Wet scrubber and a method of cleaning a process gas
View Patent ↗A wet scrubber ( 1 ) and a method of using the wet scrubber to clean a process gas containing sulphur dioxide comprising at least one spray level system ( 20 ) with atomizing nozzles ( 38 ) to which an absorption liquid is supplied for atomization by the nozzles ( 38 ). The method comprises operating the spray level system ( 20 ) in at least a first operating mode with an active nozzle density of at least 0.7 nozzles/m 2 , an absorption liquid flow of at least 10 m 3 /hour per nozzle and a Total Flow of at least 30 m 3 /hour/m 2 .
1. A method of cleaning a process gas containing sulphur dioxide by means of a wet scrubber comprising:
atomizing an absorption liquid through active nozzles of at least one spray level system of said wet scrubber, with each of said at least one spray level system comprising at least a first tubular portion equipped with nozzles distributed substantially evenly over a horizontal cross-section of the wet scrubber and a second tubular portion equipped with nozzles distributed substantially evenly over a complete horizontal cross-section of the wet scrubber,
controlling an amount of absorption liquid supplied to the first tubular portion independently from an amount of absorption liquid supplied to the second tubular portion in each of said at least one spray level system,
operating said wet scrubber in at least a first operating mode with a spray level system active nozzle density of at least 0.7 nozzles/m 2 ,
supplying active nozzles of each spray level system with an absorption liquid flow of at least 10 m 3 /hour, and
supplying a Total Flow of absorption liquid of at least 30 m 3 /hour/m 2 to the spray level system for a process gas with a vertical velocity of at least about 3.5 m/s.
2. A method according to claim 1 , wherein said at least one spray level system comprises at least two spay level systems.
3. A method according to claim 1 , further comprising controlling the amount of absorption liquid supplied independently to each of said first tubular portion and second tubular portion of each spray level system between operation of the spray level systems in a first higher absorption capacity operating mode, and in a second lower absorption capacity operating mode.
4. A method according to claim 1 , wherein the amount of absorption liquid supplied independently to each of said first tubular portion and second tubular portion of each spray level system is controlled based on a measured process gas pressure drop over the spray level system.
5. A method according to claim 1 , wherein the wet scrubber comprises at least two spray level systems, each of which is individually controllable to convert operation of the individual spray level systems between said first operating mode and a second operating mode.
6. A method according to claim 1 , wherein said spray level system in said first operating mode, utilizes at least one third of said nozzles to spray at least a portion of the absorption liquid supplied thereto in an upward direction.
7. A method according to claim 1 , wherein a vertical height of the spray level system is less than 0.75 m.
8. A method according to claim 1 , wherein the active nozzle density of the spray level system is less than 5 nozzles per m 2 .
9. A method according to claim 1 , wherein each nozzle is operative for atomizing an absorption liquid flow of at least 10 m 3 /hour at a water spraying pressure of 0.3-2.0 bar.
10. A method according to claim 1 , wherein the absorption liquid flow supplied to each nozzle is less than 180 m 3 /hour and the Total Flow is less than 200 m 3 /hour/m 2 .
11. A method according to claim 1 , wherein the process gas has a vertical velocity of less than 8 m/s.