Particle processing systems and methods for normalization/calibration of same
View Patent ↗Systems, methods and non-transitory storage medium are disclosed herein for adjusting an output of a particle inspection system representative of a particle characteristic for a particle flowing in a flow-path of a particle processing system. More particularly, the output may be processed and a calibrated output of the particle characteristic generated. In other embodiments, one or more calibration particles are used. Thus, an output of a particle inspection system representative of a particle characteristic for one or more calibration particles flowing in a flow-path of a particle processing system may be compared relative to a standard and an action may be taken based on a result of the comparing the output to the standard.
1. A particle processing system comprising:
a particle inspection system configured to detect a particle characteristic of a particle-flowing in a flow path of the particle processing system; and
a processor programmed to process a first output of the particle inspection system representative of the particle characteristic for the particle to generate a first calibrated output of the particle characteristic,
wherein processing the first output provides a common basis for comparing the first calibrated output relative to a second calibrated output representative of the particle characteristic obtained for a particle in a different flow path.
2. The system of claim 1 , wherein the particle characteristic is a multi-dimensional particle characteristic.
3. The system of claim 1 , wherein the first output is derived from processing data from one or more detectors in the particle inspection system.
4. The system of claim 1 , wherein processing the first output standardizes measurement of the particle characteristic.
5. The system of claim 1 , wherein the first calibrated output is standardized to conform to a reference scale of measurement for the particle characteristic.
6. The system of claim 1 , wherein the second calibrated output is obtained with a different particle inspection system.
7. The system of claim 1 , wherein processing the first output includes calibrating the first output based on a velocity of the particle.
8. The system of claim 1 , wherein processing the first output includes calibrating the first output with respect to an average particle velocity.
9. The system of claim 1 , wherein processing the first output includes adjusting the first output by a factor of a velocity of the particle over an average particle velocity.
10. The system of claim 1 , wherein processing the first output includes calibrating the first output with respect to a standard particle velocity.
11. The system of claim 1 , wherein processing the first output includes adjusting the first output by a factor of a velocity of the particle over a standard particle velocity.
12. The system of claim 1 , wherein processing the first output includes applying one or more correction factors.
13. The system of claim 12 , wherein the one or more correction factors are applied using a matrix mechanism.
14. The system of claim 1 , wherein processing the first output includes adjusting a baseline for the first output.
15. The system of claim 14 , wherein adjusting the baseline includes mitigating baseline variability.
16. The system of claim 14 , wherein adjusting the baseline includes dividing the baseline by an average baseline.
17. The system of claim 1 , wherein the first and second calibrated outputs are representative of the particle characteristic for different particles.
18. The system of claim 1 , wherein the second calibrated output is representative of a particle characteristic for a particle in a different particle processing system.
19. The system of claim 1 , wherein the second calibrated output is detected with a different particle inspection system.
20. The system of claim 1 , wherein the processor is further configured to superimpose the first and second calibrated outputs.
21. The system of claim 20 , wherein the superimposed first and second calibrated outputs are viewed in combination on a display.
22. The system of claim 1 , wherein the second calibrated output is generated based on a processing of a second output representative of the particle characteristic obtained for the particle in a different flow path.
23. A particle processing system comprising:
a particle inspection system configured to detect a particle characteristic of a particle-flowing in a flow path of the particle processing system; and
a processor programmed to process a first output of the particle inspection system representative of the particle characteristic for the particle to generate a first calibrated output of the particle characteristic,
wherein processing the first output provides a common basis for relating the first calibrated output relative to a second calibrated output representative of a different particle characteristic for a particle in a different flow path.
24. The system of claim 23 , wherein the first and second calibrated outputs are representative of different particle characteristics for the same particle.
25. The system of claim 23 , wherein the processor is further configured to superimpose the first and second calibrated outputs.
26. The system of claim 23 , wherein the second calibrated output is representative of a particle characteristic for a particle in a different particle processing system.
27. The system of claim 23 , wherein the second calibrated output is detected with a different particle inspection system.
28. The system of claim 23 , wherein the second calibrated output is generated based on a processing of a second output representative of the different particle characteristic obtained for the particle in the different flow path.
29. A particle monitoring system comprising,
a receiver configured to receive data from each of a first particle inspection system and a second particle inspection system concerning a population of particles, wherein each of said first and second particle inspection systems are configured to detect a particle characteristic of a particle flowing in a respective flow path associated with the particle inspection system; and
a processor programmed to process the received data to account for measurement or processing variability amongst the first and second particle inspection systems, wherein the accounting for the measured or processing variability amongst the first and second particle inspection systems includes processing an output of the first particle inspection system representative of the particle characteristic for the particle in the flow path associated with the first particle inspection system to generate a first calibrated output of the particle characteristic,
wherein processing the output of the first particle inspection system provides a common basis for comparing the first calibrated output relative to a second calibrated output representative of the particle characteristic obtained for the particle in the flow path associated with the second particle inspection system, wherein the flow path associated with the first particle inspection system is different than the flow associated with the second particle inspection system.
30. The particle monitoring system of claim 29 , wherein the first and second particle inspection systems are co-located on a microfluidic chip or located on different microfluidic chips.
31. The particle monitoring system of claim 29 , wherein the first and second of particle inspection systems are located at geographically distinct locations.
32. In a particle processing system, a method comprising:
measuring with a particle inspection system a particle characteristic for a particle flowing in a flow-path of the particle processing system; and
calibrating a first output from the particle inspection system representative of the particle characteristic for the particle to generate a first calibrated output representative the particle characteristic,
wherein calibrating the output provides a common basis for comparing the calibrated output relative to a second calibrated output representative of a particle characteristic obtained for a particle in a different flow path.
33. The method of claim 32 , wherein the first calibrated output is used to control processing of the particle by the particle processing system.
34. The method of claim 32 , wherein the first calibrated output is used to evaluate a processing of the particle by the particle processing system.
35. The method of claim 32 , wherein calibrating the first output standardizes measurement of the particle characteristic.
36. The method of claim 32 , wherein the first calibrated output is standardized to conform to a reference scale of measurement for the particle characteristic.
37. The method of claim 32 , wherein the second calibrated output is obtained with a different particle inspection system.
38. The method of claim 32 , wherein calibrating the first output includes calibrating the first output based on a velocity of the particle.
39. The method of claim 32 , wherein calibrating the first output includes adjusting a baseline for the first output.
40. The method of claim 32 , wherein the first and second calibrated outputs are representative of different particle characteristics.
41. The method of claim 32 , wherein the first and second calibrated outputs are representative of the same particle characteristic for different particles.
42. The method of claim 32 further comprising:
superimposing the first calibrated output relative to the second calibrated output.
43. The method of claim 42 , wherein the first and second calibrated outputs are representative of different particle characteristics.
44. The method of claim 42 , wherein the first and second calibrated outputs are representative of the same particle characteristic for different particles.
45. The method of claim 42 , wherein the superimposed first and second outputs are viewed in combination on a display.
46. A non-transitory computer-readable storage medium storing computer executable instructions for:
processing a first output of a particle inspection system representative of a particle characteristic for a particle flowing in a flow-path of a particle processing system; and
generating a first calibrated output of the particle characteristic by calibrating the first output, wherein the calibrated first output provides a common basis for comparing the calibrated first output relative to a calibrated second output representative of a particle characteristic obtained for a particle in a different flow path.