IP Library Granted Patent US 8,652,582
Granted Patent B2
US 8,652,582 · App. 12/937,458 · Granted Feb 18, 2014

Method of making ligand functionalized substrates

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Quick Facts
Patent No.
US 8,652,582
App. No.
12/937,458
Granted
Feb 18, 2014
Kind
B2
Abstract

Ligand functionalized substrates, methods of making ligand functionalized substrates, and methods of using functionalized substrates are disclosed. The ligand functionalized substrate may be described as the grafted reaction product of a substrate and a ligand monomer of Formula I:

Claims (43)

1. A method of making a ligand functionalized substrate, the method comprises the steps of:

1) providing a base substrate;

2) coating the substrate with a solution comprising (a) at least one grafting monomer having an acryloyl group and a photoinitiator group; (b) one or more ligand monomers of the formula:

wherein

R 1 is H or C 1 -C 4 alkyl,

R 2 is a divalent alkylene optionally containing an ester, amide, urethane or urea linking group;

each R 3 is independently H or C 1 -C 4 alkyl,

R 4 is H, C 1 -C 4 alkyl or —N(R 3 ) 2 ; and

X 1 is —O— or —NR 3 —, (c) optionally one or more monomers having at least one acryloyl group and at least one additional ethylenically unsaturated, free-radically polymerizable group; and (d) optionally one or more hydrophilic monomers;

3) exposing the coated base substrate to ionizing radiation to form a first functionalized substrate comprising grafted photoinitiator groups attached to the surface of the base substrate and unreacted (b), (c) and (d) monomers having ethylenically unsaturated, free-radically polymerizable groups, and

4) exposing the base substrate comprising grafted photoinitiator groups to UV radiation to polymerize the remaining ethylenically unsaturated, free-radically polymerizable groups of the (b), (c) and (d) monomers.

2. The method of claim 1 wherein said substrate is a porous substrate having interstitial and outer surfaces.

3. The method of claim 2 wherein the step of coating comprises imbibing the porous base substrate with the solution.

4. The method of claim 1 wherein said ionizing radiation is gamma or electron beam radiation.

5. The method of claim 1 wherein said monomers (c) having least one acryloyl group and at least one additional ethylenically unsaturated, free-radically polymerizable group comprises a first acryloyl group for grafting to said porous base substrate and a second methacryloyl group for subsequent UV polymerization.

6. The method of claim 1 wherein said monomer c) is of the formula:

[CH 2 ═CH—C(O)—X 1 ] a —R 10 -Q-Z b ,

where Z is an acryloyl or non-acryloyl, ethylenically unsaturated polymerizable group,

X 1 is —O— or —NR 3 , where R 3 is H or C 1 -C 4 alkyl,

Q is a divalent linking group selected from a covalent bond, —O—, —NR 1 —, —CO 2 — and —CONR 1 —, where R 1 is H or C 1 -C 4 alkyl; and

R 10 is an alkylene group, and optionally containing one or more ether oxygen atoms and/or one or more hydroxyl groups;

and a and b are each at least one.

7. The method of claim 1 , wherein the base substrate is microporous.

8. The method of claim 1 , wherein the base substrate is selected from a porous membrane, porous non-woven web, or porous fiber.

9. The method of claim 1 , wherein the monomer c) comprises a poly(alkylene oxide) compound having at least one acryloyl group and at least one additional ethylenically unsaturated, free-radically polymerizable group.

10. The method of claim 9 , wherein the monomer c) is of the formula:

Z-Q-(CH(R 1 )—CH 2 —O) n —C(O)—CH═CH 2 ,

wherein Z is an acryloyl or non-acryloyl, polymerizable ethylenically unsaturated group, R 1 is a H or a C 1 to C 4 alkyl group, and n is from 2 to 100, and Q is a divalent linking group selected from a covalent bond, —O—, —NR 1 —, —CO 2 — and —CONR 1 —, where R 1 is H or C 1 -C 4 alkyl.

11. The method of claim 1 , wherein said solution comprises one or more additional monomers having a free-radically polymerizable group and a hydrophilic group.

12. The method of claim 1 wherein said hydrophilic monomers are of the formula:

CH 2 ═CR 1 —C(O)—X 1 —(CH(R 1 )—CH 2 —O) n —R 1 ,

wherein each R 1 is independently H or C 1 -C 4 alkyl, X 1 is —O— or —NR 3 —, where R 3 is H or C 1 -C 4 alkyl.

13. The method of claim 7 , wherein the microporous base substrate is formed by a thermally-induced phase separation (TIPS) method.

14. The method of claim 7 , wherein the microporous base substrate comprises poly(vinylidine fluoride) microporous base substrate.

15. The method of claim 1 , wherein the ionizing radiation is electron beam radiation at a dosage of less than 80 kGy.

16. The method of claim 1 wherein said ligand monomer is the formula:

where

R 1 is H or C 1 -C 4 alkyl,

each R 3 is independently H or C 1 -C 4 alkyl,

R 4 is H, C 1 -C 4 alkyl or —N(R 3 ) 2 ,

X 1 is —O— or —NR 3 —, where R 3 is H or C 1 -C 4 alkyl,

R 7 and R 8 are each independently is C 1 to C 10 alkylene; and

Z is an ester, amide, urea, or urethane group.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 1, 2024
From: 3M INNOVATIVE PROPERTIES COMPANY
To: SOLVENTUM INTELLECTUAL PROPERTIES COMPANY
Reel/Frame 066444/0535 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 12, 2010
From: BOTHOF, CATHERINE A.; HE, YI; RASMUSSEN, JERALD K.; SESHADRI, KANNAN; WALLER, CLINTON P., JR.; WEISS, DOUGLAS E.
To: 3M INNOVATIVE PROPERTIES COMPANY
Reel/Frame 025127/0601 →