IP Library Patent Application 13029113
Patent Application
App. No. 13/029,113

Contour Self-Alignment For Optical Proximity Correction Model Calibration

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Quick Facts
Patent No.
US None
App. No.
13/029,113
Abstract

Techniques for model calibration and alignment of measurement contours of printed layout features with simulation contours obtained with a model are disclosed. With various implementations of the invention, contour point errors are determined. Based on the contour point errors and a cost function, values of alignment parameters may be determined. The values of alignment parameters may be used to realign the measurement contours for model calibration. The alignment may be conducted concurrently with model calibration.

Claims (2)

1 . A method of calibrating a lithographic process model comprising any of the new and nonobvious methods and method acts described herein, both alone and in combinations and subcombinations with one another.

2 . A lithographic process model calibration system for performing lithographic process model calibration using any of the new and nonobvious method acts described herein, both alone and in combinations and subcombinations with one another.