Method and system for providing ultrapure water
View Patent ↗A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
1. A system for removing total organic carbon (TOC) from ultrapure water comprising:
a primary actinic radiation reactor;
a source of a persulfate precursor compound fluidly connected to the primary actinic radiation reactor and disposed to introduce at least one persulfate precursor compound into the primary actinic radiation reactor;
a TOC concentration sensor located upstream of the primary actinic radiation reactor;
a persulfate concentration sensor located downstream of the primary actinic radiation reactor;
a source of a reducing agent disposed to introduce at least one reducing agent downstream from the primary actinic radiation reactor;
a reducing agent concentration sensor located downstream of a point of addition of the at least one reducing agent; and
a controller operatively coupled to receive at least one input signal from at least one of the TOC concentration sensor, the persulfate concentration sensor, and the reducing agent concentration sensor, and generate at least one control signal that regulates one of a rate at which the persulfate precursor compound is introduced into the primary actinic radiation reactor, an intensity of the actinic radiation in the primary actinic radiation reactor, and a rate at which the reducing agent is introduced to the system.
2. The system of claim 1 , further comprising a reverse osmosis unit located upstream of the primary actinic radiation reactor.
3. The system of claim 1 , further comprising a secondary actinic radiation reactor located downstream of the primary actinic radiation reactor.
4. The system of claim 1 , further comprising a particulate filter located downstream of the primary actinic radiation reactor.
5. The system of claim 1 , further comprising an ultrafiltration apparatus located downstream of from the primary actinic radiation reactor.
6. The system of claim 1 , further comprising at least one unit operation selected from the group consisting of a heat exchanger, a degasifier, a particulate filter, an ion purification apparatus, and an ion-exchange column.
7. The system of claim 6 , wherein the ion-exchange column is located upstream of the TOC concentration sensor.
8. The system of claim 1 , further comprising a source of water located upstream of the primary actinic radiation reactor comprising one or more unit operations selected from the group consisting of a reverse osmosis filter, an electrodialysis device, an electrodeionization device, a distillation apparatus, an ion-exchange column, and combinations thereof.
9. The system of claim 8 , wherein water from the source of water comprises less than about 25 ppb TOC.
10. The system of claim 1 , further comprising a TOC concentration sensor located downstream of the primary actinic radiation reactor.
11. The system of claim 1 , wherein the reducing agent is sulfur dioxide.