Photosensitive composition, partition walls, color filter and organic EL device
View Patent ↗It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls. The photosensitive composition is a photosensitive composition, which comprises a polymer (A) having a side chain containing a group represented by the formula: —CFXR f (1) or a group represented by the formula: and a side chain containing an ethylenic double bond, a black colorant (B), a photopolymerization initiator (C), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond, wherein the polymer (A) has a number average molecular weight of at least 2×10 4 and at most 7×10 4 and a weight average molecular weight of at least 5×10 4 and at most 25×10 4 .
1. A photosensitive composition, which comprises a polymer (A) having a side chain containing a group represented by the formula:
—CFXR f (1)
wherein X is a hydrogen atom, a fluorine atom or a trifluoromethyl group, R f is a C 1-20 fluoroalkyl group which may have an etheric oxygen atom or a fluorine atom, or a group represented by the formula:
wherein each of R 1 and R 2 which are independent of each other, is a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, R 3 is a hydrogen atom or a C 1-10 organic group, and n is an integer of at least 1 and at most 200; and a side chain containing an ethylenic double bond, a black colorant (B), a photopolymerization initiator (C), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond, wherein the polymer (A) has a number average molecular weight of at least 2×10 4 and at most 7×10 4 and a weight average molecular weight of at least 5×10 4 and at most 25×10 4 .
2. The photosensitive composition according to claim 1 , wherein the polymer (A) is a polymer (A) having a side chain containing a group represented by the above formula (1) and a side chain containing an ethylenic double bond, and the content of fluorine atoms in the polymer (A) is from 5 to 35 mass %.
3. The photosensitive composition according to claim 1 , wherein the polymer (A) is a polymer (A) having a side chain containing a group represented by the above formula (2) and a side chain containing an ethylenic double bond, and the content of silicon atoms in the polymer (A) is from 0.1 to 25 mass %.
4. The photosensitive composition according to claim 1 , wherein the photosensitive resin (D) has a weight average molecular weight of at least 1.5×10 3 and at most 20×10 3 .
5. The photosensitive composition according to claim 1 , wherein the polymer (A) has ethylenic double bonds in an amount of from 1.0 to 5.0 mmol/g.
6. The photosensitive composition according to claim 1 , wherein the group represented by the above formula (1) is a perfluoroalkyl group.
7. The photosensitive composition according to claim 1 , wherein the polymer (A) further has a side chain containing an acidic group.
8. The photosensitive composition according to claim 1 , which further contains a crosslinking agent (E) containing at least two ethylenic double bonds.
9. Partition walls formed by curing the photosensitive composition as defined in claim 1 .
10. A color filter, which comprises a substrate and a plurality of pixels formed on the substrate, wherein the plurality of pixels are partitioned by the partition walls as defined in claim 9 .
11. An organic EL device, which comprises a substrate and a plurality of pixels formed on the substrate, wherein the plurality of pixels are partitioned by the partition walls as defined in claim 9 .