Partially metallized total internal reflection immersion grating

1. A diffraction grating comprising:

a substrate comprising a first dielectric or semiconductor material substantially transparent over a range of operational wavelengths λ with a refractive index n 1 , and having a first surface facing an optical medium with a refractive index n 2 that is less than n 1 ;

a set of diffractive elements formed on the first surface of the substrate, wherein the diffractive elements comprise a set of protruding ridges separated by intervening trenches characterized by a ridge spacing Λ, a ridge width d, and a ridge height h; and

a metal layer on a to surface of each ridge characterized by a thickness t,

wherein:

at least a portion of a bottom surface of each trench is substantially free of metal;

λ/2n 1 <Λ<λ/(n 1 +n 2 ) over the operational wavelength range; and

n 1 , n 2 , Λ, d, h, and t result in wavelength dependent diffraction efficiency over the operational wavelength range for s- and p-polarized optical signals wherein (i) a minimum of the p-polarized diffraction efficiency substantially coincides with a maximum of the s polarized diffraction efficiency or (ii) a maximum of the p-polarized diffraction efficiency substantially coincides with a minimum of the s-polarized diffraction efficiency, so that overall diffraction efficiency is polarization selective over the operational wavelength range for an optical signal incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

2. The diffraction grating of claim 1 wherein a polarization ratio of the polarization selective diffraction efficiency is greater than about 100:1, and the operational wavelength range is about 1500 nm to about 1600 nm.

3. The diffraction grating of claim 1 wherein the substrate comprises a prism having a second surface that is not parallel to the first surface, wherein the first and second surfaces are arranged so that an optical signal transmitted through the first surface is incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

4. The diffraction grating of claim 1 wherein:

the substrate is arranged so as to receive an optical signal in the operational wavelength range that is incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ); and

n 1 , n 2 , Λ, and θ in result in near-Littrow diffraction of the optical signal.

5. The diffraction grating of claim 1 wherein the first material comprises optical glass, fused silica, silicon, silicon nitride, or silicon oxynitride, and the optical medium comprises vacuum, air, a gaseous medium, or a liquid medium.

6. The diffraction grating of claim 1 wherein the metal comprises gold, silver, or aluminum.

7. A diffraction grating comprising:

a substrate comprising a first dielectric or semiconductor material substantially transparent over a range of operational wavelengths λ with a refractive index n 1 , and having a first surface facing an optical medium with a refractive index n 2 that is less than n 1 ;

a set of diffractive elements formed on the first surface of the substrate, wherein the diffractive elements comprise a set of protruding ridges separated by intervening trenches characterized by a ridge spacing Λ, a ridge width d, and a ridge height h; and

a metal layer on a to surface of each ridge characterized by a thickness t,

wherein:

at least a portion of a bottom surface of each trench is substantially free of metal;

λ/2n 1 <Λ<λ/(n 1 +n 2 ) over the operational wavelength range; and

n 1 , n 2 , Λ, d, h, and t result in wavelength dependent diffraction efficiency over the operational wavelength range for s- and p-polarized optical signals wherein a maximum of the p-polarized diffraction efficiency substantially coincides with a maximum of the s-polarized diffraction efficiency, so that polarization dependent loss PDL is less than a prescribed level over the operational wavelength range for an optical signal incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

8. The diffraction grating of claim 7 wherein the prescribed level of polarization dependent loss is about 0.5 dB and the operational wavelength range is about 1500 nm to about 1600 nm.

9. The diffraction grating of claim 7 wherein the substrate comprises a prism having a second surface that is not parallel to the first surface, wherein the first and second surfaces are arranged so that an optical signal transmitted through the first surface is incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

10. The diffraction grating of claim 7 wherein:

the substrate is arranged so as to receive an optical signal in the operational wavelength range that is incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ); and

n 1 , n 2 , Λ, and θ in result in near-Littrow diffraction of the optical signal.

