Optically-functional film and method of manufacturing the same, display and method of manufacturing the same

1. An optically-functional film comprising:

an intermediate layer, made of an insulating material including silicon, and having silicon-containing particles therein or on a top surface thereof; and

an outermost layer made of the same material as that of the intermediate layer, whereas having a density higher than that of the intermediate layer, and having a bottom surface in contact with a top surface of the intermediate layer and a top surface with asperities.

2. The optically-functional film according to claim 1 , wherein

the insulating material is silicon nitride.

3. The optically-functional film according to claim 2 , wherein

the intermediate layer includes a plurality of layers, and

the silicon-containing particles in the intermediate layer are placed on a boundary surface between the plurality of layers.

4. The optically-functional film according to claim 3 , further comprising:

a lower layer arranged in contact with a bottom surface of the intermediate layer, the lower layer being made of the same material as that of the intermediate layer, whereas having a density higher than that of the intermediate layer.

5. The optically-functional film according to claim 4 , wherein

the optically-functional film functions as a scattering film, in which the asperities of the outermost layer allow incident light which enters into the top surface of the outermost layer to be scattered.

6. A method of manufacturing an optically-functional film comprising:

forming an intermediate layer made of an insulating material including silicon by a plasma CVD method; and

forming an outermost layer by a plasma CVD method, the outermost layer arranged in contact with a top surface of the intermediate layer, made of the same material as that of the intermediate layer, whereas having a density higher than the intermediate layer,

wherein in the step of forming the intermediate layer, the generation of plasma is stopped, and then restarts during or after the formation of the intermediate layer to form silicon-containing particles in the intermediate layer or on a top surface of the intermediate layer, and

the outermost layer is formed with use of the silicon-containing particles as nuclei to form asperities on a top surface thereof.

7. The method of manufacturing an optically-functional film according to claim 6 , wherein

the intermediate layer is formed under a temperature ranging from room temperature to 150° C. both inclusive.

8. A display comprising:

a display panel including an organic light-emitting element on a substrate; and

an optically-functional film arranged on a light extraction side of the display panel,

wherein the optically-functional film includes:

an intermediate layer, made of an insulating material including silicon, and having silicon-containing particles therein or on a top surface thereof; and

an outermost layer made of the same material as that of the intermediate layer, whereas having a density higher than that of the intermediate layer, and having a bottom surface in contact with a top surface of the intermediate layer and a top surface with asperities.

9. The display according to claim 8 , wherein

the optically-functional film is arranged on a surface of the organic light-emitting element.

10. The display according to claim 8 , further comprising:

a sealing panel provided to face the organic light-emitting element of the display panel; and

an adhesive layer provided over whole region between the display panel and the sealing panel,

wherein the optically-functional film is provided on the adhesive layer side of the sealing panel.

11. A method of manufacturing a display, comprising:

forming a display panel with an organic light-emitting element on a substrate; and

forming an optically-functional film on a surface of the organic light-emitting element, the step of forming the optically-functional film including the steps of:

forming an intermediate layer made of an insulating material including silicon by a plasma CVD method, and

forming an outermost layer by a plasma CVD method, the outermost layer arranged in contact with a top surface of the intermediate layer, made of the same material as that of the intermediate layer, whereas having a density higher than the intermediate layer,

wherein in the step of forming the intermediate layer, the generation of plasma is stopped, and then restarts during or after the formation of the intermediate layer to form silicon-containing particles in the intermediate layer or on a top surface of the intermediate layer, and

the outermost layer is formed with use of the silicon-containing particles as nuclei to form asperities on a top surface thereof.

12. A method of manufacturing a display, comprising:

forming a display panel with an organic light-emitting element on a substrate;

forming an optically-functional film on a surface of a sealing panel; and

arranging the optically-functional film of the sealing panel to face the organic light-emitting element of the display panel and entirely bonding the display panel and the sealing panel with an adhesive layer, the step of forming the optically-functional film including the steps of:

forming an intermediate layer made of an insulating material including silicon by a plasma CVD method, and

forming an outermost layer by a plasma CVD method, the outermost layer arranged in contact with a top surface of the intermediate layer, made of the same material as that of the intermediate layer, whereas having a density higher than the intermediate layer,

wherein in the step of forming the intermediate layer, the generation of plasma is stopped, and then restarts during or after the formation of the intermediate layer to form silicon-containing particles in the intermediate layer or on a top surface of the intermediate layer, and

the outermost layer is formed with use of the silicon-containing particles as nuclei to form asperities on a top surface thereof.