Optical element, window material, fitting, and insolation shielding device

1. An optical element comprising:

a first optical layer having a light emission surface;

a wavelength-selective reflective layer provided on the first optical layer; and

a second optical layer provided on the wavelength-selective reflective layer and having a light incidence surface,

wherein the wavelength-selective reflective layer has a structure including at least five layers in which high refractive-index layers and metal layers are alternately laminated to each other,

when a geometric film thickness L of the entire wavelength-selective reflective layer is 80 nm, a ratio α of an optical film thickness of the entire metal layers to an optical film thickness of the entire high refractive-index layers and a ratio β of an optical film thickness of a third high refractive-index layer from one of a first optical layer side and a second optical layer side to an optical film thickness of a first high refractive-index layer therefrom are included in a first region surrounded by the following formulas (1) to (4),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 90 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (5) to (8), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 80 to 90 nm, the ratio α and the ratio β are included in a space enclosed by the first region, the second region, and the following formulas (9) to (12)

α=−0.0004β 2 +0.0053β+0.0065  (1)

α=−1×10 −5 β 2 +0.0007β+0.0066  (2)

α=−1×10 −5 β 2 +0.0005β+0.0119  (3)

α=0.012114  (4)

α=−0.0002β 2 +0.0039β+0.0087  (5)

α=−3×10 −5 β 2 +0.0014β+0.0038  (6)

α=−2×10 −5 β 2 +0.0006β+0.0112  (7)

α=0.010589  (8)

(β−0.5)/0.67=(α−0.01059)/0.00152478=(90− L )/10  (9)

(β−5.5)/3.75=(α−0.01059)/0.00152478=(90− L )/10  (10)

(β−10.4)/10.6=(α−0.01516)/0.00067768=(90− L )/10  (11)

(β−0.8)/0.45=(α−0.01161)/0.0008471=(90− L )/10  (12).

2. The optical element according to claim 1 ,

wherein when the geometric film thickness L of the entire wavelength-selective reflective layer is 80 nm, the ratio α and the ratio β are included in a third region surrounded by formulas (1) to (3) and the following formula (54),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 90 nm, the ratio α and the ratio β are included in a fourth region surrounded by formulas (5) to (7) and the following formula (55), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 80 to 90 nm, the ratio α and the ratio β are included in a space enclosed by the third region, the fourth region, and the following formulas (56) to (60)

α=−6×10 −6 β 2 +0.0002β+0.0141  (54)

α=−1×10 −5 β 2 +0.0002β+0.0125  (55)

(β−0.8)/11.6=(α−0.01161)/0.00398137=(90− L )/10  (56)

(β−8.9)/10.4=(α−0.01398)/0.00152478=(90− L )/10  (57)

(β−10.4)/10.6=(α−0.01516)/0.00067768=(90− L )/10  (58)

(β−4.9)/16.1=(α−0.01347)/0.00237188=(90− L )/10  (59)

(β−4.9)/7.5=(α−0.01347)/0.00211775=(90− L )/10  (60).

3. The optical element according to claim 1 ,

wherein the first optical layer has a concavo-convex surface,

the wavelength-selective reflective layer is provided on the concavo-convex surface, and

the second optical layer is provided on the wavelength-selective reflective layer so as to fill the concavo-convex surface.

4. The optical element according to claim 1 ,

wherein the film thickness of the first high refractive-index layer is approximately equal to that of the fifth high refractive-index layer.

5. The optical element according to claim 1 ,

wherein the film thickness of a second metal layer is approximately equal to that of a fourth metal layer.

6. The optical element according to claim 1 ,

wherein the refractive index of each high refractive-index layer and the refractive index of each metal layer are each a refractive index at a light wavelength of 550 nm.

7. The optical element according to claim 1 ,

wherein each high refractive-index layer has a refractive index higher than that of each metal layer.

8. The optical element according to claim 1 ,

wherein the refractive index of each high refractive-index layer is in a range of 1.7 to 2.6.

9. The optical element according to claim 1 ,

wherein each high refractive-index layer contains at least one selected from the group consisting of niobium oxide, zinc oxide, titanium oxide, and tantalum oxide, and

each metal layer contains a Ag alloy.

10. A window material comprising:

the optical element according to claim 1 .

11. A fitting comprising:

the optical element according to claim 1 at a lighting portion.

12. An insolation shielding device comprising:

at least one insolation shielding member which shields sunlight,

wherein the insolation shielding member includes the optical element according to claim 1 .