11. The diffraction grating of claim 7 wherein the first material comprises optical glass, fused silica, silicon, silicon nitride, or silicon oxynitride, and the optical medium comprises vacuum, air, a gaseous medium, or a liquid medium.

12. The diffraction grating of claim 7 wherein the metal comprises gold, silver, or aluminum.

13. A diffraction grating comprising:

a substrate comprising a first dielectric or semiconductor material substantially transparent over a range of operational wavelengths λ with a refractive index n 1 , and having a first surface facing an optical medium with a refractive index n 2 that is less than n 1 ;

a set of diffractive elements formed on the first surface of the substrate, wherein the diffractive elements comprise a set of protruding ridges separated by intervening trenches characterized by a ridge spacing Λ, a ridge width d, and a ridge height h;

a metal layer on a top surface of each ridge characterized by a thickness t; and

a lateral metal layer on at least one side surface of each ridge, wherein each lateral metal layer extends a distance a downward from the top surface of the corresponding ridge and is characterized by a lateral thickness b,

wherein:

at least a portion of a bottom surface of each trench is substantially free of metal;

λ/2n 1 <Λ<λ/(n 1 +n 2 ) over the operational wavelength range; and

n 1 , n 2 , Λ, d, h, t, a, and b result in wavelength dependent diffraction efficiency over the operational wavelength range for s- and p-polarized optical signals wherein a maximum of the p-polarized diffraction efficiency substantially coincides with a maximum of the s-polarized diffraction efficiency, so that polarization dependent loss PDL is less than a prescribed level over the operational wavelength range for an optical signal incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

14. The diffraction grating of claim 13 wherein the prescribed level of polarization dependent loss is about 0.5 dB and the operational wavelength range is about 1500 nm to about 1600 nm.

15. The diffraction grating of claim 13 wherein the substrate comprises a prism having a second surface that is not parallel to the first surface, wherein the first and second surfaces are arranged so that an optical signal transmitted through the first surface is incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

16. The diffraction grating of claim 13 wherein:

the substrate is arranged so as to receive an optical signal in the operational wavelength range that is incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ); and

n 1 , n 2 , Λ, and θ in result in near-Littrow diffraction of the optical signal.

17. The diffraction grating of claim 13 wherein the first material comprises optical glass, fused silica, silicon, silicon nitride, or silicon oxynitride, and the optical medium comprises vacuum, air, a gaseous medium, or a liquid medium.

18. The diffraction grating of claim 13 wherein the metal comprises gold, silver, or aluminum.

19. A method for forming a diffraction grating comprising:

forming a set of diffractive elements on a first surface of a substrate, wherein the diffractive elements comprise a set of protruding ridges separated by intervening trenches; and

forming a metal layer on a top surface of each ridge,

wherein:

the substrate comprises a first dielectric or semiconductor material substantially transparent over a range of operational wavelengths λ with a refractive index n 1 , and the first surface faces an optical medium with a refractive index n 2 that is less than n 1 ;

the set of diffractive elements is characterized by a ridge spacing Λ, a ridge width d, and a ridge height h;

the metal layer is characterized by a thickness t;

at least a portion of a bottom surface of each trench is substantially free of metal;

λ/2n 1 <Λ<λ/(n 1 +n 2 ) over the operational wavelength range; and

n 1 , n 2 , Λ, d, h, and t result in wavelength dependent diffraction efficiency over the operational wavelength range for s- and p-polarized optical signals wherein (i) a minimum of the p-polarized diffraction efficiency substantially coincides with a maximum of the s-polarized diffraction efficiency or (ii) a maximum of the p-polarized diffraction efficiency substantially coincides with a minimum of the s-polarized diffraction efficiency, so that overall diffraction efficiency is polarization selective over the operational wavelength range for an optical signal incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

20. The method of claim 19 wherein forming the diffractive elements and the metal layers comprises spatially-selectively etching the trenches through a substantially uniform metal layer on the first substrate surface and into the substrate, thereby forming the ridges between the trenches and leaving the metal layers on the top surface of each ridge.

21. The method of claim 20 further comprising depositing the substantially uniform metal layer on the first substrate surface prior to etching the trenches.

