Security element comprising a screened layer
The present invention relates to a security element composed of at least one light-transmitting substrate on which a substantially opaque, screened layer composed of grid elements is located. According to the present invention, within the substantially opaque, screened layer composed of grid elements, at least one thin, solid, substantially opaque line is arranged that exhibits the form of at least one alphanumeric character, a graphic or a pattern. Such lines have line widths of at least 0.1 mm to 5 mm, preferably of 0.2 mm to 0.7 mm, particularly preferably of about 0.5 mm. Instead of lines, also extensive regions without any gap may be used, such that the alphanumeric character, pattern or graphic formed is perceptible only in transmitted light, but not in reflected light. The security element thus displays, at least when viewed from the side of the substantially opaque, screened layer, in top view, a different appearance than when looked through.
1. A security element comprising: at least one light-transmitting substrate comprising a first and second surface, a screened layer which is substantially opaque, comprising grid elements formed on the first surface of the at least one light-transmitting substrate, and at least one, thin, solid, substantially opaque line in the form of at least one alphanumeric character, a graphic or a pattern formed within the screened layer, wherein, when the security element is viewed from the first surface of the substrate, the security element displays a different appearance when viewed in reflected light than when viewed in transmitted light, such that when viewed in reflected light only the screened layer of the security element is perceptible to a viewer and the at least one, thin, solid, substantially opaque line is not perceptible to a viewer; in transmitted light both the screened layer and the at least one, thin, solid, substantially opaque line of the security element are perceptible to a viewer.
2. The security element according to claim 1 , characterized in that the thin, solid, substantially opaque line exhibits a width of at least 0.1 mm to 5 mm.
3. The security element according to claim 1 , characterized in that the thin, solid, substantially opaque line is formed by an extensive region without any gap.
4. The security element according to claim 1 , characterized in that the screened layer consists of a plurality of grid elements, and the grid elements are gaps in the screened layer.
5. The security element according to claim 4 , characterized in that the grid elements can have an arbitrary form and be arranged stochastically and/or in grid form and/or vary locally in their diameter or their separation from one another.
6. The security element according to claim 5 , characterized in that the grid elements are executed to be circular and/or line-shaped, and circular grid elements exhibit a diameter of 10 micrometers to 100 micrometers.
7. The security element according to claim 1 , characterized in that the share of the total area of the grid elements with respect to the total surface area of the security element is 10% to 40%.
8. The security element according to claim 1 , characterized in that the screened layer consists of metal.
9. The security element according to claim 1 , characterized in that over the screened layer is applied at least one optically variable thin-film layer consisting of at least one dielectric layer and at least one partially transmissive or reflective layer.
10. The security element according to claim 1 , characterized in that over the screened layer is applied at least one light-transmitting, liquid crystal layer.
11. The security element according to claim 8 , characterized in that the surface of the substrate to which the screened layer comprising grid elements is applied exhibits, at least in sub-regions, embossed diffractive patterns or an embossing lacquer layer having diffractive patterns embossed in it.
12. A method for manufacturing the security element according to claim 1 , characterized in that the grid elements are imprinted or vapor deposited on the light-transmitting substrate or are produced by demetalization from a layer that, at least in sub-regions, is contiguously vapor deposited on the substrate.
13. The method according to claim 12 , characterized in that the vapor deposition of the grid elements occurs by means of vacuum deposition, such as sputtering, reactive sputtering, physical vapor deposition or chemical vapor deposition.
14. The method according to claim 12 , characterized in that the demetalization occurs by means of washing processes, etching, oil ablation, lift-off or laser demetalization.
15. The method according to claim 13 , characterized in that the demetalization occurs by means of washing processes, etching, oil ablation, lift-off or laser demetalization.
16. The security element according to claim 1 , characterized in that the screened layer consists of a plurality of grid elements, and the grid elements are substantially opaque, spaced apart basic pattern elements.
17. The security element according to claim 16 , characterized in that the grid elements can have an arbitrary form and be arranged stochastically and/or in grid form and/or vary locally in their diameter or their separation from one another.
18. The security element according to claim 16 , characterized in that the grid elements are executed to be circular and/or line-shaped, and circular grid elements exhibit a diameter of 10 micrometers to 100 micrometers.
19. The security element according to claim 1 , wherein the security element is applied to the surface of a data carrier.