Process for producing fluoride gas
View Patent ↗Disclosed is a process for producing a fluoride gas that can produces fluoride gases such as BF 3 , SiF 4 , GeF 4 , PF 5 or AsF 5 at a reduced production cost in a simple manner. The process is characterized in that a compound containing an atom, which, together with a fluorine atom, can form a polyatomic ion, is added to a hydrogen fluoride solution to produce the polyatomic ion in a hydrogen fluoride solution and to evolve a fluoride gas comprising the fluorine atom and the atom that, together with the fluorine atom, can form a polyatomic ion.
1. A process for producing a fluoride gas, comprising:
adding a compound, which contains an atom that is combined with a fluorine atom or an atom that can be combined with a fluorine atom to form a polyatomic ion, to a hydrogen fluoride solution, so as to produce the polyatomic ion in the hydrogen fluoride solution, and
generating the fluoride gas that comprises the fluorine atom and the atom, which can be combined with the fluorine atom to form the polyatomic ion, wherein
the compound contains an organic fluoride complex salt.
2. The process for producing a fluoride gas according to claim 1 , wherein a carrier gas is brought into contact with the hydrogen fluoride solution, in which the polyatomic ion is dissolved, thereby extracting the fluoride gas into the carrier gas.
3. The process for producing a fluoride gas according to claim 2 , wherein hydrogen fluoride gas is used as the carrier gas.
4. The process for producing a fluoride gas according to claim 1 , wherein hydrogen fluoride is evaporated from the hydrogen fluoride solution, in which the polyatomic ion is dissolved, thereby generating the fluoride gas.
5. The process for producing a fluoride gas according to claim 1 , wherein the polyatomic ion is at least one selected from the group consisting of a BF 4 − ion, a SiF 6 2− ion, a GeF 6 2− ion, a PF 6 − ion, and an AsF 6 − ion.