Thin film solar cells and method of manufacturing the same
A thin film solar cell comprises a substrate, an inorganic layer disposed on the substrate and having a plurality of unevenness, a first electrode disposed on the inorganic layer and having a plurality of second unevenness, an absorbing layer disposed on the first electrode, and a second electrode disposed on the absorbing layer.
1. A thin film solar cell comprising:
a substrate;
an inorganic insulating layer disposed on the substrate and having a plurality of first unevenness on an etched surface that includes a plurality of grooves, and a substantially flat surface opposite to the etched surface;
a first electrode disposed on the inorganic insulating layer and having a plurality of second unevenness, wherein the grooves of the inorganic insulating layer are entirely filled with the first electrode, and wherein a size including a depth of the plurality of grooves of the inorganic insulating layer and a thickness of the first electrode are such that the plurality of second unevenness are self-textured by a crystallinity of the first electrode that is in a substantially diagonal direction within the grooves and in a substantially lateral side direction in terms of a crystal structure above the grooves, and that a frequency of peaks of the self-textured second unevenness is greater than that of the first unevenness;
an absorbing layer disposed on the first electrode; and
a second electrode disposed on the absorbing layer.
2. The thin film solar cell of claim 1 , wherein a sectional shape of the first unevenness is a hemisphere.
3. The thin film solar cell of claim 1 , wherein the inorganic insulating layer is made of silicon nitride.
4. The thin film solar cell of claim 1 , wherein the inorganic insulating layer has a thickness of 3000 to 6000 Å.
5. The thin film solar cell of claim 1 , wherein the second unevenness has an irregularly protruding shape.