IP Library Granted Patent US 8,633,723
Granted Patent B2
US 8,633,723 · App. 13/024,669 · Granted Jan 21, 2014

Semiconductor apparatus

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,633,723
App. No.
13/024,669
Granted
Jan 21, 2014
Kind
B2
Abstract

A semiconductor apparatus according to aspects of the invention includes a power MOSFET including a main MOSFET and sensing MOSFET's. The main MOSFET and the sensing MOSFET's are formed on a semiconductor substrate, and a sensing MOSFET is selected for changing the sensing ratio and further for confining the sensing ratio variations within a certain narrow range stably from a low main current range to a high main current range. A semiconductor apparatus according to aspects of the invention facilitates reducing the manufacturing costs thereof, obviating the cumbersomeness caused in the use thereof, and confining the sensing ratio variations within a certain narrow range stably.

Claims (131)

1. A semiconductor apparatus comprising:

a semiconductor substrate;

one or more main semiconductor devices on the semiconductor substrate, the main semiconductor devices making a main current flow;

one or more main sensing semiconductor devices on the semiconductor substrate, the sensing semiconductor devices making a sensing current flow for measuring the main current; and

a plurality of the main semiconductor devices exhibiting different current capacities or a plurality of the sensing semiconductor devices exhibiting different current capacities;

wherein,

a combination of a plurality of the main semiconductor devices and a sensing semiconductor device, a combination of a main semiconductor device and a plurality of the sensing semiconductor devices, or a combination of a plurality of the main semiconductor devices and a plurality of the sensing semiconductor devices is selected for setting a sensing ratio that is a ratio between the main current and the sensing current to be constant in a main current range used,

wherein,

at least one of the main semiconductor devices comprises a main MOS transistor comprising a main MOSFET;

at least one of the sensing semiconductor devices comprises a sensing MOS transistor comprising a sensing MOSFET or a sensing IGBT; and

a design value of the sensing ratio is determined by a ratio between a total area of a source layer or an emitter layer in the main MOS transistor and a total area of a source layer or an emitter layer in the sensing MOS transistor;

the semiconductor apparatus further comprising:

two pieces of the sensing MOS transistor, the current capacities thereof being different from each other;

a gate electrode pad common to the main and sensing MOS transistors;

a drain electrode or a collector electrode common to the main and sensing MOS transistor;

a source electrode or an emitter electrode of the main MOS transistor;

source electrodes or emitter electrodes of the two pieces of the sensing MOS transistor; and

five terminals connected to the drain electrode or the collector electrode, the source electrodes or the emitter electrodes, and the gate electrode pad.

2. A semiconductor apparatus comprising:

a semiconductor substrate;

one or more main semiconductor devices on the semiconductor substrate, the main semiconductor devices making a main current flow;

one or more main sensing semiconductor devices on the semiconductor substrate, the sensing semiconductor devices making a sensing current flow for measuring the main current; and

a plurality of the main semiconductor devices exhibiting different current capacities or a plurality of the sensing semiconductor devices exhibiting different current capacities;

wherein,

a combination of a plurality of the main semiconductor devices and a sensing semiconductor device, a combination of a main semiconductor device and a plurality of the sensing semiconductor devices, or a combination of a plurality of the main semiconductor devices and a plurality of the sensing semiconductor devices is selected for setting a sensing ratio that is a ratio between the main current and the sensing current to be constant in a main current range used,

wherein,

at least one of the main semiconductor devices comprises a main MOS transistor comprising a main MOSFET;

at least one of the sensing semiconductor devices comprises a sensing MOS transistor comprising a sensing MOSFET or a sensing IGBT, and

a design value of the sensing ratio is determined by a ratio between a total area of a source layer or an emitter layer in the main MOS transistor and a total area of a source layer or an emitter layer in the sensing MOS transistor;

the semiconductor apparatus further comprising:

two pieces of the sensing MOS transistor, the current capacities thereof being different from each other;

a gate electrode pad of the main MOS transistor;

gate electrode pads of the two pieces of the sensing MOS transistor;

a drain electrode or a collector electrode common to the main and sensing MOS transistors;

a source electrode or an emitter electrode of the main MOS transistor;

a source electrode or an emitter electrode common to the two pieces of the sensing MOS transistor; and

six terminals connected to the drain electrode or the collector electrode, the source electrodes or the emitter electrodes, and the gate electrode pads.

