Method of fabricating CIS or CIGS thin film

1. A method of fabricating a CIS or CIGS thin film, comprising:

forming, on a substrate, a seed particle layer comprising copper-indium-compound seed particles comprising copper (Cu); indium (In); and at least one selected from the group consisting of gallium (Ga), sulfur (S) and selenium (Se);

applying, on the seed particle layer, a water-soluble precursor solution comprising:

a water-soluble copper (Cu) precursor;

a water-soluble indium (In) precursor; and

at least one selected from the group consisting of a water-soluble gallium (Ga) precursor, a water-soluble sulfur (S) precursor and a water-soluble selenium (Se) precursor; and

forming a thin film at high temperature.

2. The method as set forth in claim 1 , wherein the copper-indium-compound seed particles are selected from the group consisting of CuInS 2 , CuInSe 2 , Cu(In,Ga)S 2 , Cu(In,Ga)Se 2 and Cu(In, Ga)(S, Se) 2 .

3. The method as set forth in claim 1 , wherein the water-soluble copper (Cu) precursor is selected from the group consisting of CuCl 2 , Cu(NO 3 ) 2 , CuSO 4 , Cu(CH 3 COO) 2 and hydrates thereof.

4. The method as set forth in claim 1 , wherein the water-soluble indium (In) precursor is selected from the group consisting of InCl 3 , In(NO 3 ) 3 , In(CH 3 COO) 3 , In 2 (SO 4 ) 3 and hydrates thereof.

5. The method as set forth in claim 1 , wherein the water-soluble gallium (Ga) precursor is selected from the group consisting of GaCl 3 , Ga(NO 3 ) 3 , Gal 3 and hydrates thereof.

6. The method as set forth in claim 1 , wherein the water-soluble sulfur (S) precursor is (NH 2 ) 2 CS or a hydrate thereof.

7. The method as set forth in claim 1 , wherein the water-soluble selenium (Se) precursor is selected from the group consisting of (NH 2 ) 2 CSe, SeO 2 , H 2 SeO 3 , SeCl 4 and hydrates thereof.

8. The method as set forth in claim 1 , wherein the solution includes water or a buffer.

9. The method as set forth in claim 8 , wherein a volume ratio of the water-soluble precursor to the water or buffer of the solution ranges from 1:1 to 1:10,000.

10. The method as set forth in claim 1 , wherein the solution further comprises a structure directing agent.

11. The method as set forth in claim 1 , wherein the forming the thin film at high temperature is performed using hydrothermal synthesis.

12. The method as set forth in claim 11 , wherein the forming the thin film using hydrothermal synthesis is performed at 70˜250° C. for 1˜175 hours.

13. A CIS or CIGS thin film fabricated using the method of claim 1 .