Light-emitting device and manufacturing method thereof

1. A light-emitting device, comprising:

a substrate;

a planarizing film above the substrate, the planarizing film having a planarizing film recessed portion between planarizing film non-recessed portions, the planarizing film recessed portion being recessed from the planarizing film non-recessed portions;

a bottom electrode layer above the planarizing film non-recessed portions, whereby the planarizing film recessed portion is between and offset from the bottom electrode layer on each of the planarizing film non-recessed portions;

a semiconductor interlayer above the bottom electrode layer;

a filling layer above the planarizing film recessed portion, the filling layer comprising a same material as the semiconductor layer and having a filling layer inner portion between filling layer outer portions; and

a bank above the planarizing film recessed portion and edge portions of the bottom electrode layer, each of the edge portions of the bottom electrode layer neighboring the planarizing film recessed portion,

wherein the filling layer inner portion has a thickness of t 1 , the filling layer outer portions have a thickness of t 2 , and t 1 is greater than t 2 , and

a smallest depth of the planarizing film recessed portion is greater than the thickness of t 1 of the filling layer inner portion.

2. The light-emitting device according to claim 1 , wherein

the bottom electrode layer includes a transparent conductive layer at a side proximate to the semiconductor interlayer, and

the semiconductor interlayer is on the transparent conductive layer.

3. The light-emitting device according to claim 1 , further comprising:

a thin film transistor layer between the substrate and the planarizing film,

wherein the planarizing film is on the thin film transistor layer.

4. The light-emitting device according to claim 1 , further comprising:

a light-emitting layer above the bottom electrode layer and on the semiconductor interlayer,

wherein the bank separates the light-emitting layer.

5. The light-emitting device according to claim 4 , further comprising:

a top electrode layer above the light-emitting layer.

6. The light-emitting device according to claim 5 , wherein the top electrode layer comprises a cathode layer.

7. The light-emitting device according to claim 1 , wherein

the bottom electrode layer comprises an anode layer, and

the semiconductor interlayer comprises a hole-injection layer.

8. A light-emitting device, comprising:

a substrate;

a planarizing film above the substrate, the planarizing film having a planarizing film recessed portion between planarizing film non-recessed portions, the planarizing film recessed portion being recessed from the planarizing film non-recessed portions;

a bottom electrode layer above the planarizing film non-recessed portions, whereby the planarizing film recessed portion is between and offset from the bottom electrode layer on each of the planarizing film non-recessed portions;

a semiconductor interlayer above the bottom electrode layer;

a filling layer above the planarizing film recessed portion, the filling layer comprising a same material as the semiconductor layer and having a filling layer inner portion between filling layer outer portions; and

a bank above the planarizing film recessed portion and edge portions of the bottom electrode layer, each of the edge portions of the bottom electrode layer neighboring the planarizing film recessed portion,

wherein the planarizing film recessed portion includes side portions,

the filling layer is not above parts of the side portions,

the filling layer and the semiconductor interlayer are separated from each other by the parts of the side portions above which the filling layer is not,

the filling layer inner portion has a first thickness, the filling layer outer portions have a second thickness, and the first thickness is greater than the second thickness, and

a smallest depth of the planarizing film recessed portion is greater than the first thickness of the filling layer inner portion.

9. The light-emitting device according to claim 8 , wherein a verge of an opening of the planarizing film recessed portion is under the bottom electrode layer.

10. The light-emitting device according to claim 8 , wherein

the bottom electrode layer includes a transparent conductive layer at a side proximate to the semiconductor interlayer, and

the semiconductor interlayer is on the transparent conductive layer.

11. The light-emitting device according to claim 8 , further comprising:

a thin film transistor layer between the substrate and the planarizing film,

wherein the planarizing film is on the thin film transistor layer.

12. The light-emitting device according to claim 8 , further comprising:

a light-emitting layer above the bottom electrode layer and on the semiconductor interlayer,

wherein the bank separates the light-emitting layer.

13. The light-emitting device according to claim 12 , further comprising:

a top electrode layer above the light-emitting layer.

14. The light-emitting device according to claim 13 , wherein the top electrode layer comprises a cathode layer.

15. The light-emitting device according to claim 8 , wherein

the bottom electrode layer comprises an anode layer, and

the semiconductor interlayer comprises a hole-injection layer.

16. The light-emitting device according to claim 1 , wherein the filling layer inner portion extends from one of the filling layer outer portions to an other of the filling layer outer portions.