Method for measuring a concentration of a compound in a liquid stream
View Patent ↗A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
1. A method for measuring a concentration of persulfate and sulfur dioxide in an ultrapure water stream comprising:
introducing persulfate to the ultrapure water stream having a TOC concentration of less than about 25 ppb;
measuring a first conductivity of the ultrapure water stream in a first conductivity cell of a first sensor;
irradiating the ultrapure water stream to provide an irradiated ultrapure water stream;
measuring a second conductivity of the irradiated ultrapure water stream in a second conductivity cell of the first sensor;
calculating the concentration of persulfate in the ultrapure water stream based in part on the first conductivity measurement and the second conductivity measurement of the first sensor;
introducing sulfur dioxide to the irradiated ultrapure water stream;
measuring a first conductivity of the irradiated ultrapure water stream comprising sulfur dioxide in a first conductivity cell of a second sensor;
irradiating the ultrapure water stream comprising sulfur dioxide to provide an irradiated ultrapure water stream comprising sulfur dioxide;
measuring a second conductivity of the irradiated ultrapure water stream comprising sulfur dioxide in a second conductivity cell of the second sensor; and
calculating the concentration of sulfur dioxide in the irradiated ultrapure water stream comprising sulfur dioxide based in part on the first conductivity measurement and the second conductivity measurement of the ultrapure water stream comprising sulfur dioxide of the second sensor.
2. The method of claim 1 , wherein irradiating the ultrapure water stream comprises converting at least a portion of the compound comprising persulfate into sulfate ions.
3. The method of claim 1 , wherein irradiating the ultrapure water stream comprising sulfur dioxide comprises converting at least a portion of the sulfur dioxide into sulfate ions.
4. The method of claim 1 , further comprising irradiating the ultrapure water stream in an actinic radiation reactor subsequent to introducing the persulfate and prior to measuring the first conductivity.
5. The method of claim 4 , further comprising measuring a concentration of TOC of the ultrapure water stream upstream of the actinic radiation reactor.
6. The method of claim 4 , further comprising regulating at least one of a rate at which the persulfate is introduced, an intensity of the actinic radiation in the actinic radiation reactor, and a rate at which the sulfur dioxide is introduced.
7. The method of claim 4 , further comprising introducing the irradiated ultrapure water stream comprising sulfur dioxide to a semiconductor fabrication process.
8. The method of claim 1 , further comprising controlling a rate or an amount of sulfur dioxide introduced to the irradiated ultrapure water stream based on at least one of the concentration of persulfate and the concentration of sulfur dioxide.
9. The method of claim 8 , wherein the rate or amount of sulfur dioxide introduced is controlled to provide a minimum amount of reducing agent based on the concentration of persulfate.