Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control

1. A method for layer-by-layer manufacturing of a three-dimensional metallic work piece, comprising the steps of:

a) delivering a metallic feed material in a substantially solid state into a feed region;

b) emitting an electron beam having one or more predetermined electrical currents;

c) translating the electron beam through a first predetermined raster pattern frame in an, x-y plane that includes:

(i) a plurality of points within the feed region sufficient so that the metallic feed material is subjected to a melting beam power density level sufficient to cause melting of the metallic feed material and formation of a molten pool deposit; and

(ii) a plurality of points in a substrate region that is outside of the feed region, sufficient so that the plurality of points outside the feed region is subjected to a substrate beam power density level that is different from the melting beam power density level;

d) monitoring a condition of one or both of the feed region or the substrate region substantially in real time for the occurrence of any deviation from a predetermined condition;

e) upon detecting of any deviation, translating the electron beam through at least one second predetermined raster pattern frame in the x-y plane that maintains the melting beam power density level substantially the same as the first predetermined raster pattern frame, but alters the substrate beam power density level in a manner so that the monitored condition returns to the predetermined condition; and

f) repeating steps (a) through (e) at one or more second locations for building up layer by layer, generally along a z-axis that is orthogonal to the x-y plane, a three-dimensional layered metallic work piece.

2. The method of claim 1 , wherein the step of delivering the metallic feed material includes advancing a metallic wire feed at a substantially constant feed rate, a variable feed rate, or both.

3. The method of claim 1 , wherein at the commencement of the process, the melting beam power density level in the feed region is substantially the same as the melting beam power density level in the substrate region.

4. The method of claim 1 , wherein any translating of the electron beam includes deflecting the beam.

5. The method of claim 1 , wherein the translating step includes a step of deflecting the beam with an electromagnetic coil.

6. The method of claim 1 , wherein the translating step includes translating from point to point at a substantially constant clock rate and/or variable clock rate.

7. The method of claim 1 , wherein throughout the steps (a)-(e) a substantially constant frame rate and/or variable frame rate is employed.

8. The method of claim 1 , wherein throughout the steps (a)-(e) a substantially constant frame rate of at least about 1 kHz is employed, a clock rate in excess of 1 MHz is employed, or both.

9. The method of claim 1 , wherein the molten pool deposit has a forward edge region in an x-y plane with a forward edge region width and a trailing edge region in the x-y plane with a trailing edge region width, and the step of monitoring the molten pool deposit monitors either or both of the forward edge region width or the trailing edge region width, and steps (a)-(e) are performed for maintaining a substantially constant molten pool deposit width at either or both of the forward edge region or the trailing edge region.

10. The method of claim 1 , wherein the electron beam remains at a substantially constant focus throughout repetitions of steps (a)-(e).

11. The method, of claim 1 , wherein a closed loop control system is employed for automatically controlling one or any combination of steps of the method.