function metal
View Patent ↗A method of forming a semiconductor device includes forming a dummy metal gate layer including work function metals directly on a base insulator, diffusing the work function metals into the base insulator by annealing, removing the dummy metal gate layer by a wet etching, forming a metal gate on the base insulator, and forming a high-k insulator on the metal gate.
1. A method of forming a semiconductor device, comprising:
forming an interface layer on a semiconductor substrate having a first region and a second region;
forming a first dummy metal gate layer on the interface layer, forming a first work function metal on the first dummy metal gate;
forming a second dummy metal gate layer on the first work function metal;
selectively removing the first dummy metal gate layer, the first work function metal and the second dummy metal gate layer on the first region of the semiconductor substrate, to leave the interface layer on the first region;
forming a second work function metal different from the first work function metal on the interface layer on the first region and the second dummy metal gate layer on the second region;
forming a third dummy metal gate layer on the second work function metal on the first and second regions;
annealing to diffuse the second work function metal into the interface layer on the first region and the first work function metal into the interface layer on the second region;
removing the second work function metal and the third dummy metal gate layer on the first region, and the first to third dummy metal gate layers and first and second work function metals on the second region, to leave the interface layer; and
forming a high-k insulator on the interface layer on the first and second regions.
2. The method as claimed in claim 1 , wherein the high-k insulator comprises a HfSiON layer.
3. The method as claimed in claim 2 , further comprising:
performing source/drain annealing so that the work function metals are placed to have a peak of a distribution of the first and second work function metals at an interface between the high-k insulator and the interface layer.
4. The method as claimed in claim 3 , wherein the high-k insulator has a distribution of the first and second work function metals diffused slightly at a side adjacent to the interface.
5. The method as claimed in claim 1 , wherein the high-k insulator does not substantially contain the work function metal when the high-k insulator is formed.