IP Library Granted Patent US 8,759,840
Granted Patent B2
US 8,759,840 · App. 12/950,128 · Granted Jun 24, 2014

Semiconductor light emitting device member, method for manufacturing such semiconductor light emitting device member and semiconductor light emitting device using such semiconductor light emitting device member

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Quick Facts
Patent No.
US 8,759,840
App. No.
12/950,128
Granted
Jun 24, 2014
Kind
B2
Abstract

A semiconductor light-emitting device member excellent in transparency, light resistance, and heat resistance and capable of sealing a semiconductor light-emitting device without causing cracks and peeling even after a long-time use is provided wherein the semiconductor light-emitting device member contains (A) in a solid state Si-nuclear magnetic resonance spectrum, at least one peak selected from (a) peaks whose peak top position is in an area of a chemical shift of −40 ppm to 0 ppm inclusive, and whose full width at half maximum is 0.3 ppm to 3.0 ppm inclusive, and (b) peaks whose peak top position is in an area of the chemical shift of −80 ppm or more and less than −40 ppm, and whose full width at half maximum is 0.3 ppm to 5.0 ppm inclusive, wherein (B) silicon content is 20 weight % or more and (C) silanol content is 0.1 weight % to 10 weight % inclusive.

Claims (93)

1. A semiconductor light-emitting device member, wherein

(A) in a solid state Si-nuclear magnetic resonance spectrum, the semiconductor light-emitting device member comprises

(a) at least one peak whose peak top position is in an area of a chemical shift of −40 ppm or more and 0 ppm or less, and whose full width at half maximum is 0.3 ppm or more and 3.0 ppm or less, and

(b) at least one peak whose peak top position is in an area of the chemical shift of −80 ppm or more and less than −40 ppm, and whose full width at half maximum is 0.3 ppm or more and 5.0 ppm or less,

(B) silicon content is 20 weight % or more, and

(C) a hardness measured value (Shore A) by durometer type A is 5 or more and 90 or less.

2. The semiconductor light-emitting device member according to claim 1 , further comprising:

inorganic oxide particles.

3. The semiconductor light-emitting device member according to claim 2 , further comprising:

inorganic oxide particles.

4. A method for manufacturing the semiconductor light-emitting device member according to claim 1 , comprising:

drying a condensation polymer obtained by performing hydrolysis and polycondensation of a compound represented by the following formula (1) and/or an oligomer thereof;

M m+ X n Y 1 m−n   (1)

wherein

M represents at least one element selected from silicon, aluminum, zirconium, and titanium,

X represents a hydrolyzable group,

Y 1 represents a monovalent organic group,

m represents an integer of 1 or greater representing a valence of M, and

n represents an integer of 1 or greater representing a number of X groups, where m≧n;

wherein the hydrolysis and polycondensation are performed in the presence of a solvent and the process of drying the resultant condensation polymer has a first drying process in which a liquid condensation polymer is obtained by substantially removing the solvent at a temperature equal to or below a boiling point of the solvent and a second drying process in which the condensation polymer is dried at the temperature equal to or above the boiling point of the solvent.

5. The method of claim 4 , wherein the hydrolysis and polycondensation are performed in the presence of an organometallic compound catalyst.

6. A method for manufacturing the semiconductor light-emitting device member according to claim 2 , comprising:

drying a condensation polymer obtained by performing hydrolysis and polycondensation of a compound represented by the following formula (1) and/or an oligomer thereof;

M m+ X n Y 1 m−n   (1)

wherein

M represents at least one element selected from silicon, aluminum, zirconium, and titanium,

X represents a hydrolyzable group,

Y 1 represents a monovalent organic group,

m represents an integer of 1 or greater representing a valence of M, and

n represents an integer of 1 or greater representing a number of X groups, where m≧n;

wherein the hydrolysis and polycondensation are performed in the presence of a solvent and the process of drying the resultant condensation polymer has a first drying process in which a liquid condensation polymer is obtained by substantially removing the solvent at a temperature equal to or below a boiling point of the solvent and a second drying process in which the condensation polymer is dried at the temperature equal to or above the boiling point of the solvent.

7. The method of claim 6 , wherein the hydrolysis and polycondensation are performed in the presence of an organometallic compound catalyst.

8. A semiconductor light emitting device comprising at least one semiconductor light-emitting device member according to claim 1 .

9. The semiconductor light-emitting device according to claim 8 , wherein the device has a luminescent color selected from the group consisting of white and yellow.

10. The semiconductor light-emitting device according to claim 9 , wherein the luminescent color is white, and the device has a luminous efficiency of 20 lm/W or more.

11. The semiconductor light-emitting device according to claim 9 , wherein the luminescent color is white, and the device has an average color rendering performance index Ra of 80 or more.

12. A semiconductor light-emitting device member, wherein

(A) in a solid state Si-nuclear magnetic resonance spectrum, the semiconductor light-emitting device member comprises

(a) at least one peak whose peak top position is in an area of a chemical shift of −40 ppm or more and 0 ppm or less, and whose full width at half maximum is 0.3 ppm or more and 3.0 ppm or less, and

(b) at least one peak whose peak top position is in an area of the chemical shift of −80 ppm or more and less than −40 ppm, and whose full width at half maximum is 0.3 ppm or more and 5.0 ppm or less,

(B) silicon content is 20 weight % or more, and

(C) light transmittance on a luminous wavelength of 350 nm or more and 500 nm or less with a film thickness of 0.5 mm is 80% or more.

