Thin film transistor, method of manufacturing active layers of the thin film transistor, and display device
View Patent ↗A thin film transistor including a first polycrystalline semiconductor layer disposed on a substrate, a second polycrystalline semiconductor layer disposed on the first polycrystalline semiconductor layer, and metal catalysts configured to adjoin the first polycrystalline semiconductor layer and spaced apart from one another at specific intervals.
1. A thin film transistor, comprising:
a first polycrystalline semiconductor layer disposed on a substrate;
a second polycrystalline semiconductor layer disposed on the first polycrystalline semiconductor layer, the second polycrystalline semiconductor layer being disposed in a vertically different layer than the first polycrystalline semiconductor layer; and
metal catalysts, some of the metal catalysts disposed along the first polycrystalline semiconductor layer, the some of the metal catalysts being further disposed vertically between the second polycrystalline semiconductor layer and the substrate,
wherein the first polycrystalline semiconductor layer and the second polycrystalline semiconductor layer are both metal catalyst crystallized polycrystalline semiconductor layers comprising some of the metal catalysts.
2. The thin film transistor of claim 1 , wherein the metal catalysts comprise at least one of nickel (Ni), palladium (Pd), titanium (Ti), silver (Ag), gold (Au), tin (Sn), antimony (Sb), copper (Cu), cobalt (Co), molybdenum (Mo), terbium (Tb), ruthenium (Ru), cadmium (Cd), and platinum (Pt).
3. The thin film transistor of claim 1 , wherein the second polycrystalline semiconductor layer has a thickness which is 0.3 to 3 times a thickness of the first polycrystalline semiconductor layer.
4. The thin film transistor of claim 1 , further comprising a buffer layer disposed on the substrate,
wherein the metal catalysts are disposed directly between the buffer layer and the first polycrystalline semiconductor layer.
5. The thin film transistor of claim 4 , further comprising:
a gate electrode disposed on the second polycrystalline semiconductor layer;
a source electrode; and
a drain electrode,
wherein the source electrode and the drain electrode are connected to the second polycrystalline semiconductor layer.
6. A display device, comprising:
a substrate; and
a thin film transistor, comprising:
a first polycrystalline semiconductor layer disposed on the substrate;
a second polycrystalline semiconductor layer disposed on the first polycrystalline semiconductor layer, the second polycrystalline semiconductor layer being disposed in a vertically different layer than the first polycrystalline semiconductor layer; and
metal catalysts, some of the metal catalysts being disposed along the first polycrystalline semiconductor layer, the some of the metal catalysts being further disposed vertically between the second polycrystalline semiconductor layer and the substrate,
wherein the first polycrystalline semiconductor layer and the second polycrystalline semiconductor layer are both metal catalyst crystallized polycrystalline semiconductor layers comprising some of the metal catalysts.
7. The display device of claim 6 , further comprising a buffer layer disposed on the substrate,
wherein the metal catalysts are disposed directly between the buffer layer and the first polycrystalline semiconductor layer.
8. The display device of claim 7 , further comprising an organic light emitting element, comprising:
a first electrode connected to the thin film transistor;
an organic emission layer disposed on the first electrode; and
a second electrode disposed on the organic emission layer.
9. The display device of claim 8 , wherein the thin film transistor further comprises:
a gate electrode disposed on the second polycrystalline semiconductor layer;
a source electrode; and
a drain electrode,
wherein the source electrode and the drain electrode are connected to the second polycrystalline semiconductor layer, and
wherein the first electrode is connected to the drain electrode.
10. The display device of claim 8 , further comprising a capacitor comprising:
a first capacitor electrode formed on the substrate and of the same layers as the first polycrystalline semiconductor layer and the second polycrystalline semiconductor layer of the thin film transistor;
a second capacitor electrode formed on the first capacitor electrode; and
an insulating layer formed between the first capacitor electrode and the second capacitor electrode.