Developing apparatus and developing method
A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.
1. A developing method for developing a substrate, comprising the steps of:
developing the substrate by supplying a developer to the substrate;
rinsing the substrate by spinning the substrate while supplying a rinsing solution to the substrate;
drying the substrate by spinning the substrate, including the step of starting supply of an inert gas from a nozzle directed substantially at right angles toward a point adjacent a spin center of the substrate in plan view, after finishing the rinsing step and while a film of the rinsing liquid is present on the substrate; and
wherein, when the rinsing step ends, the drying step is started;
wherein, in said drying step, the supplied inert gas breaks the film of the rinsing liquid, and
said drying step continues supply of the inert gas until an end of a period allocated for said drying step;
said rinsing step replaces the developer with the rinsing liquid;
said developing step continues supply of the developer until an end of a period allocated for said developing step; and
said rinsing step starts supply of the rinsing liquid immediately after the supply of the developer ends.
2. A method as defined in claim 1 , wherein, when the developing step ends, the rinsing step is started.
3. A method as defined in claim 1 , wherein during the drying step, the nozzle stands still at said point adjacent the spin center of the substrate.
4. A method as defined in claim 1 , wherein said drying step continues supplying the inert gas only until the supplied inert gas breaks the film of the rinsing liquid.
5. A developing method for developing a substrate, comprising the steps of:
developing the substrate by supplying a developer to the substrate;
rinsing the substrate by spinning the substrate while supplying a rinsing solution to the substrate;
drying the substrate by spinning the substrate, including the step of starting supply of an inert gas from a nozzle directed substantially at right angles toward a point adjacent a spin center of the substrate in plan view, after finishing the rinsing step and while a film of the rinsing liquid is present on the substrate; and
wherein, when the rinsing step ends, the drying step is started;
wherein, in said drying step, the supplied inert gas breaks the film of the rinsing liquid, and
said drying step continues supply of the inert gas until an end of a period allocated for said drying step.
6. A method as defined in claim 5 , wherein, when the developing step ends, the rinsing step is started.
7. A method as defined in claim 5 , wherein during the drying step, the nozzle stands still at said point adjacent the spin center of the substrate.
8. A method as defined in claim 5 , wherein said drying step continues supplying the inert gas only until the supplied inert gas breaks the film of the rinsing liquid.
9. A developing method for developing a substrate, comprising the steps of:
developing the substrate by supplying a developer to the substrate;
rinsing the substrate by spinning the substrate while supplying a rinsing solution to the substrate;
drying the substrate by spinning the substrate, including the step of starting supply of an inert gas from a nozzle directed substantially at right angles toward a point adjacent a spin center of the substrate in plan view, after finishing the rinsing step and while a film of the rinsing liquid is present on the substrate; and
wherein, in said drying step, the supplied inert gas breaks the film of the rinsing liquid, and
said drying step continues supply of the inert gas until an end of a period allocated for said drying step; and
when the supply of the rinsing liquid to the substrate is stopped, the supply of the inert gas to the substrate is started.
10. A method as defined in claim 9 , wherein, when the developing step ends, the rinsing step is started.
11. A method as defined in claim 9 , wherein, when the rinsing step ends, the drying step is started.
12. A method as defined in claim 9 , wherein during the drying step, the nozzle stands still at said point adjacent the spin center of the substrate.
13. A method as defined in claim 9 , wherein said drying step continues supplying the inert gas until the supplied inert gas breaks the film of the rinsing liquid.