13. The semiconductor light-emitting device member according to claim 12 , further comprising:

inorganic oxide particles.

14. A method for manufacturing the semiconductor light-emitting device member according to claim 12 , comprising:

drying a condensation polymer obtained by performing hydrolysis and polycondensation of a compound represented by the following formula (1) and/or an oligomer thereof;

M m+ X n Y 1 m−n   (1)

wherein

M represents at least one element selected from silicon, aluminum, zirconium, and titanium,

X represents a hydrolyzable group,

Y 1 represents a monovalent organic group,

m represents an integer of 1 or greater representing a valence of M, and

n represents an integer of 1 or greater representing a number of X groups, where m≧n;

wherein the hydrolysis and polycondensation are performed in the presence of a solvent and the process of drying the resultant condensation polymer has a first drying process in which a liquid condensation polymer is obtained by substantially removing the solvent at a temperature equal to or below a boiling point of the solvent and a second drying process in which the condensation polymer is dried at the temperature equal to or above the boiling point of the solvent.

15. The method of claim 14 , wherein the hydrolysis and polycondensation are performed in the presence of an organometallic compound catalyst.

16. A semiconductor light-emitting device member, wherein

(A) in a solid state Si-nuclear magnetic resonance spectrum, the semiconductor light-emitting device member comprises

(a) at least one peak whose peak top position is in an area of a chemical shift of −40 ppm or more and 0 ppm or less, and whose full width at half maximum is 0.3 ppm or more and 3.0 ppm or less, and

(b) at least one peak whose peak top position is in an area of the chemical shift of −80 ppm or more and less than −40 ppm, and whose full width at half maximum is 0.3 ppm or more and 5.0 ppm or less,

(B) silicon content is 20 weight % or more, and

(C) a maintenance rate of transmittance of light on a wavelength of 405 nm with a film thickness of 0.5 mm before and after leaving alone at a temperature of 200° C. for about 500 hours is 80% or more and 110% or less.

17. The semiconductor light-emitting device member according to claim 16 , further comprising:

inorganic oxide particles.

18. A method for manufacturing the semiconductor light-emitting device member according to claim 16 , comprising:

drying a condensation polymer obtained by performing hydrolysis and polycondensation of a compound represented by the following formula (1) and/or an oligomer thereof;

M m+ X n Y 1 m−n   (1)

wherein

M represents at least one element selected from silicon, aluminum, zirconium, and titanium,

X represents a hydrolyzable group,

Y 1 represents a monovalent organic group,

m represents an integer of 1 or greater representing a valence of M, and

n represents an integer of 1 or greater representing a number of X groups, where m≧n;

wherein the hydrolysis and polycondensation are performed in the presence of a solvent and the process of drying the resultant condensation polymer has a first drying process in which a liquid condensation polymer is obtained by substantially removing the solvent at a temperature equal to or below a boiling point of the solvent and a second drying process in which the condensation polymer is dried at the temperature equal to or above the boiling point of the solvent.

19. The method of claim 18 , wherein the hydrolysis and polycondensation are performed in the presence of an organometallic compound catalyst.

20. A semiconductor light-emitting device member, wherein

(A) in a solid state Si-nuclear magnetic resonance spectrum, the semiconductor light-emitting device member comprises

(a) at least one peak whose peak top position is in an area of a chemical shift of −40 ppm or more and 0 ppm or less, and whose full width at half maximum is 0.3 ppm or more and 3.0 ppm or less, and

(b) at least one peak whose peak top position is in an area of the chemical shift of −80 ppm or more and less than −40 ppm, and whose full width at half maximum is 0.3 ppm or more and 5.0 ppm or less,

(B) silicon content is 20 weight % or more, and

(C) a maintenance rate of transmittance of light on the wavelength of 405 nm with a film thickness of 0.5 mm before and after irradiation with light having a center wavelength of 380 nm and radiant intensity of 0.4 kW/m 2 for about 72 hours is 80% or more and 110% or less.

21. The semiconductor light-emitting device member according to claim 20 , further comprising:

inorganic oxide particles.

22. A method for manufacturing the semiconductor light-emitting device member according to claim 20 , comprising:

drying a condensation polymer obtained by performing hydrolysis and polycondensation of a compound represented by the following formula (1) and/or an oligomer thereof;

M m+ X n Y 1 m−n   (1)

wherein

M represents at least one element selected from silicon, aluminum, zirconium, and titanium,

X represents a hydrolyzable group,

Y 1 represents a monovalent organic group,

m represents an integer of 1 or greater representing a valence of M, and

n represents an integer of 1 or greater representing a number of X groups, where m≧n;

wherein the hydrolysis and polycondensation are performed in the presence of a solvent and the process of drying the resultant condensation polymer has a first drying process in which a liquid condensation polymer is obtained by substantially removing the solvent at a temperature equal to or below a boiling point of the solvent and a second drying process in which the condensation polymer is dried at the temperature equal to or above the boiling point of the solvent.

23. The method of claim 22 , wherein the hydrolysis and polycondensation are performed in the presence of an organometallic compound catalyst.

Assignments (2)
CHANGE OF NAME Recorded Sep 5, 2017
From: MITSUBISHI RAYON CO., LTD.
To: MITSUBISHI CHEMICAL CORPORATION
Reel/Frame 043750/0834 →
MERGER Recorded Sep 4, 2017
From: MITSUBISHI CHEMICAL CORPORATION
To: MITSUBISHI RAYON CO., LTD.
Reel/Frame 043750/0207 →