13. An optical element comprising:

a first optical layer having a light emission surface;

a wavelength-selective reflective layer provided on the first optical layer; and

a second optical layer provided on the wavelength-selective reflective layer and having a light incidence surface,

wherein the wavelength-selective reflective layer has a structure including at least five layers in which high refractive-index layers and metal layers are alternately laminated to each other,

when a geometric film thickness L of the entire wavelength-selective reflective layer is 90 nm, a ratio α of an optical film thickness of the entire metal layers to an optical film thickness of the entire high refractive-index layers and a ratio β of an optical film thickness of a third high refractive-index layer from one of a first optical layer side and a second optical layer side to an optical film thickness of a first high refractive-index layer therefrom are included in a first region surrounded by the following formulas (5) to (8),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 100 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (13) to (16), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 90 to 100 nm, the ratio α and the ratio β are included in a space enclosed by the first region, the second region, and the following formulas (17) to (20)

α=−0.0002β 2 +0.0039β+0.0087  (5)

α=−3×10 −5 β 2 +0.0014β+0.0038  (6)

α=−2×10 −5 β 2 +0.0006β+0.0112  (7)

α=0.010589  (8)

α=−0.0002β 2 +0.0055β+0.0057  (13)

α=−0.0002β 2 +0.0045β−0.0067  (14)

α=−4×10 −5 β 2 +0.001β+0.0099  (15)

α=0.009403  (16)

(0.7−β)/0.2=(α−0.0094)/0.00118594=(100− L )/10  (17)

(β−4.4)/1.1=(α−0.0094)/0.00118594=(100− L )/10  (18)

(β−6.5)/3.9=(α−0.01432)/0.0008471=(100− L )/10  (19)

(1−β)/0.2=(α−0.01093)/0.00067768=(100− L )/10  (20).

14. The optical element according to claim 13 ,

wherein when the geometric film thickness L of the entire wavelength-selective reflective layer is 90 nm, the ratio α and the ratio β are included in a third region surrounded by formulas (5) to (7) and the following formula (55),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 100 nm, the ratio α and the ratio β are included in a fourth region surrounded by formulas (13) to (15) and the following formula (61), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 90 to 100 nm, the ratio α and the ratio β are included in a space enclosed by the third region, the fourth region, and the following formulas (62) to (65)

α=−1×10 −5 β 2 +0.0002β+0.0125  (55)

α=−3×10 −5 β 2 +0.0004β+0.0113  (61)

(1−β)/0.2=(α−0.01093)/0.0067768=(100− L )/10  (62)

(β−5.8)/3.1=(α−0.01262)/0.00135536=(100− L )/10  (63)

(β−6.5)/3.9=(α−0.01432)/0.0008471=(100− L )/10  (64)

(β−2.8)/2.1=(α−0.0122)/0.00127065=(100− L )/10  (65).

15. An optical element comprising:

a first optical layer having a light emission surface;

a wavelength-selective reflective layer provided on the first optical layer; and

a second optical layer provided on the wavelength-selective reflective layer and having a light incidence surface,

wherein the wavelength-selective reflective layer has a structure including at least five layers in which high refractive-index layers and metal layers are alternately laminated to each other,

when a geometric film thickness L of the entire wavelength-selective reflective layer is 100 nm, a ratio α of an optical film thickness of the entire metal layers to an optical film thickness of the entire high refractive-index layers and a ratio β of an optical film thickness of a third high refractive-index layer from one of a first optical layer side and a second optical layer side to an optical film thickness of a first high refractive-index layer therefrom are included in a first region surrounded by the following formulas (13) to (16),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 120 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (21) to (24), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 100 to 120 nm, the ratio α and the ratio β are included in a space enclosed by the first region, the second region, and the following formulas (25) to (28)

α=−0.0002β 2 +0.0055β+0.0057  (13)

α=−0.0002β 2 +0.0045β−0.0067  (14)

α=−4×10 −5 β 2 +0.001β+0.0099  (15)

α=0.009403  (16)

α=−0.0003β 2 +0.0074β+0.0033  (21)

α=−0.0014β 2 +0.0191β−0.0422  (22)

α=−9×10 −5 β 2 +0.0015β+0.0084  (23)

α=0.007709  (24)

(β−0.6)/0.1=(α−0.00771)/0.0016942=(120− L )/20  (25)

(β−3.6)/0.8=(α−0.00771)/0.0016942=(120− L )/20  (26)

(β−4.25)/2.25=(α−0.0133)/0.00101652=(120− L )/20  (27)

(β−0.9)/0.1=(α−0.00974)/0.00118594=(120− L )/20  (28).

