Semiconductor device
View Patent ↗A semiconductor device includes a substrate having a rectangular shape, and a via hole that has an elliptic shape or a track shape having a linear portion in a long-axis direction of the track shape, a long axis of the elliptic shape or the track shape being arranged in a long-side direction of the substrate.
1. A semiconductor device comprising:
a substrate having a rectangular shape; and
a via hole that has an elliptic shape, a long axis of the elliptic shape being arranged in a long-side direction of the substrate; wherein;
a semiconductor element formed on a surface of the substrate has multiple unit FETs each having a source finger, a drain finger and a gate finger, the multiple unit FETs being connected in parallel;
at least one of the source finger, the drain finger and the gate finger is connected to the via hole; and
the source finger, the drain finger and the gate finger are provided in a short-side direction of the substrate.
2. The semiconductor device according to claim 1 , wherein multiple via holes, each being configured like said via hole, are aligned in the long-side direction of the substrate.
3. The semiconductor device according to claim 1 , wherein multiple source fingers are provided to one source pad, and the via hole is formed below the one source pad.
4. The semiconductor device according to claim 1 , wherein a ratio of the long axis of the via hole to a short axis is equal to or greater than 1.1.
5. The semiconductor device according to claim 1 , wherein a ratio of the long axis of the via hole to a short axis is equal to or greater than 1.5.
6. The semiconductor device according to claim 1 , wherein the substrate comprises any of SiC, Si, sapphire, GaN, GaAs and InP.
7. The semiconductor device according to claim 1 , further comprising a mounting surface on which the substrate is mounted via a metal for bonding made of any of AuSn, Ag paste and solder.
8. The semiconductor device according to claim 7 , wherein the mounting surface is defined by any of Cu, CuMo, CuW, a stacked layer of Cu and Mo, and a stacked layer of Cu and CuMO.
9. A semiconductor device comprising:
a substrate having a rectangular shape; and
a via hole that has a track shape having a linear portion in a long-axis direction of the track shape, a long axis of the track shape being arranged in a long-side direction of the substrate, wherein;
a semiconductor element formed on a surface of the substrate has multiple unit FETs each having a source finger, a drain finger and a gate finger, the multiple unit FETs being connected in parallel;
at least one of the source finger, the drain finger and the gate finger is connected to the via hole; and
the source finger, the drain finger and the gate finger are provided in a short-side direction of the substrate.
10. The semiconductor device according to claim 9 , wherein multiple via holes, each being configured like said via hole, are aligned in the long-side direction of the substrate.
11. The semiconductor device according to claim 9 , wherein multiple source fingers are provided to one source pad, and the via hole is formed below the one source pad.
12. The semiconductor device according to claim 9 , wherein a ratio of the long axis of the via hole to a short axis is equal to or greater than 1.1.
13. The semiconductor device according to claim 9 , wherein a ratio of the long axis of the via hole to a short axis is equal to or greater than 1.5.
14. The semiconductor device according to claim 9 , wherein the substrate comprises any of SiC, Si, sapphire, GaN, GaAs and InP.
15. The semiconductor device according to claim 9 , further comprising a mounting surface on which the substrate is mounted via a metal for bonding made of any of AuSn, Ag paste and solder.
16. The semiconductor device according to claim 15 , wherein the mounting surface is defined by any of Cu, CuMo, CuW, a stacked layer of Cu and Mo, and a stacked layer of Cu and CuMO.