Acid gas absorbent composition
View Patent ↗This invention provides novel compositions comprising substituted polyamines as acid gas scrubbing solutions and methods of using the compositions in an industrial system. The invention relates to the use of such polyamine compounds in industrial processes to remove acidic contaminants from natural and industrial fluid streams, such as natural gas, combustion gas, natural gas, synthesis gas, biogas, and other industrial fluid streams. The compositions and methods of the invention are useful for removal, absorption, or sequestration of acidic contaminants and sulfide contaminants including CO 2 , H 2 S, RSH, CS 2 , COS, and SO.
1. A process for reducing acidic contaminants in an industrial fluid stream, the process comprising:
(a) contacting the fluid stream with a composition to form a washed fluid stream and a rich acid gas scrubbing liquid, wherein the composition comprises:
at least one absorbent component having a general formula:
or a carbonate, bicarbonate, carbamate, urea, or amide thereof, or a salt thereof, wherein
(i) R 1 is selected from the group consisting of: H, alkyl, aminoalkyl, and the following structure (II),
(ii) each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , and R 9 are independently H, alkyl, or aminoalkyl
(iii) each R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , and R 17 are independently H, alkyl, or aminoalkyl; wherein at least one of R 10 or R 11 is not H; wherein if R 1 is H at least one of R 10 , R 11 , R 12 , R 13 is not H, and if R 1 is the structure (II) at least one of R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , or R 17 is not H,
(iv) each m and n are independently 0, 1, or 2,
(v) p and q are independently 0, 1, 2, 3, or 4,
(vi) each o is independently 1 or 2; and
a solvent; and
(b) regenerating at least a portion of the composition including at least a portion of the absorbent component from the rich acid gas scrubbing liquid.
2. The process of claim 1 , wherein step (a) is carried out in a temperature range from about 0 to about 200° C.
3. The process of claim 1 , wherein step (a) is carried out at a pressure range from about 0 to about 200 atm.
4. The process of claim 1 , wherein step (b) is carried out in a temperature range from about 0 to about 500° C.
5. The process of claim 1 , wherein step (b) is carried out at a pressure range from about 0 to about 10 atm.
6. The process of claim 1 , wherein step (b) is carried out via a heating medium assisted or directly heated reboiler.
7. The process of claim 1 , wherein step (b) is carried out via a steam assisted reboiler.
8. The process of claim 1 , wherein step (b) is carried out via fractional regeneration.
9. The process of claim 1 , wherein at least one of R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , or R 9 is not H.
10. The process of claim 1 , wherein p and q are independently 0, 1, or 2.
11. The process of claim 1 , wherein the alkyl for R 1 to R 17 is independently selected from the group consisting of: methyl, ethyl, propyl, isopropyl, butyl, and isobutyl.
12. The process of claim 1 , wherein the aminoalkyl for R 1 to R 17 is selected from the group consisting of: 2-aminopropyl, 2-aminobutyl, aminoethyl, and aminopropyl.
13. The process of claim 1 , wherein said absorbent component includes at least one selected from the group consisting of: structures 1-3, 5-10, 12-14, 43, 44, and 46-49, wherein R=H, methyl, ethyl, propyl, isopropyl, and combinations thereof
14. The process of claim 1 , wherein said absorbent component includes at least one selected from the group consisting of: structures 15-17, 19-21, 50-52, and 54-56, and combinations thereof
15. The process of claim 1 , wherein said absorbent component includes at least one selected from the group consisting of: structures 22-24, 26-31, 33-35, 57-59, and 61-63, and combinations thereof
16. The process of claim 1 , wherein said absorbent component includes at least one selected from the group consisting of: structures 64-66, 68-73, 75-80, and 82-84, and combinations thereof
17. The process of claim 1 , wherein said absorbent component includes at least one selected from the group consisting of: structures 36-38, 40-42, 85-87, and 89-91, and combinations thereof
18. The process of claim 1 , wherein said absorbent component includes at least one selected from the group consisting of: structures 92-97 and combinations thereof
19. The process of claim 1 , wherein the absorbent component includes at least one selected from the group consisting of: 2-aminopropyl-piperazine; 2-aminobutyl-piperazine; 1-acetylpiperazine; 1,4-bis-aminoethyl-piperazine; 1,4-bis-aminopropyl-piperazine; 1,4-bisaminobutyl-piperazine; 1,4-bis-(2-aminopropyl)-piperazine; 1,4-bis-(2-aminobutyl)-piperazine; 1,4-bis-(N-methyl-aminoethyl)-piperazine; 1-(2-aminobutyl)-4-methylpiperazine; 1-(2-aminopropyl)-4-methylpiperazine; 1-(2-aminopropyl)-4-ethylpiperazine; 1-aminoethyl-4-(2-aminobutyl)-piperazine; 1 -aminoethyl-4-(2-aminopropyl)-piperazine; 1 -aminoethyl-4-(N-methyl-aminoethyl)-piperazine; and the composition additionally comprises a secondary absorbent component selected from the group consisting of 2-morpholinoethanamine; 2-aminopropyl-morpholine; 2-(1H-imidazol-1-yl)ethanamine; 2-aminopropyl-piperidine; 2-aminopropyl-pyrolidine; N1-(2-aminopropyl)butane-1,4-diamine; N1-(3-aminopropyl)propane-1,2-diamine; and wherein the solvent is selected from the group consisting of water; sulfolane, N-methylpyrrolidone; N-alkylated pyrrolidones, piperidones and morpholines corresponding to the foregoing; methanol; mixtures of dialkyl ethers of polyethylene glycols; C 1 , to C 4 dialkylether monoethylene glycols; C 1 , to C 4 monoether monoethylene glycols; C 1 , to C 4 dialkylether poly ethylene glycols; C 1 , to C 4 monoether polyethylene ethylene glycols; C 1 , to C 4 ; ethylene glycol; diethylene glycol; triethylene glycol; N,N-dimethyl formamide; N-acetyl morpholine; N-formyl morpholine; N,N-dimethyl imidazolidin-2-one; N-methyl imidazole; and combinations thereof.
20. The process of claim 1 , wherein the acidic contaminant is selected from the group consisting of: CO 2 , H 2 S, RSH, CS 2 , COS, SO 2 , and combinations thereof.
21. The process of claim 1 , wherein said absorbent compound is present in an amount ranging from about 0.01 to about 100 wt %.
22. The process of claim 1 , further comprising at least one component selected from the group consisting of: amines, activators, promoters, antifoaming agents, co-absorbents, corrosion inhibitors, coloring agents, and combinations thereof.
23. The process of claim 1 , wherein the solvent is selected from the group consisting of: water, alcohols, polyols, other acid gas solvents, organic solvents, and combinations thereof.