Programmable III-nitride transistor with aluminum-doped gate
View Patent ↗Disclosed is a III-nitride heterojunction device that includes a conduction channel having a two dimensional electron gas formed at an interface between a first III-nitride material and a second III-nitride material. A modification including a contact insulator, for example, a gate insulator formed under a gate contact, is disposed over the conduction channel, wherein the contact insulator includes aluminum to alter formation of the two dimensional electron gas at the interface. The contact insulator can include AlSiN, or can be SiN doped with aluminum. The modification results in programming the threshold voltage of the III-nitride heterojunction device to, for example, make the device an enhancement mode device. The modification can further include a recess, an ion implanted region, a diffused region, an oxidation region, and/or a nitridation region. In one embodiment, the first III-nitride material comprises GaN and the second III-nitride material comprises AlGaN.
1. A III-nitride heterojunction device comprising:
a conduction channel including a two dimensional electron gas formed in a first III-nitride material at an interface between said first III-nitride material and a second III-nitride material;
first and second ohmic contacts configured to conduct current through said conduction channel without directly contacting said first III-nitride material;
a modification including a contact insulator disposed over said conduction channel, said contact insulator diffused or implanted with aluminum to charge said contact insulator to form a negatively charged contact insulator, said charge altering formation of said two dimensional electron gas at said interface.
2. The III-nitride heterojunction device of claim 1 , wherein said contact insulator comprises AlSiN.
3. The III-nitride heterojunction device of claim 2 , wherein said contact insulator is grown as a compound.
4. The III-nitride heterojunction device of claim 1 , wherein said contact insulator comprises SiN doped with aluminum.
5. The III-nitride heterojunction device of claim 1 , wherein said modification programs a threshold voltage of said Ill-nitride heterojunction device.
6. The III-nitride heterojunction device of claim 1 , wherein said modification alters formation of said two dimensional electron gas to interrupt said conduction channel.
7. The III-nitride heterojunction device of claim 1 , wherein said modification further includes a recess.
8. The III-nitride heterojunction device of claim 1 , wherein said modification further includes an ion implanted region.
9. The III-nitride heterojunction device of claim 1 , wherein said modification further includes a diffused region.
10. The III-nitride heterojunction device of claim 1 , wherein said modification further includes an oxidation region.
11. The III-nitride heterojunction device of claim 1 , wherein said modification further includes a nitridation region.
12. The III-nitride heterojunction device of claim 1 , wherein said contact insulator is a gate insulator formed under a gate contact.
13. The III-nitride heterojunction device of claim 1 , wherein said first III-nitride material comprises GaN and said second III-nitride material comprises AlGaN.
14. The III-nitride heterojunction device of claim 1 , wherein said Ill-nitride heterojunction device is an N-channel GaN FET.
15. An enhancement mode III-nitride heterojunction device comprising:
a conduction channel including a two dimensional electron gas formed in a first III-nitride material at an interface between said first III-nitride material and a second III-nitride material;
first and second ohmic contacts configured to conduct current through said conduction channel without directly contacting said first III-nitride material;
a modification interrupting said conduction channel, said modification including a gate insulator disposed over said conduction channel, said gate insulator diffused or implanted with aluminum to charge said gate insulator to form a negatively charged gate insulator, said charge altering formation of said two dimensional electron gas at said interface.
16. The enhancement mode Ill-nitride heterojunction device of claim 15 , wherein said gate insulator comprises AlSiN.
17. The enhancement mode Ill-nitride heterojunction device of claim 16 , wherein said gate insulator is grown as a compound.
18. The enhancement mode III-nitride heterojunction device of claim 15 , wherein said gate insulator comprises SiN doped with aluminum.
19. The enhancement mode III-nitride heterojunction device of claim 15 , wherein said modification programs the threshold voltage of said Ill-nitride heterojunction device.
20. The enhancement mode III-nitride heterojunction device of claim 15 , wherein said first III-nitride material comprises GaN and said second III-nitride material comprises AlGaN.