Oblique vapor deposition substrate, liquid crystal device, method for manufacturing liquid crystal device, and projection display device
View Patent ↗An oblique vapor deposition substrate having an oblique vapor deposition layer formed thereon is provided, wherein a plurality of pixel sections is arranged in a matrix of intersected straight lines of two directions with each pixel section being spaced apart from each other, and has been relatively rotated in a plane of the oblique vapor deposition substrate taking into consideration the distribution of the vapor deposition directions in the oblique vapor deposition layer.
1. An oblique vapor deposition substrate comprising:
a first substrate that includes a plurality of pixel sections; and
an first oblique vapor deposition layer that is formed above the first substrate,
wherein
each pixel section has a plurality of pixels,
an outline of each pixel section has a rectangular shape and a center point that is an intersection point of the diagonal lines of the outline of each pixel section,
the plurality of pixel sections is disposed so as to arrange each center point of the respective pixel sections in a matrix of a first direction with a first distance and a second direction with a second distance, and
wherein
a first pixel section has a first side that is a long side of the respective outline,
the first side extends along a third direction,
a second pixel section has a second side that is a long side of the respective outline,
the second side extends along a fourth direction, and
the third direction intersects the fourth direction.
2. The oblique vapor deposition substrate according to claim 1 , wherein the third direction intersects the first direction and the second direction.
3. The oblique vapor deposition substrate according to claim 2 ,
wherein
a third pixel section has a third side that is a long side of the respective outline,
the third side extends along a fifth direction, and
the fifth direction intersects the third direction and the fourth direction at a point.
4. The oblique vapor deposition substrate according to claim 3 , wherein
the third direction intersects the first direction at a first angle,
the third direction intersects the second direction at a second angle,
the second angle is smaller than the first angle, and
the first distance is smaller than the second distance.