Polymeric matrices formed from monomers comprising a protected amine group
View Patent ↗The present disclosure relates to polymeric matrices composed of protected amine compound residues and membranes composed from such polymeric matrices. In particular, the present disclosure relates to a polymeric matrix comprising amine compound residues, acyl compound residues and protected amine compound residues.
1. A process to prepare a membrane comprising steps of:
contacting a substrate with:
an aqueous solution comprising
(i) a polyamine monomer; and
an organic solution comprising
(i) an amine reactive polyacyl monomer; and
(ii) a monomer comprising a protected amino group,
wherein the aqueous solution and the organic solution produce a polymeric matrix on the substrate by way of interfacial polymerization, and
wherein the monomer comprising a protected amine group is of the formula (VI):
wherein
Ar is an aryl group containing 6-14 carbon atoms;
R is independently or simultaneously a protected amino group or —C(O)—X;
X is a leaving group; and
n is 1, 2 or 3.
2. The process of claim 1 , wherein the monomer of the formula (VI) is of the formulae (VIa), (VIb) or (VIc):
wherein R is independently or simultaneously N═S═O or —C(O)—X; and
X is a leaving group.
3. The process of claim 2 , wherein the monomer of the formula (VIa) is:
wherein X is a leaving group.
4. The process of claim 2 , wherein the monomer of the formula (VIb) is:
wherein X is a leaving group.
5. The process of claim 2 , wherein the monomer of the formula (VIc) is:
wherein X is a leaving group.
6. The process of claim 2 , wherein X is a halogen atom.