IP Library Granted Patent US 8,765,360
Granted Patent B2
US 8,765,360 · App. 12/964,646 · Granted Jul 1, 2014

Optical films and methods of making the same

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Quick Facts
Patent No.
US 8,765,360
App. No.
12/964,646
Filed
Dec 9, 2010
Granted
Jul 1, 2014
Kind
B2
Art Unit
1722
USPC
430/321
Abstract

Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.

Claims (30)

1. An optical retarder having a retardation film comprising:

a grating having a period of less than 0.5λ, where λ is between 400 and 700 nm, inclusive;

a grating material having an index of refraction of n g at λ;

a fill material disposed by atomic layer deposition between and conformally coating adjacent lines of the grating material, the fill material having an index of refraction n f at λ, and n g differs from n f by more than zero but less than 1;

wherein at least one trench in which the fill material is disposed is at least 90% filled; and

the period, grating material and fill material chosen such that the film is form birefringent at λ.

2. The retarder of claim 1 , wherein the fill material in the trench contains a nanolaminate.

3. The retarder of claim 1 , wherein the fill material has a layer that comprises a material selected from the group consisting of SiO 2 , SiNx, Si, Al 2 O 3 , ZrO 2 , Ta 2 O 5 , TiO 2 , HfO 2 , Nb 2 O 5 , and MgF 2 .

4. The retarder of claim 1 , wherein the fill material has a first layer that comprises a first material selected from the group consisting of SiO 2 , SiNx, Si, Al 2 O 3 , ZrO 2 , Ta 2 O 5 , TiO 2 , HfO 2 , Nb 2 O 5 , and MgF 2 , and a second layer having a different composition from the first layer.

5. The retarder of claim 1 , wherein the fill material has at least one layer derived in situ from a precursor, the layer comprising a composition selected from the group consisting of SiO 2 , SiNx, Si, Al 2 O 3 , ZrO 2 , Ta 2 O 5 , TiO 2 , HfO 2 , Nb 2 O 5 , and MgF 2 .

6. The retarder of claim 1 , wherein the fill material has a refractive index of at least 1.3 at λ.

7. The retarder of claim 1 , wherein the fill material has a refractive index of at least 1.6 at λ.

8. The retarder of claim 1 , wherein the fill material has a refractive index of at least 2.0 at λ.

9. The retarder of claim 1 , wherein the grating material is selected from the group consisting of SiO 2 , SiNx, Si, Al 2 O 3 , ZrO 2 , Ta 2 O 5 , TiO 2 , HfO 2 , Nb 2 O 5 , and MgF 2 .

10. The retarder of claim 1 , wherein the grating material comprises a glass.

11. The retarder of claim 1 , wherein the grating material comprises a polymer.

12. The retarder of claim 1 , wherein the grating material comprises a semiconductor.

13. The retarder of claim 1 , wherein retarder has an optical retardation of at least 5 nm for light of wavelength λ propagating through the retarder.

14. The retarder of claim 1 , wherein retarder has an optical retardation of at least 10 nm for light of wavelength λ propagating through the retarder.

15. The retarder of claim 1 , wherein retarder has an optical retardation of at least 20 nm for light of wavelength λ propagating through the retarder.

16. The retarder of claim 1 , wherein retarder has an optical retardation of at least 50 nm for light of wavelength λ propagating through the retarder.

17. The retarder of claim 1 , wherein the at least one trench has a depth of at least 10 nm.

18. An optical retarder having a retardation film comprising:

a grating having a period of less than 0.5λ, where λ is between 150 and 2000 nm, inclusive;

a grating material having an index of refraction of n g at λ;

a fill material disposed by atomic layer deposition between and conformally coating adjacent lines of the grating material, the fill material having an index of refraction n f at λ, and n g differs from of by more than zero but less than 1;

wherein at least one trench in which the fill material is disposed is at least 90% filled; and

the period, grating material and fill material chosen such that the film is form birefringent at λ.

19. The retarder of claim 1 , wherein the at least one trench in which the fill material is disposed is at least 90% filled and less than 100% filled.

20. The retarder of claim 1 , wherein the at least one trench in which the fill material is disposed is 100% filled.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 22, 2016
From: POLARIZATION SOLUTIONS, LLC.
To: USHIO DENKI KABUSHIKI KAISHA
Reel/Frame 040255/0079 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 10, 2012
From: NANTOPTICS, LLC
To: POLARIZATION SOLUTIONS, LLC
Reel/Frame 029438/0661 →
CHANGE OF NAME Recorded Dec 10, 2012
From: ABRAXIS BIOSENSORS, LLC
To: NANTOPTICS, LLC
Reel/Frame 029441/0526 →
NUNC PRO TUNC ASSIGNMENT Recorded Jun 19, 2012
From: NANOOPTO CORPORATION
To: API NANOFABRICATION AND RESEARCH CORPORATION
Reel/Frame 028404/0266 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 10, 2011
From: API NANOFABRICATION AND RESEARCH CORPORATION
To: ABRAXIS BIOSENSORS, LLC
Reel/Frame 025935/0277 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2010
From: WANG, JIAN JIM; DENG, XUEGONG; NIKOLOV, ANGUEL N.
To: NANOOPTO CORPORATION
Reel/Frame 025555/0528 →