Titanium nano-scale etching on an implant surface
View Patent ↗A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises the act of immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution to produce a nanoscale roughened surface consisting of nanopitting superimposed on the microscale roughened surface. The nanoscale roughened surface has a property that promotes osseointegration.
1. A method of forming an implant with a surface topography, the implant with the surface topography to be implanted into living bone, the method comprising the acts of:
roughening at least a portion of the implant surface to produce a microscale roughened surface;
immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution to produce the surface topography including a nanoscale roughened surface, the nanoscale roughened surface including nanopitting superimposed on the microscale roughened surface; and
rinsing the surface topography in deionized water.
2. The method of claim 1 , wherein the implant is made of a metal selected from the group consisting of tantalum, cobalt, chromium, titanium, stainless steel, or alloys thereof.
3. The method of claim 1 , wherein the implant is a dental implant.
4. The method of claim 3 , wherein the portion of the implant surface is a threaded bottom portion for facilitating bonding with bone.
5. The method of claim 1 , wherein the implant is made of titanium and the act of roughening the implant surface comprises grit blasting the surface.
6. The method of claim 1 , wherein the implant is made of titanium and the act of roughening the implant surface comprises:
removing a native oxide layer from the implant surface; and
acid etching the resulting surface.
7. The method of claim 6 , wherein the act of roughening the implant surface comprises acid etching the implant surface with a solution containing sulfuric acid and hydrochloric acid.
8. The method of claim 1 , wherein the basic solution is a sodium hydroxide solution.
9. The method of claim 1 , wherein the basic solution is a potassium hydroxide solution.
10. The method of claim 9 , wherein the potassium hydroxide solution has a concentration of about 3-5% w/w and the hydrogen peroxide has a concentration of about 13-22% w/w.
11. The method of claim 9 , wherein the potassium hydroxide solution has a concentration of about 1-6% w/w and the hydrogen peroxide has a concentration of about 1-6% w/w.
12. The method of claim 1 , wherein the basic solution has a pH between about 7 to about 14.
13. The method of claim 1 , wherein the nanopitting is in the 1-100 nanometer range.
14. The method of claim 1 , further comprising the acts of:
passivating the nanoscale roughened surface with nitric acid;
re-rinsing the nanoscale roughened surface in deionized water; and
drying the nanoscale roughened surface.
15. The method of claim 14 , further comprising the act of sterilizing the implant.
16. The method of claim 1 , further comprising the act of depositing discrete nanoparticles on the nanoscale roughened surface.
17. The method of claim 1 , further comprising the act of applying a sodium lactate coating on the nanoscale roughened surface.
18. The method of claim 1 , wherein the act of roughening the implant surface produces irregularities with peak-to-valley heights of less than about 10 microns and peak-to-peak distances of less than about 3 microns.
19. A method of forming an implant with a nanoscale roughened surface, the implant with the nanoscale roughened surface to be implanted into living bone, the method comprising the acts of:
removing a native oxide layer from at least a portion of the implant surface;
roughening at least the portion of the implant surface to produce a microscale roughened surface;
rinsing the microscale roughened surface in deionized water;
immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution at a high pH level to produce the nanoscale roughened surface including nanopitting superimposed on the microscale roughened surface;
passivating the nanoscale roughened surface with nitric acid; and
rinsing the nanoscale roughened surface in deionized water.
20. The method of claim 19 , wherein the act of roughening the implant surface comprises grit blasting the implant surface.
21. The method of claim 19 , wherein the act of roughening the implant surface comprises acid etching the implant surface with a solution containing sulfuric acid and hydrochloric acid.
22. The method of claim 19 , wherein the implant is made of a metal selected from the group consisting of tantalum, cobalt, chromium, titanium, stainless steel, or alloys thereof.
23. The method of claim 19 , wherein the implant is a dental implant.
24. The method of claim 19 , wherein the basic solution is a sodium hydroxide solution.
25. The method of claim 19 , wherein the basic solution is a potassium hydroxide solution having a concentration of about 3-5% w/w and the hydrogen peroxide has a concentration of about 13-22% w/w.
26. The method of claim 19 , wherein the basic solution is a potassium hydroxide solution having a concentration of about 1-6% w/w and the hydrogen peroxide has a concentration of about 1-6% w/w.
27. The method of claim 19 , further comprising the act of depositing discrete nanoparticles on the nanoscale roughened surface.
28. The method of claim 19 , wherein the act of roughening the implant surface produces irregularities with peak-to-valley heights of less than about 10 microns and peak-to-peak distances of less than about 3 microns.