22. The method of claim 19 wherein forming the metal layers comprises depositing metal on the top surface of each ridge after the ridges are formed.

23. The method of claim 22 wherein metal is deposited on the top surface of each ridge by directional deposition at one or more deposition angles that substantially block deposition of metal on at least a portion of the bottom surface of each trench.

24. A method for forming a diffraction grating comprising:

forming a set of diffractive elements on a first surface of a substrate, wherein the diffractive elements comprise a set of protruding ridges separated by intervening trenches; and

forming a metal layer on a top surface of each ridge,

wherein:

the substrate comprises a first dielectric or semiconductor material substantially transparent over a range of operational wavelengths λ with a refractive index n 1 and the first surface faces an optical medium with a refractive index n 2 that is less than n 1 ;

the set of diffractive elements is characterized by a ridge spacing Λ, a ridge width d, and a ridge height h;

the metal layer is characterized by a thickness t;

at least a portion of a bottom surface of each trench is substantially free of metal;

λ/2n 1 <Λ<λ/(n 1 +n 2 ) over the operational wavelength range; and

n 1 , n 2 , Λ, d, h, and t result in wavelength dependent diffraction efficiency over the operational wavelength range for s- and p-polarized optical signals wherein a maximum of the p-polarized diffraction efficiency substantially coincides with a maximum of the s-polarized diffraction efficiency, so that polarization dependent loss PDL is less than a prescribed level over the operational wavelength range for an optical signal incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

25. The method of claim 24 wherein forming the diffractive elements and the metal layers comprises spatially-selectively etching the trenches through a substantially uniform metal layer on the first substrate surface and into the substrate, thereby forming the ridges between the trenches and leaving the metal layers on the top surface of each ridge.

26. The method of claim 25 further comprising depositing the substantially uniform metal layer on the first substrate surface prior to etching the trenches.

27. The method of claim 24 wherein forming the metal layers comprises depositing metal on the top surface of each ridge after the ridges are formed.

28. The method of claim 27 wherein metal is deposited on the top surface of each ridge by directional deposition at one or more deposition angles that substantially block deposition of metal on at least a portion of the bottom surface of each trench.

29. A method for forming a diffraction grating comprising:

forming a set of diffractive elements on a first surface of a substrate, wherein the diffractive elements comprise a set of protruding ridges separated by intervening trenches;

forming a metal layer on a top surface of each ridge; and

forming a lateral metal layer on at least one side surface of each ridge,

wherein:

the substrate comprises a first dielectric or semiconductor material substantially transparent over a range of operational wavelengths λ with a refractive index n 1 , and the first surface faces an optical medium with a refractive index n 2 that is less than n 1 ;

the set of diffractive elements is characterized by a ridge spacing Λ, a ridge width d, and a ridge height h;

the metal layer is characterized by a thickness t;

each lateral metal layer extends a distance a downward from the top surface of the corresponding ridge and is characterized by a lateral thickness b;

at least a portion of a bottom surface of each trench is substantially free of metal; and

λ/2n 1 <Λ<λ/(n 1 +n 2 ) over the operational wavelength range, and wherein n 1 , n 2 , Λ, d, h, t, a, and b result in wavelength dependent diffraction efficiency over the operational wavelength range for s- and p-polarized optical signals wherein a maximum of the p-polarized diffraction efficiency substantially coincides with a maximum of the s-polarized diffraction efficiency, so that polarization dependent loss PDL is less than a prescribed level over the operational wavelength range for an optical signal incident on the diffractive elements from within the substrate at an incidence angle θ in that exceeds a critical angle θ c =sin −1 (n 2 /n 1 ).

30. The method of claim 29 wherein the metal layers are deposited on the top surface of each ridge, after the ridges are formed, by directional deposition at one or more deposition angles that substantially block deposition of metal on the bottom surface of each trench and result in the lateral metal layers that extend the distance a downward from the top surface of the corresponding ridge and are characterized by the lateral thickness b.