Semiconductor pressure sensor

1. A semiconductor pressure sensor comprising:

a first semiconductor substrate on which is formed a recess portion that has an opening on a first surface in a thickness direction;

a second semiconductor substrate that is disposed so as to face said first surface of said first semiconductor substrate; and

a first insulating film that is interposed between said first semiconductor substrate and said second semiconductor substrate, and on which is formed a penetrating aperture that communicates between said recess portion and said second semiconductor substrate, wherein:

an airtight reference pressure chamber is formed from said first semiconductor substrate, said second semiconductor substrate and said first insulating film, and

at least a portion of an edge portion of said penetrating aperture is positioned inside an opening edge portion of said recess portion when viewed from a side facing said penetrating aperture and said opening of said recess portion.

2. A semiconductor pressure sensor according to claim 1 , wherein all parts of said edge portion of said penetrating aperture are positioned further inward than said opening edge portion of said recess portion.

3. A semiconductor pressure sensor according to claim 2 , wherein all parts of said edge portion of said penetrating aperture are at positions that are separated by a predetermined distance X from said opening edge portion of said recess portion, and satisfy 0<X/T≦50, where T is a thickness of said first insulating film.

4. A semiconductor pressure sensor according to claim 1 , further comprising a second insulating film,

said second insulating film covers said opening of said penetrating aperture by being arranged between said second semiconductor substrate and said first insulating film.

5. A semiconductor pressure sensor according to claim 1 , further comprising a third insulating film,

said third insulating film is formed on all parts of wall surfaces that constitute said recess portion and said penetrating aperture, and a wall surface of said second semiconductor substrate that covers said opening of said penetrating aperture.

6. A semiconductor pressure sensor according to claim 1 , further comprising a stopper,

said stopper restricts flexing of said second semiconductor substrate by coming into contact with said second semiconductor substrate when an external force is applied that flexes a portion of said second semiconductor substrate that faces said recess portion by a predetermined amount or greater toward said recess portion is disposed inside a space that is surrounded by wall surfaces that constitute said recess portion and said penetrating aperture and a wall surface of said second semiconductor substrate that covers said opening of said penetrating aperture.

7. A semiconductor pressure sensor according to claim 1 , further comprising a communicating aperture being formed on said first semiconductor substrate,

said communicating aperture communicates between said recess portion and a second surface of said first semiconductor substrate.

8. A semiconductor pressure sensor according to claim 1 , wherein said second semiconductor substrate has a surface that is configured on a portion that faces said recess portion so as to enable detection of a pressure value that corresponds to pressure that is applied from an opposite side from said recess portion, and said surface to which said pressure is applied is disposed inside an air intake passage of an internal combustion engine.