Nitride semiconductor light emitting device
View Patent ↗A nitride semiconductor light emitting device includes n-type and p-type nitride semiconductor layers; an active layer disposed between the n-type and p-type nitride semiconductor layers and having a structure in which a plurality of quantum barrier layers and one or more quantum well layers are alternately stacked; and an electron blocking layer disposed between the active layer and the p-type nitride semiconductor layer. The electron blocking layer has a superlattice structure in which two or more layers having different compositions are alternately stacked. An absolute value of a net polarization mismatch between a material, the material having a composition corresponding to an average composition of the superlattice structure, and a quantum barrier layer adjacent to the electron blocking layer among the plurality of quantum barrier layers is less than ⅔ of an absolute value of a net polarization mismatch between Al x G 1-x N(0<x<1) having bandgap energy equal to that of the material and a composition different thereto and the adjacent quantum barrier layer.
1. A nitride semiconductor light emitting device comprising:
n-type and p-type nitride semiconductor layers;
an active layer disposed between the n-type and p-type nitride semiconductor layers and having a structure in which a plurality of quantum barrier layers and one or more quantum well layers are alternately stacked; and
an electron blocking layer disposed between the active layer and the p-type nitride semiconductor layer,
wherein the electron blocking layer has a superlattice structure in which two or more layers having different compositions are alternately stacked,
an absolute value of a net polarization mismatch between a material, the material having a composition corresponding to an average composition of the superlattice structure, and a quantum barrier layer adjacent to the electron blocking layer among the plurality of quantum barrier layers is less than two thirds (⅔) of an absolute value of a net polarization mismatch between Al x Ga 1-x N (0<x<1) having bandgap energy equal to that of the material and a composition different thereto and the adjacent quantum barrier layer, and
the electron blocking layer includes a polarization matching layer disposed between the superlattice structure and the adjacent quantum barrier layer so as to be in contact with the adjacent quantum barrier layer and having a net polarization equal to that of the adjacent quantum barrier layer.
2. The nitride semiconductor light emitting device of claim 1 , wherein the absolute value of the net polarization mismatch between the material and the adjacent quantum barrier layer is less than half (½) of the absolute value of the net polarization mismatch between Al x Ga 1-x N (0<x<1) and the adjacent quantum barrier layer.
3. The nitride semiconductor light emitting device of claim 2 , wherein the absolute value of the net polarization mismatch between the material and the adjacent quantum barrier layer is equal to zero.
4. The nitride semiconductor light emitting device of claim 1 , wherein x is greater than or equal to 0.1 and is less than or equal to 0.2.
5. The nitride semiconductor light emitting device of claim 1 , wherein the adjacent quantum barrier layer is formed of GaN.
6. The nitride semiconductor light emitting device of claim 1 , wherein the average composition of the superlattice structure is a quaternary composition including Al, Ga, In and N.
7. The nitride semiconductor light emitting device of claim 1 ,
wherein the superlattice structure includes superlattice barrier and well layers, and
an absolute value of a net polarization mismatch between the superlattice barrier and well layers is less than two thirds (⅔) of an absolute value of a net polarization mismatch between Al y Ga 1-y N (0<y<1) having bandgap energy equal to that of the superlattice barrier layer and a composition different thereto and the superlattice well layer.
8. The nitride semiconductor light emitting device of claim 7 , wherein the absolute value of the net polarization mismatch between the superlattice barrier and well layers is less than half (½) of the absolute value of the net polarization mismatch between Al y Ga 1-y N (0<y<1)and the superlattice well layer.
9. The nitride semiconductor light emitting device of claim 7 , wherein the absolute value of the net polarization mismatch between the superlattice barrier and well layers is zero.
10. The nitride semiconductor light emitting device of claim 7 , wherein the superlattice barrier layer has a quaternary composition including Al, Ga, In and N, and
the superlattice well layer is formed of GaN.
11. The nitride semiconductor light emitting device of claim 7 , wherein y is greater than or equal to 0.2 and is less than or equal to 0.4.
12. The nitride semiconductor light emitting device of claim 1 , wherein the polarization matching layer has greater bandgap energy than the adjacent quantum barrier layer.
13. A nitride semiconductor light emitting device comprising:
n-type and p-type nitride semiconductor layers;
an active layer disposed between the n-type and p-type nitride semiconductor layers and having a structure in which a plurality of quantum barrier layers and one or more quantum well layers are alternately stacked; and
an electron blocking layer disposed between the active layer and the p-type nitride semiconductor layer,
wherein the electron blocking layer has a superlattice structure in which two or more layers having different compositions are alternately stacked,
the superlattice structure includes superlattice barrier and well layers, and
an absolute value of a net polarization mismatch between the superlattice barrier and well layers is less than two thirds (⅔) of an absolute value of a net polarization mismatch between Al y Ga 1-y N (0<y<1) having bandgap energy equal to that of the superlattice barrier layer and a composition different thereto and the superlattice well layer.
14. The nitride semiconductor light emitting device of claim 13 , wherein the absolute value of the net polarization mismatch between the superlattice barrier and well layers is less than half (½) of the absolute value of the net polarization mismatch between Al y Ga 1-y N (0<y<1) and the superlattice well layer.
15. The nitride semiconductor light emitting device of claim 13 , wherein the absolute value of the net polarization mismatch between the superlattice barrier and well layers is equal to zero.
16. A nitride semiconductor light emitting device comprising:
n-type and p-type nitride semiconductor layers; and
an active layer disposed between the n-type and p-type nitride semiconductor layers and having a structure in which a plurality of quantum barrier layers and one or more quantum well layers are alternately stacked;
wherein at least one of the plurality of quantum barrier layers has a superlattice structure in which two or more layers having different compositions are alternately stacked,
an absolute value of a net polarization mismatch between a material, the material having a composition corresponding to an average composition of the superlattice structure, and a quantum well layer adjacent to the superlattice structure is less than two thirds (⅔) of an absolute value of a net polarization mismatch between In x Ga 1-x N (0≦x<1) having bandgap energy equal to that of the material and a composition different thereto and the adjacent quantum well layer, and
the quantum barrier layer having the superlattice structure includes a polarization matching layer disposed between the superlattice structure and the adjacent quantum well layer so as to be in contact with the adjacent quantum well layer and having a net polarization equal to that of the adjacent quantum well layer.
17. The nitride semiconductor light emitting device of claim 16 , wherein x is 0.