16. The optical element according to claim 15 ,

wherein when the geometric film thickness L of the entire wavelength-selective reflective layer is 100 nm, the ratio α and the ratio β are included in a third region surrounded by formulas (13) to (15) and the following formula (61),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 120 nm, the ratio α and the ratio β are included in a fourth region surrounded by formulas (21) to (23) and the following formula (66), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 100 to 120 nm, the ratio α and the ratio β are included in a space enclosed by the third region, the fourth region, and the following formulas (67) to (70)

α=−3×10 −5 β 2 +0.0004β+0.0113  (61)

α=−7×10 −5 β 2 +0.0007β+0.0097  (66)

(β−0.9)/0.1=(α−0.00974)/0.00118594=(120− L )/20  (67)

(β−4)/1.8=(α−0.01144)/0.00118594=(120− L )/20  (68)

(β−4.25)/2.25=(α−0.0133)/0.00101652=(120− L )/20  (69)

(β−1.7)/1.1=(α−0.01076)/0.00144007=(120− L )/20  (70).

17. An optical element comprising:

a first optical layer having a light emission surface;

a wavelength-selective reflective layer provided on the first optical layer; and

a second optical layer provided on the wavelength-selective reflective layer and having a light incidence surface,

wherein the wavelength-selective reflective layer has a structure including at least five layers in which high refractive-index layers and metal layers are alternately laminated to each other,

when a geometric film thickness L of the entire wavelength-selective reflective layer is 120 nm, a ratio α of an optical film thickness of the entire metal layers to an optical film thickness of the entire high refractive-index layers and a ratio β of an optical film thickness of a third high refractive-index layer from one of a first optical layer side and a second optical layer side to an optical film thickness of a first high refractive-index layer therefrom are included in a first region surrounded by the following formulas (21) to (24),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 140 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (29) to (32), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 120 to 140 nm, the ratio α and the ratio β are included in a space enclosed by the first region, the second region, and the following formulas (33) to (36)

α=−0.0003β 2 +0.0074β+0.0033  (21)

α=−0.0014β 2 +0.0191β−0.0422  (22)

α=−9×10 −5 β 2 +0.0015β+0.0084  (23)

α=0.007709  (24)

α=−0.0014β 2 +0.0136β−0.0027  (29)

β=10,132α 2 −241.39α+4.747  (30)

α=−0.0001β 2 +0.002β+0.0074  (31)

α=0.006523  (32)

(0.75−β)/0.15=(α−0.00652)/0.00118594=(140− L )/20  (33)

(3.65−β)/0.05=(α−0.00652)/0.00118594=(140− L )/20  (34)

(β−3.3)/0.95=(α−0.01245)/0.0008471=(140− L )/20  (35)

(3.47−β)/2.57=(α−0.00754)/0.00220246=(140− L )/20  (36).

18. The optical element according to claim 17 ,

wherein when the geometric film thickness L of the entire wavelength-selective reflective layer is 120 nm, the ratio α and the ratio β are included in a third region surrounded by formulas (21) to (23) and the following formula (66),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 140 nm, the ratio α and the ratio β are included in a fourth region surrounded by formulas (29) to (31) and the following formula (71), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 120 to 140 nm, the ratio α and the ratio β are included in a space enclosed by the third region, the fourth region, and the following formulas (72) to (75)

α=−7×10 −5 β 2 +0.0007β+0.0097  (66)

α=−0.0001β 2 +0.0011β+0.0083  (71)

(1−β)/0.1=(α−0.00923)/0.00050826=(140− L )/20  (72)

(β−3.3)/0.7=(α−0.01042)/0.00101652=(140− L )/20  (73)

(β−3.3)/0.95=(α−0.01245)/0.0008471=(140− L )/20  (74)

(β−1.1)/0.6=(α−0.0094)/0.00135536=(140− L )/20  (75).

19. An optical element comprising:

a first optical layer having a light emission surface;

a wavelength-selective reflective layer provided on the first optical layer; and

a second optical layer provided on the wavelength-selective reflective layer and having a light incidence surface,

wherein the wavelength-selective reflective layer has a structure including at least five layers in which high refractive-index layers and metal layers are alternately laminated to each other,

when a geometric film thickness L of the entire wavelength-selective reflective layer is 140 nm, a ratio α of an optical film thickness of the entire metal layers to an optical film thickness of the entire high refractive-index layers and a ratio β of an optical film thickness of a third high refractive-index layer from one of a first optical layer side and a second optical layer side to an optical film thickness of a first high refractive-index layer therefrom are included in a first region surrounded by the following formulas (29) to (32),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 160 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (37) to (41), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 140 to 160 nm, the ratio α and the ratio β are included in a space enclosed by the first region, the second region, and the following formulas (42) to (45)

α=−0.0014β 2 +0.0136β−0.0027  (29)

β=10,132α 2 −241.39α+4.747  (30)

α=−0.0001β 2 +0.002β+0.0074  (31)

α=0.006523  (32)

α=−0.005β 2 +0.0273β−0.0145  (37)

α=0.0043β 2 −0.0332β+0.07  (38)

β=2.875  (39)

α=−0.0001β 2 +0.0025β+0.0062  (40)

α=0.005676  (41)

(0.9−β)/0.15=(α−0.00568)/0.0008471=(160− L )/20  (42)

(3.8−β)/0.15=(α−0.00568)/0.0008471=(160− L )/20  (43)

(β−2.85)/0.45=(α−0.01203)/0.00042355=(160− L )/20  (44)

(β−1.05)/2.42=(0.00864−α)/0.00110123=(160− L )/20  (45).