3. A semiconductor apparatus comprising:

a semiconductor substrate;

one or more main semiconductor devices on the semiconductor substrate, the main semiconductor devices making a main current flow;

one or more main sensing semiconductor devices on the semiconductor substrate, the sensing semiconductor devices making a sensing current flow for measuring the main current; and

a plurality of the main semiconductor devices exhibiting different current capacities or a plurality of the sensing semiconductor devices exhibiting different current capacities;

wherein,

a combination of a plurality of the main semiconductor devices and a sensing semiconductor device, a combination of a main semiconductor device and a plurality of the sensing semiconductor devices, or a combination of a plurality of the main semiconductor devices and a plurality of the sensing semiconductor devices is selected for setting a sensing ratio that is a ratio between the main current and the sensing current to be constant in a main current range used,

wherein,

at least one of the main semiconductor devices comprises a main MOS transistor comprising a main MOSFET,

at least one of the sensing semiconductor devices comprises a sensing MOS transistor comprising a sensing MOSFET or a sensing IGBT, and

a design value of the sensing ratio is determined by a ratio between a total area of a source layer or an emitter layer in the main MOS transistor and a total area of a source layer or an emitter layer in the sensing MOS transistor;

the semiconductor apparatus further comprising:

two pieces of the main MOS transistor, the current capacities thereof being different from each other;

a gate electrode pad common to the main and sensing MOS transistors;

a drain electrode or a collector electrode common to the main and sensing MOS transistors;

source electrodes or emitter electrodes of the two pieces of the main MOS transistor;

a source electrode or an emitter electrode of the sensing MOS transistor; and

five terminals connected to the drain electrode or the collector electrode, the source electrodes or the emitter electrodes, and the gate electrode pad.

4. A semiconductor apparatus comprising:

a semiconductor substrate;

one or more main semiconductor devices on the semiconductor substrate, the main semiconductor devices making a main current flow;

one or more main sensing semiconductor devices on the semiconductor substrate, the sensing semiconductor devices making a sensing current flow for measuring the main current; and

a plurality of the main semiconductor devices exhibiting different current capacities or a plurality of the sensing semiconductor devices exhibiting different current capacities;

wherein,

a combination of a plurality of the main semiconductor devices and a sensing semiconductor device, a combination of a main semiconductor device and a plurality of the sensing semiconductor devices, or a combination of a plurality of the main semiconductor devices and a plurality of the sensing semiconductor devices is selected for setting a sensing ratio that is a ratio between the main current and the sensing current to be constant in a main current range used,

wherein,

at least one of the main semiconductor devices comprises a main MOS transistor comprising a main MOSFET,

at least one of the sensing semiconductor devices comprises a sensing MOS transistor comprising a sensing MOSFET or a sensing IGBT, and

a design value of the sensing ratio is determined by a ratio between a total area of a source layer or an emitter layer in the main MOS transistor and a total area of a source layer or an emitter layer in the sensing MOS transistor;

the semiconductor apparatus further comprising:

two pieces of the main MOS transistor, the current capacities thereof being different from each other;

gate electrode pads of the two pieces of the main MOS transistor;

a gate electrode pad of the sensing MOS transistor;

a drain electrode or a collector electrode common to the main and sensing MOS transistors;

a source electrode or an emitter electrode common to the two pieces of the main MOS transistor;

a source electrode or an emitter electrode of the sensing MOS transistor; and

six terminals connected to the drain electrode or the collector electrode, the source electrodes or the emitter electrodes, and the gate electrode pads.

5. A semiconductor apparatus comprising:

a semiconductor substrate;

one or more main semiconductor devices on the semiconductor substrate, the main semiconductor devices making a main current flow;

one or more main sensing semiconductor devices on the semiconductor substrate, the sensing semiconductor devices making a sensing current flow for measuring the main current; and

a plurality of the main semiconductor devices exhibiting different current capacities or a plurality of the sensing semiconductor devices exhibiting different current capacities;

wherein,

a combination of a plurality of the main semiconductor devices and a sensing semiconductor device, a combination of a main semiconductor device and a plurality of the sensing semiconductor devices, or a combination of a plurality of the main semiconductor devices and a plurality of the sensing semiconductor devices is selected for setting a sensing ratio that is a ratio between the main current and the sensing current to be constant in a main current range used,

wherein,

at least one of the main semiconductor devices comprises a main MOS transistor comprising a main MOSFET,

at least one of the sensing semiconductor devices comprises a sensing MOS transistor comprising a sensing MOSFET or a sensing IGBT, and

a design value of the sensing ratio is determined by a ratio between a total area of a source layer or an emitter layer in the main MOS transistor and a total area of a source layer or an emitter layer in the sensing MOS transistor;

the semiconductor apparatus further comprising:

two pieces of the main MOS transistor, the current capacities thereof being different from each other;

two pieces of the sensing MOS transistor, the current capacities thereof being different from each other;

a gate electrode pad common to the main and sensing MOS transistors;

a drain electrode or a collector electrode common to the main and sensing MOS transistors;

source electrodes or emitter electrodes of the two pieces of the main MOS transistor;

source electrodes or emitter electrodes of the two pieces of the sensing MOS transistor; and

six terminals connected to the drain electrode or the collector electrode, the source electrodes or the emitter electrodes, and the gate electrode pad.

