Minimally invasive interspinous process spacer implants and methods
View Patent ↗An interspinous process spacer for implantation in an interspinous space between a superior spinous process and an inferior spinous process includes a balloon-like body, a first deployable protrusion and a second deployable protrusion. The body has a distal end, a proximal end and a longitudinal axis extending between the proximal and distal ends. The spacer is arrangeable in an unexpanded configuration and an expanded configuration. The first deployable protrusion is mounted proximate the proximal end and the second deployable protrusion is mounted proximate the distal end. The first and second deployable protrusions are oriented generally parallel to the longitudinal axis in the unexpanded configuration and generally perpendicular to the longitudinal axis in the expanded configuration.
1. An interspinous process spacer for implantation in an interspinous space between a superior spinous process and an inferior spinous process, the interspinous process spacer comprising:
an implant body;
a central shaft extending through the implant body, the central shaft having a distal end, a proximal end, and a longitudinal axis extending between the proximal end and the distal end, the central shaft being rotatable, and the central shaft further comprising a proximal worm gear disposed near the proximal end and including proximal threads and a distal worm gear disposed near the distal end and including distal threads, the proximal threads and the distal threads having opposite orientations;
a first proximal gear set comprising at least one gear, the first proximal gear set operatively coupled to the central shaft proximate the proximal end;
a first distal gear set comprising at least one gear, the first distal gear set operatively coupled to the central shaft proximate the distal end;
a first proximal wing operatively coupled to the first proximal gear set wherein the first proximal wing is extendable in a plane perpendicular to the longitudinal axis; and
a first distal wing operatively coupled to the first distal gear set wherein the first distal wing is extendable in a plane perpendicular to the longitudinal axis,
wherein the first distal wing and the first proximal wing withdraw within the bounds of the implant body in the unexpanded configuration, and wherein the first distal wing and the first proximal wing extend beyond the bounds of the implant body in the expanded configuration.
2. The interspinous process spacer of claim 1 wherein the proximal end further comprises a proximal turning wheel.
3. The interspinous process spacer of claim 2 wherein the distal end further comprises a distal turning wheel.
4. The interspinous process spacer of claim 3 wherein the distal turning wheel further comprises a shaped tip for ease of insertion.
5. The interspinous process spacer of claim 1 , wherein the first proximal wing is extendable in an opposite direction from the first distal wing during expansion.
6. The interspinous process spacer of claim 5 , wherein the first proximal wing forms a proximal opening and the first distal wing forms a distal opening during expansion.
7. The interspinous process spacer of claim 1 wherein at least one gear set from among the group consisting of the first proximal gear set and the first distal gear set further comprises: the worm gear operatively coupled to the central shaft; and a snail gear operatively coupled to a base portion of a wing, wherein rotation of the central shaft causes rotation of the worm gear causing rotation of the snail gear causing the wing to either extend or withdraw depending on the direction of rotation of the central shaft.
8. The interspinous process spacer of claim 1 wherein the proximal end further comprises an instrument engagement feature for turning the central shaft.