IP Library Granted Patent US 8,018,301
Granted Patent B2
US 8,018,301 · App. 13/018,162 · Granted Sep 13, 2011

Micro-electro-mechanical transducer having a surface plate

Assignee: Kolo Technologies, Inc.
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Quick Facts
Patent No.
US 8,018,301
App. No.
13/018,162
Granted
Sep 13, 2011
Kind
B2
Abstract

A micro-electro-mechanical transducer (such as a cMUT) is disclosed. The transducer has a base, a spring layer placed over the base, and a mass layer connected to the spring layer through a spring-mass connector. The base includes a first electrode. The spring layer or the mass layer includes a second electrode. The base and the spring layer form a gap therebetween and are connected through a spring anchor. The mass layer provides a substantially independent spring mass contribution to the spring model without affecting the equivalent spring constant. The mass layer also functions as a surface plate interfacing with the medium to improve transducing performance. Fabrication methods to make the same are also disclosed.

Claims (27)

1. A method for fabricating a micro-electro-mechanical device having a movable mechanical part to transform energy, the method comprising the steps of:

forming at least one spring anchor on either a front side of a substrate wafer or a bottom side of a spring layer;

forming at least one spring-mass connector of a desired height either on the spring layer or on a mass layer; and

joining the substrate wafer, the spring layer and the mass layer such that the spring layer and the substrate wafer are joined through the spring anchor to define a gap therebetween, the mass layer and the spring layer are joined through the spring-mass connector.

2. The method of claim 1 wherein the step of joining the substrate wafer, the spring layer and the mass layer comprises a step using wafer bonding technique.

3. The method of claim 1 wherein the spring-mass connector is horizontally distanced from the spring anchor by a sufficient length to define a cantilever anchored at the spring anchor with an exerting end at the spring-mass connector, the cantilever and the gap enabling a vertical displacement of the spring-mass connector to transport the mass layer substantially vertically with a piston-like motion.

4. The method of claim 1 wherein spring-mass connector is formed on a top side of the spring layer, and the mass layer is connected to the spring-mass connector from the top side of the spring layer opposing the substrate wafer.

5. The method of claim 1 wherein spring-mass connector is formed on the bottom side of the spring layer, and the mass layer is connected to the spring-mass connector from the bottom side of the spring layer.

6. The method of claim 5 wherein the mass layer is disposed in the gap defined by the spring layer and the substrate wafer.

7. The method of claim 1 , wherein the step of forming at least one spring anchor comprises:

depositing and patterning a material on the spring layer or the substrate wafer to form the at least one spring anchor.

8. The method of claim 1 , wherein the step of forming at least one spring anchor comprises:

growing and patterning an oxide on the spring layer or the substrate wafer to form the at least one spring anchor.

9. The method of claim 1 , wherein the step of forming at least one spring anchor comprises:

forming a recess on the spring layer or the substrate wafer; and

growing and patterning an oxide on the spring layer or the substrate wafer to form the at least one spring anchor in the recess, the spring anchor attaching to a bottom of the recess and extending beyond the spring layer or the substrate wafer.

10. The method of claim 1 , wherein the step of forming at least one spring-mass connector comprises:

depositing and patterning a material on the mass layer or the spring layer to form the at least one spring-mass connector.

11. The method of claim 1 , wherein the step of forming at least one spring-mass connector comprises:

patterning and micromachining the mass layer or the spring layer to form the at least one spring-mass connector on the mass layer.

12. The method of claim 1 , wherein the step of forming at least one spring-mass connector comprises:

forming a sacrificial layer on the mass layer or the spring layer, the sacrificial layer defining a negative pattern for the spring-mass connector;

depositing a material over the sacrificial layer and into the negative pattern for the spring-mass connector; and

removing the sacrificial layer to form the spring layer and the spring-mass connector.

13. The method of claim 1 further comprising forming or effectuating a transducing member on the spring layer.

14. The method of claim 13 wherein the transducing member is an electrode.

15. The method of claim 1 wherein the mass layer is disposed between the substrate and the spring layer, the method further comprising forming or effectuating a transducing member on the mass layer.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 27, 2022
From: KOLO TECHNOLOGIES, INC.
To: KOLO MEDICAL LTD.
Reel/Frame 058789/0549 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 27, 2022
From: KOLO MEDICAL LTD.
To: KOLO MEDICAL (SUZHOU) CO., LTD.
Reel/Frame 058791/0538 →
CORRECTIVE ASSIGNMENT TO CORRECT THE STATE OF INCORPORATION PREVIOUSLY RECORDED AT REEL: 025731 FRAME: 0959. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT . Recorded Jan 13, 2022
From: HUANG, YONGLI
To: KOLO TECHNOLOGIES, INC.
Reel/Frame 058724/0158 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 2, 2011
From: HUANG, YONGLI
To: KOLO TECHNOLOGIES, INC.
Reel/Frame 025731/0959 →
Continuity (4)
Division 12568225 · Sep 28, 2009
Continuation 11462333 · Aug 3, 2006
Provisional Application 60705606 · Aug 3, 2005
Related Publication 20110136284A1 · Jun 9, 2011