20. The optical element according to claim 19 ,

wherein when the geometric film thickness L of the entire wavelength-selective reflective layer is 140 nm, the ratio α and the ratio β are included in a third region surrounded by formulas (29) to (31) and the following formula (71),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 160 nm, the ratio α and the ratio β are included in a fourth region surrounded by formulas (37) to (40) and the following formula (76), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 140 to 160 nm, the ratio α and the ratio β are included in a space enclosed by the third region, the fourth region, and the following formulas (77) to (80)

α=−0.0001β 2 +0.0011β+0.0083  (71)

α=−0.0002β 2 +0.0016β+0.0067  (76)

(1.05−β)/0.05=(α−0.00822)/0.00101652=(160− L )/20  (77)

(β−2.85)/0.45=(α−0.00991)/0.00050826=(160− L )/20  (78)

(β−2.85)/0.45=(α−0.01203)/0.00042355=(160− L )/20  (79)

(β−1.05)/0.05=(α−0.00864)/0.00076239=(160− L )/20  (80).

21. An optical element comprising:

a first optical layer having a light emission surface;

a wavelength-selective reflective layer provided on the first optical layer; and

a second optical layer provided on the wavelength-selective reflective layer and having a light incidence surface,

wherein the wavelength-selective reflective layer has a structure including at least five layers in which high refractive-index layers and metal layers are alternately laminated to each other,

when a geometric film thickness L of the entire wavelength-selective reflective layer is 160 nm, a ratio α of an optical film thickness of the entire metal layers to an optical film thickness of the entire high refractive-index layers and a ratio β of an optical film thickness of a third high refractive-index layer from one of a first optical layer side and a second optical layer side to an optical film thickness of a first high refractive-index layer therefrom are included in a first region surrounded by the following formulas (37) to (41),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 180 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (46) to (49), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 160 to 180 nm, the ratio α and the ratio β are included in a space enclosed by the first region, the second region, and the following formulas (50) to (53)

α=−0.005β 2 +0.0273β−0.0145  (37)

α=0.0043β 2 −0.0332β+0.07  (38)

β=2.875  (39)

α=−0.0001β 2 +0.0025β+0.0062  (40)

α=0.005676  (41)

α=−0.0103β 2 +0.047β−0.0322  (46)

α=0.0093β 2 −0.0677β+0.1212  (47)

α=−0.0003β 2 +0.0036β+0.0046  (48)

α=0.00498  (49)

(1.05−β)/0.15=(α−0.005)/0.00067768=(180− L )/20  (50)

(β−2.75)/1.05=(α−0.005)/0.00067768=(180− L )/20  (51)

(β−2.4)/0.45=(α−0.01177)/0.00025413=(180− L )/20  (52)

(1.2−β)/0.15=(α−0.00856)/0.00008471=(180− L )/20  (53).

22. The optical element according to claim 21 ,

wherein when the geometric film thickness L of the entire wavelength-selective reflective layer is 160 nm, the ratio α and the ratio β are included in a third region surrounded by formulas (37) to (40) and the following formula (76),

when the geometric film thickness L of the entire wavelength-selective reflective layer is 180 nm, the ratio α and the ratio β are included in a fourth region surrounded by formulas (46) to (48) and the following formula (81), and

when the geometric film thickness L of the entire wavelength-selective reflective layer is in a range of 160 to 180 nm, the ratio α and the ratio β are included in a space enclosed by the third region, the fourth region, and the following formulas (82) to (85)

α=−0.0002β 2 +0.0016β+0.0067  (76)

α=−0.0003β 2 +0.0021β+0.0055  (81)

(1.15−β)/0.1=(α−0.00754)/0.00067768=(180− L )/20  (82)

(β−2.55)/0.3=(α−0.00889)/0.00101652=(180− L )/20  (83)

(β−2.4)/0.45=(α−0.01177)/0.00025413=(180− L )/20  (84)

(1.2−β)/0.15=(α−0.00856)/0.00008471=(180− L )/20  (85).