6. A semiconductor apparatus comprising:

a semiconductor substrate;

one or more main semiconductor devices on the semiconductor substrate, the main semiconductor devices making a main current flow;

one or more main sensing semiconductor devices on the semiconductor substrate, the sensing semiconductor devices making a sensing current flow for measuring the main current; and

a plurality of the main semiconductor devices exhibiting different current capacities or a plurality of the sensing semiconductor devices exhibiting different current capacities;

wherein,

a combination of a plurality of the main semiconductor devices and a sensing semiconductor device, a combination of a main semiconductor device and a plurality of the sensing semiconductor devices, or a combination of a plurality of the main semiconductor devices and a plurality of the sensing semiconductor devices is selected for setting a sensing ratio that is a ratio between the main current and the sensing current to be constant in a main current range used,

wherein,

at least one of the main semiconductor devices comprises a main MOS transistor comprising a main MOSFET,

at least one of the sensing semiconductor devices comprises a sensing MOS transistor comprising a sensing MOSFET or a sensing IGBT, and

a design value of the sensing ratio is determined by a ratio between a total area of a source layer or an emitter layer in the main MOS transistor and a total area of a source layer or an emitter layer in the sensing MOS transistor;

the semiconductor apparatus further comprising:

two pieces of the main MOS transistor, the current capacities thereof being different from each other;

two pieces of the sensing MOS transistor, the current capacities thereof being different from each other;

gate electrode pads of the two pieces of the main MOS transistor;

gate electrode pads of the two pieces of the sensing MOS transistor;

a drain electrode or a collector electrode common to the main and sensing MOS transistor;

a source electrode or an emitter electrode common to the two pieces of the main MOS transistor;

a source electrode or an emitter electrode common to the two pieces of the sensing MOS transistor; and

seven terminals connected to the drain electrode or the collector electrode, the source electrodes or the emitter electrodes, and the gate electrode pads.

7. A semiconductor apparatus comprising:

a semiconductor substrate;

a main semiconductor device on the semiconductor substrate, the main semiconductor device making a main current flow;

a plurality of main sensing semiconductor devices on the semiconductor substrate, the sensing semiconductor devices making a sensing current flow for measuring the main current; and

a plurality of the sensing semiconductor devices exhibiting different current capacities;

wherein

a combination of a main semiconductor device and a plurality of the sensing semiconductor devices is selected for setting a sensing ratio that is a ratio between the main current and the sensing current to be constant in a main current range used;

wherein,

the main semiconductor device comprises a main MOS transistor comprising a main MOSFET,

at least one of the sensing semiconductor devices comprises a sensing MOS transistor comprising a sensing MOSFET or a sensing IGBT, and

a design value of the sensing ratio is determined by a ratio between a total area of a source layer or an emitter layer in the main MOS transistor and a total area of a source layer or an emitter layer in the sensing MOS transistor;

the semiconductor apparatus further comprising:

two pieces of the sensing MOS transistor, the current capacities thereof being different from each other;

a gate electrode pad common to the main and sensing MOS transistors;

a drain electrode or a collector electrode common to the main and sensing MOS transistor;

a source electrode or an emitter electrode of the main MOS transistor;

source electrodes or emitter electrodes of the two pieces of the sensing MOS transistor; and

five terminals connected to the drain electrode or the collector electrode, the source electrodes or the emitter electrodes, and the gate electrode pad.

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Aug 26, 2011
From: FUJI ELECTRIC SYSTEMS CO., LTD. (FES); FUJI TECHNOSURVEY CO., LTD. (MERGER BY ABSORPTION)
To: FUJI ELECTRIC CO., LTD.
Reel/Frame 026970/0872 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 2, 2011
From: TAKEUCHI, SHIGEYUKI
To: FUJI ELECTRIC SYSTEMS CO., LTD.
Reel/Frame 025886/0133 →